Pier J. A. Sazio

Microstructured optical fibers as high-pressure microfluidic reactors

Deposition of semiconductors and metals from chemical precursors onto planar substrates is a well-developed science and technology for microelectronics. Optical fibers are an established platform for both communications technology and fundamental research in photonics. Here, we describe a hybrid technology that integrates key aspects of both engineering disciplines, demonstrating the fabrication of tubes, solid nanowires, coaxial heterojunctions, and longitudinally patterned structures composed of metals, single-crystal semiconductors, and polycrystalline elemental or compound semiconductors within microstructured silica optical fibers. Because the optical fibers are constructed and the functional materials are chemically deposited in distinct and independent steps, the full design flexibilities of both platforms can now be exploited simultaneously for fiber-integrated optoelectronic materials and devices.

Zinc Selenide Optical Fibers

Semiconductor waveguide fabrication for photonics applications is usually performed in a planar geometry. However, over the past decade a new field of semiconductor-based optical fiber devices has emerged. The drawing of soft chalcogenide semiconductor glasses together with low melting point metals allows for meters-long distributed photoconductive detectors, for example.[1,2] Crystalline unary semiconductors (e.g., Si, Ge) have been chemically deposited at high pressure into silica capillaries,[3,4] allowing the optical and electronic properties of these materials to be exploited for applications such as all-fiber optoelectronics.[5-7] In contrast to planar rib and ridge waveguides with rectilinear cross sections that generally give rise to polarization dependence, the cylindrical fiber waveguides have the advantage of a circular, polarization-independent cross section. Furthermore, the fiber pores, and thus the wires deposited in them, are exceptionally smooth[8] with extremely uniform diameter over their entire length. The high-pressure chemical vapor deposition (HPCVD) technique is simple, low cost, and flexible so that it can be modified to fill a range of capillaries with differing core dimensions, while high production rates can be obtained by parallel fabrication of multiple fibers in a single deposition. It can also be extended to fill the large number of micro- and nanoscale pores in microstructured optical fibers (MOFs), providing additional geometrical design flexibility to enhance the potential application base of the fiber devices.[9] Semiconductor fibers fabricated via HPCVD in silica pores also retain the inherent characteristics of silica fibers, including their robustness and compatibility with existing optical fiber infrastructure, thus presenting considerable advantages over fibers based on multicomponent soft glasses.

Low loss silicon fibers for photonics applications

Silicon fibers are fabricated using a high pressure chemical deposition technique to deposit the semiconductor material inside a silica capillary. The silicon is deposited in an amorphous state into pure silica capillaries and can be crystallized to polysilicon after the deposition via a high temperature anneal. Optical transmission measurements of various amorphous and polycrystalline core materials were performed in order to determine their linear losses. Incorporating silicon functionality inside the fiber geometry opens up new possibilities for the next generation of integrated silicon photonics devices.

Electrodeposition of metals from supercritical fluids

Electrodeposition is a widely used materials-deposition technology with a number of unique features, in particular, the efficient use of starting materials, conformal, and directed coating. The properties of the solvent medium for electrodeposition are critical to the techniques applicability. Supercritical fluids are unique solvents which give a wide range of advantages for chemistry in general, and materials processing in particular. However, a widely applicable approach to electrodeposition from supercritical fluids has not yet been developed. We present here a method that allows electrodeposition of a range of metals from supercritical carbon dioxide, using acetonitrile as a co-solvent and supercritical difluoromethane. This method is based on a careful selection of reagent and supporting electrolyte. There are no obvious barriers preventing this method being applied to deposit a range of materials from many different supercritical fluids. We present the deposition of 3-nm diameter nanowires in mesoporous silica templates using this methodology.

Nonlinear transmission properties of hydrogenated amorphous silicon core optical fibers.

The nonlinear properties of a low loss hydrogenated amorphous silicon core fiber have been characterized for transmission of high power pulses at 1540 nm. Numerical modelling of the pulse propagation in the amorphous core material was used to establish the two-photon absorption, free-carrier absorption and the nonlinear refractive index, which were found to be larger than the values typical for crystalline silicon. Calculation of a nonlinear figure of merit demonstrates the potential for these hydrogenated amorphous silicon core fibers to be used in nonlinear silicon photonics applications.

Silicon p‐i‐n Junction Fibers

Flexible Si p-i-n junction fibers made by high pressure chemical vapor deposition offer new opportunities in textile photovoltaics and optoelectronics, as exemplified by their photovoltaic properties, gigahertz bandwidth for photodetection, and ability to waveguide light.

Extreme electronic bandgap modification in laser-crystallized silicon optical fibres

For decades now, silicon has been the workhorse of the microelectronics revolution and a key enabler of the information age. Owing to its excellent optical properties in the near- and mid-infrared, silicon is now promising to have a similar impact on photonics. The ability to incorporate both optical and electronic functionality in a single material offers the tantalizing prospect of amplifying, modulating and detecting light within a monolithic platform. However, a direct consequence of silicons transparency is that it cannot be used to detect light at telecommunications wavelengths. Here, we report on a laser processing technique developed for our silicon fibre technology through which we can modify the electronic band structure of the semiconductor material as it is crystallized. The unique fibre geometry in which the silicon core is confined within a silica cladding allows large anisotropic stresses to be set into the crystalline material so that the size of the bandgap can be engineered. We demonstrate extreme bandgap reductions from 1.11 eV down to 0.59 eV, enabling optical detection out to 2,100 nm.

All-optical modulation of laser light in amorphous silicon-filled microstructured optical fibers

Amorphous silicon is deposited within optical fibers by a high pressure microfluidic deposition process and characterized via Raman spectroscopy. All-optical modulation of 1.55 µm light guided through the silicon core is demonstrated using the free carrier absorption generated by a 532 nm pump pulse. Modulation depths of up to 8.26 dB and modulation frequencies of up to 1.4 MHz are demonstrated.

Electrical and Raman characterization of silicon and germanium-filled microstructured optical fibers

Extreme aspect ratio tubes and wires of polycrystalline silicon and germanium have been deposited within silica microstructured optical fibers using high-pressure precursors, demonstrating the potential of a platform technology for the development of in-fiber optoelectronics. Microstructural studies of the deposited material using Raman spectroscopy show effects due to strain between core and cladding and the presence of amorphous and polycrystalline phases for silicon. Germanium, in contrast, is more crystalline and less strained. This in-fiber device geometry is utilized for two- and three-terminal electrical characterization of the key parameters of resistivity and carrier type, mobility and concentration

Large mode area silicon microstructured fiber with robust dual mode guidance

A silicon microstructured fiber has been designed and fabricated using a pure silica photonic bandgap guiding fiber as a 3D template for materials deposition. The resulting silicon fiber has a micron sized core but with a small core-cladding index contrast so that it only supports two guided modes. It will be shown that by using the microstructured template this fiber exhibits a number of similar guiding properties to the more traditional index guiding air-silica structures. The large mode areas and low optical losses measured for the silicon microstructured fiber demonstrate its potential to be integrated with existing fiber infrastructures.