Patrick Ponath

Carrier density modulation in a germanium heterostructure by ferroelectric switching

The development of non-volatile logic through direct coupling of spontaneous ferroelectric polarization with semiconductor charge carriers is nontrivial, with many issues, including epitaxial ferroelectric growth, demonstration of ferroelectric switching and measurable semiconductor modulation. Here we report a true ferroelectric field effect-carrier density modulation in an underlying Ge(001) substrate by switching of the ferroelectric polarization in epitaxial c-axis-oriented BaTiO3 grown by molecular beam epitaxy. Using the density functional theory, we demonstrate that switching of BaTiO3 polarization results in a large electric potential change in Ge. Aberration-corrected electron microscopy confirms BaTiO3 tetragonality and the absence of any low-permittivity interlayer at the interface with Ge. The non-volatile, switchable nature of the single-domain out-of-plane ferroelectric polarization of BaTiO3 is confirmed using piezoelectric force microscopy. The effect of the polarization switching on the conductivity of the underlying Ge is measured using microwave impedance microscopy, clearly demonstrating a ferroelectric field effect.

Preparation of a clean Ge(001) surface using oxygen plasma cleaning

The authors demonstrate a method to obtain a clean and smooth Ge (001) surface using oxygen plasma cleaning without sputtering or Ge regrowth. The preparation of the germanium surface consists of four cycles of ex situ wet etching using hydrochloric acid as the etchant and H2O2 as the oxidant. Subsequently, the sample is outgassed and exposed to an oxygen plasma for 30 min followed by thermal desorption of the newly formed oxide layer. Reflection high-energy electron diffraction shows a clear 2 × 1 reconstruction of the germanium surface. In situ x-ray photoelectron spectroscopy measurements confirm that the cleaned surface is free of carbon contamination and that no GeO2 remains. Angle-resolved photoemission spectra of the cleaned Ge show the peak associated with the Ge surface state indicating a very clean surface. Atomic force microscope images further indicate a smooth germanium surface with a mean surface roughness of approximately 3 A after plasma cleaning.

Atomic and electronic structure of the ferroelectric BaTiO3/Ge(001) interface

In this study, we demonstrate the epitaxial growth of BaTiO3 on Ge(001) by molecular beam epitaxy using a thin Zintl template buffer layer. A combination of density functional theory, atomic-resolution electron microscopy and in situ photoemission spectroscopy is used to investigate the electronic properties and atomic structure of the BaTiO3/Ge interface. Aberration-corrected scanning transmission electron micrographs reveal that the Ge(001) 2 × 1 surface reconstruction remains intact during the subsequent BaTiO3 growth, thereby enabling a choice to be made between several theoretically predicted interface structures. The measured valence band offset of 2.7 eV matches well with the theoretical value of 2.5 eV based on the model structure for an in-plane-polarized interface. The agreement between the calculated and measured band offsets, which are highly sensitive to the detailed atomic arrangement, indicates that the most likely BaTiO3/Ge(001) interface structure has been identified.

Scavenging of oxygen from SrTiO3 during oxide thin film deposition and the formation of interfacial 2DEGs

SrTiO3 is a widely used substrate for the growth of other functional oxide thin films. The reactivity of the substrate with respect to the film during deposition, particularly with regard to redox reactions, has typically been glossed over. We demonstrate by depositing a variety of metals (Ti, Al, Nb, Pt, Eu, and Sr) and measuring the in situ core level spectra of both the metal and SrTiO3 that, depending on the oxide formation energy and work function of the metal, three distinct types of behavior occur in thin metal films on SrTiO3 (100). In many cases, there will be an interfacial layer of oxygen-deficient SrTiO3 formed at the interface with the overlying film. We discuss how this may affect the interpretation of the well-known two-dimensional electron gas present at the interface between SrTiO3 and various oxides.

Ge(001) surface cleaning methods for device integration

In recent years, research on Ge nanodevices has experienced a renaissance, as Ge is being considered a possible high mobility channel material replacement for Si MOSFET devices. However, for reliable high performance devices, an atomically flat and perfectly clean Ge surface is of utmost importance. In this review, the existing methods for cleaning the Ge(001) surface are reviewed and compared for the first time. The review discusses three broad categories of cleaning techniques that have been successfully demonstrated to obtain a clean Ge surface. First, the use of ultraviolet light and/or oxygen plasma is discussed. Both techniques remove carbon contamination from the Ge surface and simultaneously form an oxide passivation layer. Second, in situ ion sputtering in combination with germanium regrowth, which can lead to extremely clean and well-ordered Ge surfaces, is discussed. Finally, various wet-etching recipes are summarized, with focus on hydrofluoric acid (HF), NH4OH, and HCl. Despite the success of...

Monolithic integration of patterned BaTiO3 thin films on Ge wafers

Titanates exhibit electronic properties highly desirable for field effect transistors such as very high permittivity and ferroelectricity. However, the difficulty of chemically etching titanates hinders their commercial use in device manufacturing. Here, the authors report the selective area in finestra growth of highly crystalline BaTiO3 (BTO) within photolithographically defined openings of a sacrificial SiO2 layer on a Ge (001) wafer by molecular beam epitaxy. After the BaTiO3 deposition, the sacrificial SiO2 can be etched away, revealing isolated nanoscale gate stacks circumventing the need to etch the titanate thin film. Reflection high-energy electron diffraction in conjunction with scanning electron microscopy is carried out to confirm the crystallinity of the samples. X-ray diffraction is performed to determine the out-of-plane lattice constant and crystal quality of the BTO film. Electrical measurements are performed on electrically isolated Pt/BaTiO3/SrTiO3/Ge capacitor devices.Titanates exhibit electronic properties highly desirable for field effect transistors such as very high permittivity and ferroelectricity. However, the difficulty of chemically etching titanates hinders their commercial use in device manufacturing. Here, the authors report the selective area in finestra growth of highly crystalline BaTiO3 (BTO) within photolithographically defined openings of a sacrificial SiO2 layer on a Ge (001) wafer by molecular beam epitaxy. After the BaTiO3 deposition, the sacrificial SiO2 can be etched away, revealing isolated nanoscale gate stacks circumventing the need to etch the titanate thin film. Reflection high-energy electron diffraction in conjunction with scanning electron microscopy is carried out to confirm the crystallinity of the samples. X-ray diffraction is performed to determine the out-of-plane lattice constant and crystal quality of the BTO film. Electrical measurements are performed on electrically isolated Pt/BaTiO3/SrTiO3/Ge capacitor devices.

Polarization retention in ultra-thin barium titanate films on Ge(001)

We investigate polarization retention in 10 to 19 nm thick ferroelectric BaTiO3 (BTO) grown on Ge(001) by molecular beam epitaxy. The out-of-plane direction and reversibility of electric polarization were confirmed using piezoresponse force microscopy. After reverse-poling selected regions of the BTO films to a value P with a biased atomic-force microscope tip, we monitored relaxation of their net polarization for as long as several weeks using optical second-harmonic generation microscopy. All films retained reversed polarization throughout the observation period. 10 nm-thick BTO films relaxed monotonically to a saturation value of 0.9 P after 27 days and 19 nm films to 0.75 P after 24 h. Polarization dynamics are discussed in the context of a 1D polarization relaxation/kinetics model.We investigate polarization retention in 10 to 19 nm thick ferroelectric BaTiO3 (BTO) grown on Ge(001) by molecular beam epitaxy. The out-of-plane direction and reversibility of electric polarization were confirmed using piezoresponse force microscopy. After reverse-poling selected regions of the BTO films to a value P with a biased atomic-force microscope tip, we monitored relaxation of their net polarization for as long as several weeks using optical second-harmonic generation microscopy. All films retained reversed polarization throughout the observation period. 10 nm-thick BTO films relaxed monotonically to a saturation value of 0.9 P after 27 days and 19 nm films to 0.75 P after 24 h. Polarization dynamics are discussed in the context of a 1D polarization relaxation/kinetics model.

Advances of the development of a ferroelectric field-effect transistor on Ge(001)

Here we report the recent advances towards the ferroelectric field-effect on Ge(001). We will demonstrate carrier density modulation in the underlying Ge(001) substrate by switching the ferroelectric polarization in the epitaxial c-axis-oriented BaTiO3 on Ge. Recent results of patterning BaTiO3 for device applications and electrical properties of Pt/BTO/Ge heterostructures will be addressed.

Integration of ferroelectric BaTiO3 with Ge: The role of a SrTiO3 buffer layer investigated using aberration-corrected STEM

The integration of semiconductors with ferroelectrics having a controlled polarization direction is an ongoing and challenging topic of research. In this work, BaTiO3 (BTO)/SrTiO3 (STO) heterostructures were grown by molecular beam epitaxy either directly with STO substrates or by using 2-nm-thick STO buffer layers on Ge(001) substrates. Sharp, chemically abrupt interfaces and c-axis-oriented BTO films for both types of heterostructures were observed using aberration-corrected scanning transmission electron microscopy and elemental mapping. Anti-phase boundaries as well as ⟨100⟩ misfit dislocations were present in the BTO/STO samples, with the offsets of the dislocation cores varying by distances between 1 and 5 nm away from the BTO/STO interface. Conversely, misfit dislocations were not observed in the BTO/STO/Ge structure although vertical anti-phase boundaries were still common. Overall, the results emphasize the benefits of identifying a suitable buffer layer to ensure the growth of a high quality mat...

Characterization of a ferroelectric BaTiO 3 /SrTiO 3 heterostructure with interface-induced polarization

BaTiO3 (BTO) is a promising candidate for future applications in ferroelectric field-effect transistors because of its high permittivity and low-temperature ferroelectricity. For transistor devices, out-of-plane polarization of BTO, i.e., c-axis of BTO tetragonal structure along the growth direction, is preferred. In this work, BTO/STO heterostructures were deposited with strained interfaces in order to control the phase and polarization orientation. 15-20 nm thin films of single-crystal BTO were grown by molecular beam epitaxy (MBE) on either STO substrates or on 2-nm-thick STO buffer layers with Ge(001) substrates. When BTO is directly deposited on Ge substrates, there is a 45 in-plane rotation, and the reduced lattice parameter of Ge, 4.001 , is slightly larger than that of BTO, 3.994 . The BTO film is then under tensile strain and in-plane polarized [1]. Conversely, when BTO is deposited on SrTiO3 (STO) substrate or buffer layer (lattice constant 3.905 ), it is compressively strained and shows out-of-plane polarization [2]. Samples for TEM observation were prepared via standard cross-section method with argon-ion-milling. Aberration-corrected STEM images were recorded using a JEOL ARM 200F operated at 200 keV.