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Featured researches published by Piero Sferlazzo.


Review of Scientific Instruments | 2008

High resolution energy analyzer for broad ion beam characterization

Viktor Kanarov; D. Siegfried; Piero Sferlazzo; Alan V. Hayes; Rustam Yevtukhov

Characterization of the ion energy distribution function (IEDF) of low energy high current density ion beams by conventional retarding field and deflection type energy analyzers is limited due to finite ion beam emittance and beam space charge spreading inside the analyzer. These deficiencies are, to a large extent, overcome with the recent development of the variable-focusing retarding field energy analyzer (RFEA), which has a cylindrical focusing electrode preceding the planar retarding grid. The principal concept of this analyzer is conversion of a divergent charged particle beam into a quasiparallel beam before analyzing it by the planar retarding field. This allows analysis of the beam particle total kinetic energy distribution with greatly improved energy resolution. Whereas this concept was first applied to analyze 5-10 keV pulsed electron beams, the present authors have adapted it to analyze the energy distribution of a low energy (<or=1 KeV) broad ion beam. In this paper we describe the RFEA design, which was modified from the original, mainly as required by the specifics of broad ion beam energy analysis, and the device experimental characterization and modeling results. Among the modifications, an orifice electrode placed in front of the RFEA provides better spatial resolution of the broad ion beam ion optics emission region and reduces the beam plasma density in the vicinity of analyzer entry. An electron repeller grid placed in front of the RFEA collector was found critical for suppressing secondary electrons, both those incoming to the collector and those released from its surface, and improved energy spectrum measurement repeatability and accuracy. The use of finer mesh single- and double-grid retarding structures reduces the retarding grid lens effect and improves the analyzer energy resolution and accuracy of the measured spectrum mean energy. However, additional analyzer component and configuration improvements did not further change the analyzed IEDF shape or mean energy value. This led us to conclude that the optimized analyzer construction provides an energy resolution considerably narrower than the investigated ion beam energy spectrum full width at half maximum, and the derived energy spectrum is an objective and accurate representation of the analyzed broad ion beam energy distribution characteristics. A quantitative study of the focusing voltage and retarding grid field effects based on the experimental data and modeling results have supported this conclusion.


Archive | 2007

Movable injectors in rotating disc gas reactors

Piero Sferlazzo; Alexander I. Gurary; Eric A. Armour; William E. Quinn; Steve Ting


Archive | 2010

Web Substrate Deposition System

Piero Sferlazzo; Martin Klein


Archive | 2007

Sputter deposition system and methods of use

Piero Sferlazzo; Ming Mao; Jinliang Chen; David Felsenthal; Robert Gabriel Hieronymi; Miroslav Eror


Archive | 2010

Continuous feed chemical vapor deposition system

Eric A. Armour; William E. Quinn; Piero Sferlazzo


Archive | 2010

Roll-to-roll chemical vapor deposition system

Eric A. Armour; William E. Quinn; Piero Sferlazzo


Archive | 2010

Apparatus and method for ultra-shallow implantation in a semiconductor device

Piero Sferlazzo


Archive | 2007

APPARATUS FOR CATHODIC VACUUM-ARC COATING DEPOSITION

B. Druz; Ivan I. Aksenov; Olexandr A. Luchaninov; Volodymyr E. Strelnytskiy; Volodymyr V. Vasylyev; Isaak Zaritskiy; Piero Sferlazzo


Archive | 2005

Method of sputter depositing an alloy on a substrate

Chih-Ling Lee; Adrian J. Devasahayam; Ming Mao; Chih-Ching Hu; Vincent Ip; Piero Sferlazzo


Archive | 2008

Method and apparatus for surface processing of a substrate using an energetic particle beam

B. Druz; Roger P. Fremgen; Alan V. Hayes; Viktor Kanarov; Robert Krause; Ira Reiss; Piero Sferlazzo

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