Pietro Corona

Method for manufacturing a semiconductor pressure sensor

Process for manufacturing an SOI wafer by annealing and oxidation of buried channels

Integrated differential pressure sensor and manufacturing process thereof

Process for manufacturing buried channels and cavities in semiconductor material wafers

Process for forming a buried cavity in a semiconductor material wafer and a buried cavity

Process for manufacturing low-cost and high-quality SOI substrates

Process for forming a buried cavity in a semiconductor material wafer

Process for manufacturing a microfluidic device with buried channels

Process for manufacturing a SOI wafer with buried oxide regions without cusps

Process for manufacturing a semiconductor wafer having SOI-insulated wells and semiconductor wafer thereby manufactured