P.J. Janse van Rensburg

Effects of hydrogen, oxygen, and argon annealing on the electrical properties of ZnO and ZnO devices studied by current-voltage, deep level transient spectroscopy, and Laplace DLTS

Effects of annealing ZnO in hydrogen, oxygen, and argon have been investigated using deep level transient spectroscopy (DLTS) and Laplace-DLTS (LDLTS) measurements. Current-voltage (IV) measurements indicate a decrease in zero–bias barrier height for all the annealed samples. Conventional DLTS measurements reveal the presence of three prominent peaks in the un-annealed and annealed samples. A new peak with an activation enthalpy of 0.60 eV has been observed in the H2 annealed samples, while an estimated energy level of 0.67 eV has been observed in Ar annealed samples. O2 annealing does not introduce new peaks but causes a decrease in the concentration of the E3 peak and an increase in concentration of the E1 peak. The concentrations of all the intrinsic defects have decreased after H2 and Ar annealing; with Ar annealing giving peaks with the lowest concentrations. The E2 peak anneals out after annealing ZnO in Ar and H2 at 300 °C. From the annealing behaviour of E3, we have attributed to transition metal ...

Electrical characterization of defects introduced in n-type Ge during indium implantation

The authors have employed deep level transient spectroscopy to investigate the defects introduced in n-type Ge during 160keV indium (In) ion implantation. Our results show that In implantation introduces three prominent electron traps with energy levels at EC−0.09eV, EC−0.15eV, and EC−0.30eV, respectively. The authors have found that these defects are different from the point defects introduced by electron irradiation but that they do not involve In. Annealing at 600°C removed all the defects introduced during In implantation but results in a single prominent defect with a level at EC−0.35eV.

Electrical characterization of defects introduced in n-Ge during electron beam deposition or exposure

Schottky barrier diodes prepared by electron beam deposition (EBD) on Sb-doped n-type Ge were characterized using deep level transient spectroscopy (DLTS). Pt EBD diodes manufactured with forming gas in the chamber had two defects, E0.28 and E0.31, which were not previously observed after EBD. By shielding the samples mechanically during EBD, superior diodes were produced with no measureable deep levels, establishing that energetic ions created in the electron beam path were responsible for the majority of defects observed in the unshielded sample. Ge samples that were first exposed to the conditions of EBD, without metal deposition (called electron beam exposure herein), introduced a number of new defects not seen after EBD with only the E-center being common to both processes. Substantial differences were noted when these DLTS spectra were compared to those obtained using diodes irradiated by MeV electrons or alpha particles indicating that very different defect creation mechanisms are at play when too ...

A comparative study of the electrical properties of Pd/ZnO Schottky contacts fabricated using electron beam deposition and resistive/thermal evaporation techniques

very low reverse currents of the order of 10 � 10 A at a reverse voltage of 1.0 V whereas the e-beam deposited contacts have reverse currents of the order of 10 � 6 A at 1.0 V. Average ideality factors have been determined as (1.43 60.01) and (1.66 60.02) for the resistively evaporated contacts and e-beam deposited contacts, respectively. The IV barrier heights have been calculated as (0.721 60.002) eV and (0.624 60.005) eV for the resistively evaporated and e-beam deposited contacts, respectively. Conventional DLTS measurements reveal the presence of three prominent defects in both the resistive and e-beam contacts. Two extra peaks with energy levels of 0.60 and 0.81 eV below the conduction band minimum have been observed in the e-beam deposited contacts. These have been explained as contributing to the generation recombination current that dominates at low voltages and high leakage currents. Based on the reverse current at 1.0 V, the degree of rectification, the dominant current transport mechanism and the observed defects, we conclude that the resistive evaporation technique yields better quality Schottky contacts for use in solar cells and ultraviolet detectors compared to the e-beam deposition technique. The 0.60 eV has been identified as possibly related to the unoccupied level for the doubly charged oxygen vacancy, Vo 2þ . V C 2011 American Institute of Physics. [doi:10.1063/1.3658027]

A study of the T2 defect and the emission properties of the E3 deep level in annealed melt grown ZnO single crystals

We report on the space charge spectroscopy studies performed on thermally treated melt-grown single crystal ZnO. The samples were annealed in different ambients at 700 °C and also in oxygen ambient at different temperatures. A shallow donor with a thermal activation enthalpy of 27 meV was observed in the as-received samples by capacitance-temperature, CT scans. After annealing the samples, an increase in the shallow donor concentrations was observed. For the annealed samples, E27 could not be detected and a new shallow donor with a thermal activation enthalpy of 35 meV was detected. For samples annealed above 650 °C, an increase in acceptor concentration was observed which affected the low temperature capacitance. Deep level transient spectroscopy revealed the presence of five deep level defects, E1, E2, E3, E4, and E5 in the as-received samples. Annealing of the samples at 650 °C removes the E4 and E5 deep level defects, while E2 also anneals-out at temperatures above 800 °C. After annealing at 700 °C, t...

Effects of high temperature annealing on single crystal ZnO and ZnO devices

We have systematically investigated the effects of high-temperature annealing on ZnO and ZnO devices using current voltage, deep level transient spectroscopy (DLTS) and Laplace DLTS measurements. Current–voltage measurements reveal the decrease in the quality of devices fabricated on the annealed samples, with the high-temperature annealed samples yielding devices with low barrier heights and high reverse currents. DLTS results indicate the presence of three prominent defects in the as-received samples. Annealing the ZnO samples at 300 °C, 500 °C, and 600 °C in Ar results in an increase in reverse leakage current of the Schottky contacts and an introduction of a new broad peak. After 700 °C annealing, the broad peak is no longer present, but a new defect with an activation enthalpy of 0.18 eV is observed. Further annealing of the samples in oxygen after Ar annealing causes an increase in intensity of the broad peak. High-resolution Laplace DLTS has been successfully employed to resolve the closely spaced ...