Peter Sutter

Epitaxial graphene on ruthenium

Graphene has been used to explore the fascinating electronic properties of ideal two-dimensional carbon, and shows great promise for quantum device architectures. The primary method for isolating graphene, micromechanical cleavage of graphite, is difficult to scale up for applications. Epitaxial growth is an attractive alternative, but achieving large graphene domains with uniform thickness remains a challenge, and substrate bonding may strongly affect the electronic properties of epitaxial graphene layers. Here, we show that epitaxy on Ru(0001) produces arrays of macroscopic single-crystalline graphene domains in a controlled, layer-by-layer fashion. Whereas the first graphene layer indeed interacts strongly with the metal substrate, the second layer is almost completely detached, shows weak electronic coupling to the metal, and hence retains the inherent electronic structure of graphene. Our findings demonstrate a route towards rational graphene synthesis on transition-metal templates for applications in electronics, sensing or catalysis.

Epitaxial graphene: How silicon leaves the scene

Large and homogeneous layers of graphene are obtained by annealing silicon carbide in a dense noble gas atmosphere that controls the way in which silicon sublimates. Epitaxial graphene thus gets back on track towards future electronic applications.

Chemistry under Cover: Tuning Metal―Graphene Interaction by Reactive Intercalation

Intercalation of metal atoms is an established route for tuning the coupling of graphene to a substrate. The extension to reactive species such as oxygen would set the stage for a wide spectrum of interfacial chemistry. Here we demonstrate the controlled modification of a macroscopic graphene-metal interface by oxygen intercalation. The selective oxidation of a ruthenium surface beneath graphene lifts the strong metal-carbon coupling and restores the characteristic Dirac cones of isolated monolayer graphene. Our experiments establish the competition between low-temperature oxygen intercalation and graphene etching at higher temperatures and suggest that small molecules can populate the space between graphene and metals, with the adsorbate-metal interaction being modified significantly by the presence of graphene. These findings open up new avenues for the processing of graphene for device applications and for performing chemical reactions in the confined space between a metal surface and a graphene sheet.

Interface Formation in Monolayer Graphene-Boron Nitride Heterostructures

The ability to control the formation of interfaces between different materials has become one of the foundations of modern materials science. With the advent of two-dimensional (2D) crystals, low-dimensional equivalents of conventional interfaces can be envisioned: line boundaries separating different materials integrated in a single 2D sheet. Graphene and hexagonal boron nitride offer an attractive system from which to build such 2D heterostructures. They are isostructural, nearly lattice-matched, and isoelectronic, yet their different band structures promise interesting functional properties arising from their integration. Here, we use a combination of in situ microscopy techniques to study the growth and interface formation of monolayer graphene-boron nitride heterostructures on ruthenium. In a sequential chemical vapor deposition process, boron nitride grows preferentially at the edges of existing monolayer graphene domains, which can be exploited for synthesizing continuous 2D membranes of graphene embedded in boron nitride. High-temperature growth leads to intermixing near the interface, similar to interfacial alloying in conventional heterostructures. Using real-time microscopy, we identify processes that eliminate this intermixing and thus pave the way to graphene-boron nitride heterostructures with atomically sharp interfaces.

Tin Disulfide—An Emerging Layered Metal Dichalcogenide Semiconductor: Materials Properties and Device Characteristics

Layered metal dichalcogenides have attracted significant interest as a family of single- and few-layer materials that show new physics and are of interest for device applications. Here, we report a comprehensive characterization of the properties of tin disulfide (SnS2), an emerging semiconducting metal dichalcogenide, down to the monolayer limit. Using flakes exfoliated from layered bulk crystals, we establish the characteristics of single- and few-layer SnS2 in optical and atomic force microscopy, Raman spectroscopy and transmission electron microscopy. Band structure measurements in conjunction with ab initio calculations and photoluminescence spectroscopy show that SnS2 is an indirect bandgap semiconductor over the entire thickness range from bulk to single-layer. Field effect transport in SnS2 supported by SiO2/Si suggests predominant scattering by centers at the support interface. Ultrathin transistors show on-off current ratios >10(6), as well as carrier mobilities up to 230 cm(2)/(V s), minimal hysteresis, and near-ideal subthreshold swing for devices screened by a high-k (deionized water) top gate. SnS2 transistors are efficient photodetectors but, similar to other metal dichalcogenides, show a relatively slow response to pulsed irradiation, likely due to adsorbate-induced long-lived extrinsic trap states.

Electronic Structure of Few-Layer Epitaxial Graphene on Ru(0001)

The electronic structure of epitaxial monolayer, bilayer, and trilayer graphene on Ru(0001) was determined by selected-area angle-resolved photoelectron spectroscopy (micro-ARPES). Micro-ARPES band maps provide evidence for a strong electronic coupling between monolayer graphene and the adjacent metal, which causes the complete disruption of the graphene pi-bands near the Fermi energy. However, the perturbation by the metal decreases rapidly with the addition of further graphene sheets, and already an epitaxial graphene bilayer on Ru recovers the characteristic Dirac cones of isolated monolayer graphene. A graphene trilayer on Ru behaves like free-standing bilayer graphene. Density-functional theory based calculations show that this decoupling is due to the efficient passivation of metal d-states by the interfacial graphene layer.

Monolayer graphene growth on Ni(111) by low temperature chemical vapor deposition

In contrast to the commonly employed high temperature chemical vapor deposition growth that leads to multilayer graphene formation by carbon segregation from the bulk, we demonstrate that below 600 °C graphene can be grown in a self-limiting monolayer growth process. Optimum growth is achieved at ∼550 °C. Above this temperature, carbon diffusion into the bulk is limiting the surface growth rate, while at temperatures below ∼500 °C a competing surface carbide phase impedes graphene formation.

Chemical Vapor Deposition and Etching of High-Quality Monolayer Hexagonal Boron Nitride Films

The growth of large-area hexagonal boron nitride (h-BN) monolayers on catalytic metal substrates is a topic of scientific and technological interest. We have used real-time microscopy during the growth process to study h-BN chemical vapor deposition (CVD) from borazine on Ru(0001) single crystals and thin films. At low borazine pressures, individual h-BN domains nucleate sparsely, grow to macroscopic dimensions, and coalescence to form a closed monolayer film. A quantitative analysis shows borazine adsorption and dissociation predominantly on Ru, with the h-BN covered areas being at least 100 times less reactive. We establish strong effects of hydrogen added to the CVD precursor gas in controlling the in-plane expansion and morphology of the growing h-BN domains. High-temperature exposure of h-BN/Ru to pure hydrogen causes the controlled edge detachment of B and N and can be used as a clean etching process for h-BN on metals.

In situ liquid cell electron microscopy of the solution growth of Au-Pd core-shell nanostructures.

Using in situ liquid cell electron microscopy we investigate Pd growth in dilute aqueous Pd salt solutions containing Au nanoparticle seeds. Au-Pd core-shell nanostructures are formed via deposition of Pd(0), generated by the reduction of chloropalladate complexes by radicals, such as hydrated electrons (eaq(-)) induced by the electron beam in the solution. The size and shape of the Au seeds determine the morphology of the Pd shells, via preferential Pd incorporation in low-coordination sites and avoidance of extended facets. Analysis of the Pd incorporation on Au particles at different distances from a focused electron beam provides a quantitative picture of the growth process and shows that the growth is limited by the diffusion of eaq(-) in the solution.

Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells

Materials providing broadband light antireflection have applications as highly transparent window coatings, military camouflage, and coatings for efficiently coupling light into solar cells and out of light-emitting diodes. In this work, densely packed silicon nanotextures with feature sizes smaller than 50 nm enhance the broadband antireflection compared with that predicted by their geometry alone. A significant fraction of the nanotexture volume comprises a surface layer whose optical properties differ substantially from those of the bulk, providing the key to improved performance. The nanotexture reflectivity is quantitatively well-modelled after accounting for both its profile and changes in refractive index at the surface. We employ block copolymer self-assembly for precise and tunable nanotexture design in the range of ~10-70 nm across macroscopic solar cell areas. Implementing this efficient antireflection approach in crystalline silicon solar cells significantly betters the performance gain compared with an optimized, planar antireflection coating.