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Dive into the research topics where Paul Beecher is active.

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Featured researches published by Paul Beecher.


Journal of Applied Physics | 2007

Thermal and chemical vapor deposition of Si nanowires: Shape control, dispersion, and electrical properties

Alan Colli; A. Fasoli; Paul Beecher; Peyman Servati; Simone Pisana; Yong Qing Fu; Andrew J. Flewitt; W. I. Milne; J. Robertson; Caterina Ducati; S. De Franceschi; Stephan Hofmann; A. C. Ferrari

We investigate and compare complementary approaches to SiNW production in terms of yield, morphology control, and electrical properties. Vapor-phase techniques are considered, including chemical vapor deposition (with or without the assistance of a plasma) and thermal evaporation. We report Au-catalyzed nucleation of SiNWs at temperatures as low as 300°C using SiH4 as precursor. We get yields up to several milligrams by metal-free condensation of SiO powders. For all processes, we control the final nanostructure morphology. We then report concentrated and stable dispersions of SiNWs in solvents compatible with semiconducting organic polymers. Finally, we investigate the electrical response of intrinsic SiNWs grown by different methods. All our SiNWs exhibit p-type behavior and comparable performance, though in some cases ambipolar devices are observed. Thus, processing and morphology, rather than the growth technique, are key to achieve optimal samples for applications.


Semiconductor Science and Technology | 2009

Stability of thin film transistors incorporating a zinc oxide or indium zinc oxide channel deposited by a high rate sputtering process

Andrew J. Flewitt; James Dutson; Paul Beecher; Debjani Paul; Steve Wakeham; M E Vickers; Caterina Ducati; Stuart Speakman; W. I. Milne; Mike J. Thwaites

A novel rf sputtering technology in which a high density plasma is created in a remote chamber has been used to reactively deposit zinc oxide (ZnO) and indium zinc oxide (IZO) thin films at room temperature from metallic sputtering targets at deposition rates ∼50 nm min −1 , which is approximately an order of magnitude greater than that of rf magnetron sputtering. Thin film transistors have been fabricated using IZO with a maximum processing temperature of 120 ◦ C, which is defined by the curing of the photoresist used in patterning. Devices have a saturated field effect mobility of 10 cm 2 V −1 s −1 and a switching ratio in excess of 10 6 . Gate bias stress experiments performed at elevated temperatures show a consistent apparent increase in the field effect mobility with time, which is attributed to a charge trapping phenomenon.


Journal of Applied Physics | 2009

High performance nanocomposite thin film transistors with bilayer carbon nanotube-polythiophene active channel by ink-jet printing

Gen-Wen Hsieh; Flora M. Li; Paul Beecher; Arokia Nathan; Yiliang Wu; Beng S. Ong; W. I. Milne

Nanocomposite thin film transistors (TFTs) based on nonpercolating networks of single-walled carbon nanotubes (CNTs) and polythiophene semiconductor [poly[5,5′-bis(3-dodecyl-2-thienyl)-2,2′-bithiophene] (PQT-12)] thin film hosts are demonstrated by ink-jet printing. A systematic study on the effect of CNT loading on the transistor performance and channel morphology is conducted. With an appropriate loading of CNTs into the active channel, ink-jet printed composite transistors show an effective hole mobility of 0.23 cm2 V−1 s−1, which is an enhancement of more than a factor of 7 over ink-jet printed pristine PQT-12 TFTs. In addition, these devices display reasonable on/off current ratio of 105–106, low off currents of the order of 10 pA, and a sharp subthreshold slope (<0.8 V dec−1). The work presented here furthers our understanding of the interaction between polythiophene polymers and nonpercolating CNTs, where the CNT density in the bilayer structure substantially influences the morphology and transisto...


Nano Letters | 2008

Nanowire Lithography on Silicon

Alan Colli; A. Fasoli; Simone Pisana; Yong Qing Fu; Paul Beecher; W. I. Milne; A. C. Ferrari

Nanowire lithography (NWL) uses nanowires (NWs), grown and assembled by chemical methods, as etch masks to transfer their one-dimensional morphology to an underlying substrate. Here, we show that SiO2 NWs are a simple and compatible system to implement NWL on crystalline silicon and fabricate a wide range of architectures and devices. Planar field-effect transistors made of a single SOI-NW channel exhibit a contact resistance below 20 kOmega and scale with the channel width. Further, we assess the electrical response of NW networks obtained using a mask of SiO2 NWs ink-jetted from solution. The resulting conformal network etched into the underlying wafer is monolithic, with single-crystalline bulk junctions; thus no difference in conductivity is seen between a direct NW bridge and a percolating network. We also extend the potential of NWL into the third dimension, by using a periodic undercutting that produces an array of vertically stacked NWs from a single NW mask.


IEEE Transactions on Electron Devices | 2008

Zinc Oxide Nanostructures and High Electron Mobility Nanocomposite Thin Film Transistors

Flora M. Li; Gen-Wen Hsieh; Sharvari Dalal; Marcus C. Newton; Je Stott; Pritesh Hiralal; Arokia Nathan; Pa Warburton; Husnu Emrah Unalan; Paul Beecher; Andrew J. Flewitt; Ian K. Robinson; G.A.J. Amaratunga; W. I. Milne

This paper reports on the synthesis of zinc oxide (ZnO) nanostructures and examines the performance of nanocomposite thin-film transistors (TFTs) fabricated using ZnO dispersed in both n- and p-type polymer host matrices. The ZnO nanostructures considered here comprise nanowires and tetrapods and were synthesized using vapor phase deposition techniques involving the carbothermal reduction of solid-phase zinc-containing compounds. Measurement results of nanocomposite TFTs based on dispersion of ZnO nanorods in an n-type organic semiconductor ([6, 6]-phenyl-C61-butyric acid methyl ester) show electron field-effect mobilities in the range 0.3-0.6 cm2 V-1s-1, representing an approximate enhancement by as much as a factor of 40 from the pristine state. The on/off current ratio of the nanocomposite TFTs approach 106 at saturation with off-currents on the order of 10 pA. The results presented here, although preliminary, show a highly promising enhancement for realization of high-performance solution-processable n-type organic TFTs.


International Journal of Production Research | 2016

Distributed Manufacturing: scope, challenges and opportunities

Jagjit Singh Srai; Mukesh Kumar; Gary Graham; Wendy Phillips; James Tooze; Simon Ford; Paul Beecher; Baldev Raj; Mj Gregory; Manoj Kumar Tiwari; B. Ravi; Andy Neely; Ravi Shankar; Fiona Charnley; Ashutosh Tiwari

This discussion paper aims to set out the key challenges and opportunities emerging from distributed manufacturing (DM). We begin by describing the concept, available definitions and consider its evolution where recent production technology developments (such as additive and continuous production process technologies), digitisation together with infrastructural developments (in terms of IoT and big data) provide new opportunities. To further explore the evolving nature of DM, the authors, each of whom are involved in specific applications of DM research, examine through an expert panel workshop environment emerging DM applications involving new production and supporting infrastructural technologies. This paper presents these generalisable findings on DM challenges and opportunities in terms of products, enabling production technologies and the impact on the wider production and industrial system. Industry structure and location of activities are examined in terms of the democratising impact on participating network actors. The paper concludes with a discussion on the changing nature of manufacturing as a result of DM, from the traditional centralised, large-scale, long lead-time forecast-driven production operations to a new DM paradigm where manufacturing is a decentralised, autonomous near end user-driven activity. A forward research agenda is proposed that considers the impact of DM on the industrial and urban landscape.


Applied Physics Letters | 2007

Use of nanocomposites to increase electrical “gain” in chemical sensors

Sara M. C. Vieira; Paul Beecher; Ibraheem Haneef; Florin Udrea; W. I. Milne; Manoj A. G. Namboothiry; David L. Carroll; Jonghyurk Park; Sunglyul Maeng

We have investigated chemical sensors by combining silicon-on-insulator complementary-metal-oxide-semiconducting microtechnology with nanotechnology. The sensing materials were single-walled carbon nanotubes and poly(3,3‴-dialkyl-quarterthiophone). The devices containing only nanotubes or pure polymer provided minimal response, whereas the nanocomposite material (1wt.% of nanotubes in the polymer) provided excellent sensitivity/selectivity to the particular analyte monitored (hydrogen, ammonia, and acetone). We observed that even small amounts of gas doping (10ppb) resulted in exponential changes in the overall conductivity profile of the nanocomposite sensor, thus anticipating an element of “gain” within the chemical sensor.


Applied Physics Letters | 2004

Charge transport in a CoPt3 nanocrystal microwire

Paul Beecher; G. De Marzi; Aidan J. Quinn; Gareth Redmond; Elena V. Shevchenko; Horst Weller

The electrical characteristics of single CoPt3 nanocrystal microwires formed by magnetic field-directed growth from colloidal solutions are presented. The wires comprise disordered assemblies of discrete nanocrystals, separated from each other by protective organic ligand shells. Electrical data indicate that the activated charge transport properties of the wires are determined by the nanocrystal charging energy, governed by the size and capacitance of the individual nanocrystals. Focused ion beam-assisted deposition of Pt metal at the wire-electrode junctions is employed to optimize the wire-electrode contacts, whilst maintaining the nanocrystal-dominated transport characteristics of these one-dimensional nanocrystal structures.


Journal of Applied Physics | 2007

Ink-jet printing of carbon nanotube thin film transistors

Paul Beecher; Peyman Servati; Alex Rozhin; Alan Colli; Vittorio Scardaci; Simone Pisana; Tawfique Hasan; Andrew J. Flewitt; J. Robertson; Gen-Wen Hsieh; Flora M. Li; Arokia Nathan; A. C. Ferrari; W. I. Milne


Chemistry of Materials | 2005

DNA-Templated Assembly of Conducting Gold Nanowires between Gold Electrodes on a Silicon Oxide Substrate

Andrea Ongaro; Fionn Griffin; Paul Beecher; Lorraine C. Nagle; Daniela Iacopino; Aidan J. Quinn; and Gareth Redmond; Donald Fitzmaurice

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W. I. Milne

University of Cambridge

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Flora M. Li

University of Cambridge

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Aidan J. Quinn

Tyndall National Institute

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Gareth Redmond

University College Dublin

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Gen-Wen Hsieh

Industrial Technology Research Institute

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