Philipp Ebert

Hidden surface states at non-polar GaN (101¯0) facets: Intrinsic pinning of nanowires

We investigate the electronic structure of the GaN(101¯0) prototype surface for GaN nanowire sidewalls. We find a paradoxical situation that a surface state at all k points in the bandgap cannot be probed by conventional scanning tunneling microscopy, due to a dispersion characterized by a steep minimum with low density of states (DOS) and an extremely flat maximum with high DOS. Based on an analysis of the decay behavior into the vacuum, we identify experimentally the surface state minimum 0.6 ± 0.2 eV below the bulk conduction band in the gap. Hence, GaN nanowires with clean (101¯0) sidewall facets are intrinsically pinned.

Atomic resolution in tunneling induced light emission from GaAs(110)

A cryogenic scanning tunneling microscope is used to induce band edge luminescence from GaAs(110). The emission intensity varies within the unit mesh of the surface. This atomic resolution reflects variations of the efficiency of hole injection into states at the valence band maximum. Moreover, the hole injection efficiency is modulated by local potential fluctuations due to dopants.

Nonstoichiometric Low-Temperature Grown GaAs Nanowires

The structural and electronic properties of nonstoichiometric low-temperature grown GaAs nanowire shells have been investigated with scanning tunneling microscopy and spectroscopy, pump-probe reflectivity, and cathodoluminescence measurements. The growth of nonstoichiometric GaAs shells is achieved through the formation of As antisite defects, and to a lower extent, after annealing, As precipitates. Because of the high density of atomic steps on the nanowire sidewalls, the Fermi level is pinned midgap, causing the ionization of the subsurface antisites and the formation of depleted regions around the As precipitates. Controlling their incorporation offers a way to obtain unique electronic and optical properties that depart from the ones found in conventional GaAs nanowires.

Growing extremely thin bulklike metal film on a semiconductor surface: Monolayer Al(111) on Si(111)

We report combined scanning tunneling microscopy, x-ray photoelectron emission spectroscopy, electron energy loss spectroscopy, and theoretical study of the growth of ultrathin Al film on the Si(111) substrate. We show that by (i) a modification of the substrate reconstruction with a 3×3 surface and (ii) a choice of materials with commensurate lattices, atomically flat film can be obtained even at the ultimate one monolayer limit, while maintaining a bulklike atomic structure. Detailed analysis shows that this monolayer Al(111)-1×1 film is electronically decoupled from the Si substrate, and it shows metallic characteristics.

Atomically Resolved Electronic States and Correlated Magnetic Order at Termination Engineered Complex Oxide Heterointerfaces

We map electronic states, band gaps, and interface-bound charges at termination-engineered BiFeO3/La0.7Sr0.3MnO3 interfaces using atomically resolved cross-sectional scanning tunneling microscopy. We identify a delicate interplay of different correlated physical effects and relate these to the ferroelectric and magnetic interface properties tuned by engineering the atomic layer stacking sequence at the interfaces. This study highlights the importance of a direct atomically resolved access to electronic interface states for understanding the intriguing interface properties in complex oxides.

Dislocation bending in GaN/step-graded (Al,Ga)N/AlN buffer layers on Si(111) investigated by STM and STEM

ABSTRACT The distribution and bending of dislocations in GaN/step-graded (Al,Ga)N/AlN buffer layers grown on Si(111) are investigated by cross-sectional scanning tunnelling microscopy (STM) and scanning transmission electron microscopy (STEM). We observe dislocations with -type Burgers vector intersecting the m-plane cleavage surface and having line directions bent off the [0001] growth direction toward non-polar directions. The spatial distribution of dislocations intersecting the m-plane cleavage surface indicates consecutive bending of dislocations due to strain at interfaces between subsequent lattice mismatched buffer layers and at doping junctions, reducing the density of threading dislocations at the (0001) growth front. No interface misfit dislocations, v-shaped defects, or loss of crystalline quality are observed, demonstrating the high performance of the step-graded (Al,Ga)N/AlN buffer layers on Si for relaxing the lattice constant without creating large defect concentrations.

Tuning Band Gap and Work Function Modulations in Monolayer hBN/Cu(111) Heterostructures with Moiré Patterns

The moiré pattern formed between a two-dimensional (2D) material and the substrate has played a crucial role in tuning the electronic structure of the 2D material. Here, by using scanning tunneling microscopy and spectroscopy, we found a moiré-pattern-dependent band gap and work function modulation in hexagonal boron nitride (hBN)/Cu(111) heterostructures, whose amplitudes increase with the moiré pattern wavelength. Moreover, the work function modulation shifts agree well with the conduction band edge shifts, indicating a spatially constant electron affinity for the hBN layer. Density functional theory calculations showed that these observations in hBN/Cu(111) heterostructures mainly originated from the hybridization of the N 3p z orbital and Cu 4s orbital in different atomic configurations. Our results show that the twist-angle dependence of moiré patterns in hBN/Cu(111) heterostructures can be used to tailor the electronic properties including band gap and work function.

Catalystlike Behavior of Si Adatoms in the Growth of Monolayer Al Film on Si(111)

The formation mechanism of monolayer Al(111)1x1 film on the Si(111) radical3x radical3-Al substrate was studied by scanning tunneling microscopy and first-principles calculations. We found that the Si adatoms on the radical3x radical3-Al substrate play important roles in the growth process. The growth of Al-1x1 islands is mediated by the formation and decomposition of SiAl(2) clusters. Based on experiments and theoretical simulations we propose a model where free Si atoms exhibit a catalystlike behavior by capturing and releasing Al atoms during the Al film growth.