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Osamu Hirakawa

Tokyo Electron

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Publication

Featured researches published by Osamu Hirakawa.

Archive | 1989

Resist process apparatus

Masami Akimoto; Yoshio Kimura; Osamu Hirakawa; Noriyuki Anai; Masanori Tateyama; Yasuhiro Sakamoto

Archive | 1990

COATING APPARATUS AND METHOD FOR APPLYING A LIQUID TO A SEMICONDUCTOR WAFER INCLUDING SELECTING A NOZZLE ON A STAND BY STATE

Mitsuru Ushijima; Osamu Hirakawa; Masami Akimoto; Yoshio Kimura; Noriyuki Anai

Archive | 2014

PEELING DEVICE, PEELING SYSTEM AND PEELING METHOD

Osamu Hirakawa; Naoto Yoshitaka; Masaru Honda

Archive | 2012

Separation apparatus, separation system, and separation method

Osamu Hirakawa; Masaru Honda; Akira Fukutomi; Takeshi Tamura; Jiro Harada; Kazutaka Noda

Archive | 1989

Vacuum heat-treatment apparatus for substrate

Masami Akumoto; Noriyuki Anai; Osamu Hirakawa; Yoshio Kimura; Mitsuru Ushijima

Archive | 1989

Coating device for coating semiconductor wafer with liquid

Masami Akumoto; Noriyuki Anai; Osamu Hirakawa; Yoshio Kimura; Mitsuru Ushijima

Archive | 2007

Heating apparatus, heating method, coating apparatus, and storage medium

Osamu Hirakawa; Masami Akimoto; Shinichi Hayashi

Archive | 2012

Substrate inverting device, substrate inverting method, and peeling system

Yasuharu Iwashita; Osamu Hirakawa; Masaru Honda; Akira Fukutomi

Archive | 2006

Heating device, heating method, coating device and storage medium

Masami Akumoto; Shinichi Hayashi; Osamu Hirakawa; 修 平河; 伸一 林; 正巳 飽本

Archive | 1996

Treatment equipment and treatment method

Masami Akumoto; Osamu Hirakawa; Yoshio Kimura; Mitsuru Ushijima; 修 平河; 義雄 木村; 満 牛島; 正己 飽本

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Collaboration

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Naoto Yoshitaka

Tokyo Electron

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Masataka Matsunaga

Tokyo Electron

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Norihiko Okamoto

Tokyo Electron

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Masaru Honda

Tokyo Electron

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Takeshi Tamura

Tokyo Electron

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Yoshio Kimura

Tokyo Electron

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Mitsuru Ushijima

Tokyo Electron

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Noriyuki Anai

Tokyo Electron

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Akira Fukutomi

Tokyo Electron

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Eiji Manabe

Tokyo Electron

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