Verena Portz

Strain and compositional fluctuations in Al0.81In0.19N/GaN heterostructures

The strain and compositional fluctuations of nearly lattice-matched Al0.81In0.19N/GaN heterostructures are investigated by cross-sectional scanning tunneling microscopy and selected area electron diffraction measurements in scanning electron transmission microscopy. The presence of strain induces height modulations governed by different roughness components at the cleavage surfaces. The surface height modulations are compatible with a relaxation of alternatingly compressive and tensile strained domains, indicating compositional fluctuations. Changes of the a lattice constant are traced to interface misfit edge dislocations. The dislocations induce steps increasing the roughness within the Al0.81In0.19N layers.

Dislocation bending in GaN/step-graded (Al,Ga)N/AlN buffer layers on Si(111) investigated by STM and STEM

ABSTRACT The distribution and bending of dislocations in GaN/step-graded (Al,Ga)N/AlN buffer layers grown on Si(111) are investigated by cross-sectional scanning tunnelling microscopy (STM) and scanning transmission electron microscopy (STEM). We observe dislocations with -type Burgers vector intersecting the m-plane cleavage surface and having line directions bent off the [0001] growth direction toward non-polar directions. The spatial distribution of dislocations intersecting the m-plane cleavage surface indicates consecutive bending of dislocations due to strain at interfaces between subsequent lattice mismatched buffer layers and at doping junctions, reducing the density of threading dislocations at the (0001) growth front. No interface misfit dislocations, v-shaped defects, or loss of crystalline quality are observed, demonstrating the high performance of the step-graded (Al,Ga)N/AlN buffer layers on Si for relaxing the lattice constant without creating large defect concentrations.