Philipp Schroth

A portable molecular beam epitaxy system for in situ x-ray investigations at synchrotron beamlines

A portable synchrotron molecular beam epitaxy (MBE) system is designed and applied for in situ investigations. The growth chamber is equipped with all the standard MBE components such as effusion cells with shutters, main shutter, cooling shroud, manipulator, reflection high energy electron diffraction setup, and pressure gauges. The characteristic feature of the system is the beryllium windows which are used for in situ x-ray measurements. An UHV sample transfer case allows in vacuo transfer of samples prepared elsewhere. We describe the system design and demonstrate its performance by investigating the annealing process of buried InGaAs self-organized quantum dots.

Polytypism in GaAs nanowires: determination of the interplanar spacing of wurtzite GaAs by X-ray diffraction

In GaAs nanowires grown along the cubic [111]c direction, zinc blende and wurtzite arrangements have been observed in their stacking sequence, since the energetic barriers for nucleation are typically of similar order of magnitude. It is known that the interplanar spacing of the (111)c Ga (or As) planes in the zinc blende polytype varies slightly from the wurtzite polytype. However, different values have been reported in the literature. Here, the ratio of the interplanar spacing of these polytypes is extracted based on X-ray diffraction measurements for thin GaAs nanowires with a mean diameter of 18-25 nm. The measurements are performed with a nano-focused beam which facilitates the separation of the scattering of nanowires and of parasitic growth. The interplanar spacing of the (111)c Ga (or As) planes in the wurtzite arrangement in GaAs nanowires is observed to be 0.66% ± 0.02% larger than in the zinc blende arrangement.

Retrieving the displacement of strained nanoobjects: the impact of bounds for the scattering magnitude in direct space

Coherent X-ray diffraction imaging (CXDI) of the displacement field and strain distribution of nanostructures in kinematic far-field conditions requires solving a set of non-linear and non-local equations. One approach to solving these equations, which utilizes only the objects geometry and the intensity distribution in the vicinity of a Bragg peak as a priori knowledge, is the HIO+ER-algorithm. Despite its success for a number of applications, reconstruction in the case of highly strained nanostructures is likely to fail. To overcome the algorithms current limitations, we propose the HIO(O(R))(M)+ER(M)-algorithm which allows taking advantage of additional a priori knowledge of the local scattering magnitude and remedies HIO+ERs stagnation by incorporation of randomized overrelaxation at the same time. This approach achieves significant improvements in CXDI data analysis at high strains and greatly reduces sensitivity to the reconstructions initial guess. These benefits are demonstrated in a systematic numerical study for a periodic array of strained silicon nanowires. Finally, appropriate treatment of reciprocal space points below noise level is investigated.

Radial Growth of Self-Catalyzed GaAs Nanowires and the Evolution of the Liquid Ga-Droplet Studied by Time-Resolved in Situ X-ray Diffraction

We report on a growth study of self-catalyzed GaAs nanowires based on time-resolved in situ X-ray structure characterization during molecular-beam-epitaxy in combination with ex situ scanning-electron-microscopy. We reveal the evolution of nanowire radius and polytypism and distinguish radial growth processes responsible for tapering and side-wall growth. We interpret our results using a model for diameter self-stabilization processes during growth of self-catalyzed GaAs nanowires including the shape of the liquid Ga-droplet and its evolution during growth.

Asymmetric skew X-ray diffraction at fixed incidence angle: application to semiconductor nano-objects

A procedure for obtaining three-dimensionally resolved reciprocal-space maps in a skew X-ray diffraction geometry is described. The geometry allows tuning of the information depth in the range from tens of micrometres for symmetric skew diffraction down to tens of nanometres for strongly asymmetric skew geometries, where the angle of incidence is below the critical angle of total external reflection. The diffraction data are processed using a rotation matrix formalism. The whole three-dimensional reciprocal-space map can be measured by performing a single azimuthal rotation of the sample and using a two-dimensional detector, while keeping the angle of incidence and the X-ray information depth fixed (FIXD method). Having a high surface sensitivity under grazing-incidence conditions, the FIXD method can be applied to a large variety of Bragg reflections, particularly polar ones, which provide information on strain and chemical composition separately. In contrast with conventional grazing-incidence diffraction, the FIXD approach reveals, in addition to the lateral (in-plane) components, the vertical (out-of-plane) component of the strain field, and therefore allows the separation of the scattering contributions of strained epitaxial nanostructures by their vertical misfit. The potential of FIXD is demonstrated by resolving the diffraction signal from a single layer of InGaN quantum dots grown on a GaN buffer layer. The FIXD approach is suited to the study of free-standing and covered near-surface nano-objects, as well as vertically extended multilayer structures.

Perspectives and limitations of symmetric X-ray Bragg reflections for inspecting polytypism in nanowires

X-ray diffraction, possibly time-resolved during growth or annealing, is an important technique for the investigation of polytypism in free-standing nanowires. A major advantage of the X-ray diffraction approach for adequately chosen beam conditions is its high statistical significance in comparison with transmission electron microscopy. In this manuscript the interpretation of such X-ray intensity distribution is discussed, and is shown to be non-trivial and non-unique given measurements of the [111]c or [333]c reflection of polytypic nanowires grown in the (111)c direction. In particular, the diffracted intensity distributions for several statistical distributions of the polytypes inside the nanowires are simulated and compared. As an example, polytypic GaAs nanowires are employed, grown on a Si-(111) substrate with an interplanar spacing of the Ga (or As) planes in the wurtzite arrangement that is 0.7% larger than in the zinc blende arrangement along the (111)c direction. Most importantly, ambiguities of high experimental relevance in the case of strongly fluctuating length of the defect-free polytype segments in the nanowires are demonstrated. As a consequence of these ambiguities, a large set of deviations from the widely used Markov model for the stacking sequences of the nanowires cannot be detected in the X-ray diffraction data. Thus, the results here are of high relevance for the proper interpretation of such data.