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Dive into the research topics where Oliver Sohr is active.

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Featured researches published by Oliver Sohr.


XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium | 2004

Mechanisms of radiation induced defect generation in fused silica

Ute Natura; Oliver Sohr; Rolf Martin; Michael Kahlke; Gabriele Fasold

Excimer laser radiation changes the optical properties of fused silica. These changes include radiation induced absorption and changes of the index of refraction, which in turn determine the expected lifetime of silica lenses used in optical microlithography. A fully automated experimental setup designed for the marathon exposure of samples at low energy densities was employed. Measurements of the induced absorption, of the H2 content using Raman spectroscopy as well as wavefront measurements were performed. A model to predict the aging behavior of silica in optical microlithography systems due to defect generation has been developed for both ArF laser irradiation and KrF laser irradiation. The model includes linear and nonlinear defect generation, relaxation processes and the consumption of hydrogen and describes the radiation induced changes of the index of refraction, the increase as well as the decrease. The model calculations were derived by analytical and numerical methods. A very good agreement in the range of parameters used in the experiments is observed.


Optical Microlithography XVII | 2004

Excimer-laser-induced defect generation in Lithosil

Ute Natura; Oliver Sohr; Martin Letz; Rolf Martin; Michael Kahlke; Gabriele Fasold

Fused silica is used as lens material in DUV microlithography systems. The exposure of fused silica to high-energy excimer laser pulses over long periods of time modifies the material. Marathon experiments were conducted at different energy densities with the KrF- and ArF excimer laser to describe the material parameters under long time irradiation. A model was developed to describe the radiation induced absorption and the change of the index of refraction. The defect generation is associated with the consumption of hydrogen. The dependence of hydrogen consumption on the wavelength of irradiation, the energy density and the initial hydrogen content was investigated in detail. The saturation of H2 consumption in Lithosil was proved by different experiments. The results are in very good agreement with the model calculations.


Archive | 2005

SiO2-TiO2 glass body with improved resistance to radiation

Jochen Alkemper; Joerg Schuhmacher; Hrabanus Hack; Oliver Sohr


Archive | 2005

Method for producing a luminous device comprising glass-ceramics

Ulrich Peuchert; Thilo Zachau; Bernd Hoppe; Oliver Sohr; Dirk Sprenger


Archive | 2005

SiO2-TiO2-Glas mit erhöhter Strahlungsbeständigkeit

Jochen Alkemper; Jörg Schuhmacher; Hrabanus Hack; Oliver Sohr


Archive | 2004

Production of illumination device with at least one body enclosing an illuminant useful for automobile illumination, e.g. halogen lamps, miniaturized glass-ceramic devices, and high pressure discharge lamps

Bernd Hoppe; Ulrich Peuchert; Oliver Sohr; Dirk Sprenger; Thilo Zachau


Archive | 2003

Quartz glass preform and process for manufacture of quartz glass and of a quartz glass preform

Ute Natura; Andreas Menzel; Jochen Alkemper; Rolf Martin; der Gönna Gordon Dr. Von; Matthias Schmidt; Frank Coriand; Thomas Schmiady; Oliver Sohr; Andreas Voitsch


Archive | 2003

Quartz glass preform and process for its manufacture

Jochen Dr. Alkemoer; Frank Coriand; Rolf Martin; Andreas Menzel; Ute Natura; Thomas Schmiady; Matthias Schmidt; Oliver Sohr; Andreas Voitsch; der Gönna Gordon Dr. Von


Archive | 2005

Verfahren zur Herstellung einer Leuchtvorrichtung umfassend eine Glaskeramik

Ulrich Peuchert; Thilo Zachau; Bernd Hoppe; Oliver Sohr; Dirk Sprenger


Archive | 2004

SiO2-TiO2-Glas mit erhöhter Strahlungsbeständigkeit SiO2-TiO2 glass with increased radiation resistance

Jochen Alkemper; Hrabanus Hack; Jörg Schuhmacher; Oliver Sohr

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