Piotr Domanowski

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Abstract Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

Investigation of physicochemical and tribological properties of transparent oxide semiconducting thin films based on Ti-V oxides

In this paper investigations of structural and optical properties of nanocrystalline Ti-V oxide thin films are described. The films were deposited onto Corning 7059 glass using a modified reactive magnetron sputtering method. Structural investigations of prepared Ti-V oxides with vanadium addition of 19 at. % revealed amorphous structure, while incorporation of 21 and 23 at. % of vanadium resulted in V2O5 formation with crystallites sizes of 12.7 and 32.4 nm, respectively. All prepared thin films belong to transparent oxide semiconductors due to their high transmission level of ca. 60–75 % in the visible light range, and resistivity in the range of 3.3·102–1.4·105 Ωcm. Additionally, wettability and hardness tests were performed in order to evaluate the usefulness of the films for functional coatings.

Investigations of optical and surface properties of Ag single thin film coating as semitransparent heat reflective mirror

Abstract The paper presents results of optical and surface morphology investigations of semitransparent silver single thin films deposited on glass substrate in relation to their heat radiation treatment. The thickness of 15 nm for the silver thin films was selected using computer designing of optical spectra and the films were deposited using electron beam evaporation process. Optical transmission and reflection were investigated for as deposited samples and after exposition to heat radiation from quartz-halogen lamp. The changes in the optical spectra were observed which suggested degradation of deposited heat mirrors. Structure and surface morphology studies performed using scanning electron microscopy, X-ray photoelectron spectroscopy and atomic force microscopy allowed us to conclude about formation of nanometric silver islands, regularly distributed over the surface of the glass substrate after exposure to heat treatment.

Effect of the structure on biological and photocatalytic activity of transparent titania thin-film coatings

Abstract In this work, the effect of titanium dioxide (TiO2) thin film microstructure on photocatalytic and biological activity was described. The films were prepared by low-pressure and high-energy magnetron sputtering processes. The structural investigations performed by X-ray diffraction revealed that the films from both the processes were nanocrystalline. It was found that TiO2 prepared by low-pressure process had the anatase structure with crystallites in size of 20 nm, while the film deposited in high-energy process had the rutile form with crystallites in size of 5 nm. The analysis of surface topography with the aid of optical profiler showed that all prepared films were homogenous and their roughness was lower than 1 nm. The wettability studies revealed hydrophilic nature of both films. The values of water contact angle obtained for anatase and rutile films were equal to 40° and 49°, respectively. Both types of the thin films were photocatalitycally active, but rutile exhibited higher decomposition rate as compared to anatase. During the photocatalytic reaction in the presence of TiO2-rutile film after 12 hours of UV-Vis irradiation 30 % of phenol was decomposed, whereas in case of TiO2-anatase it was only 10 %. Moreover, the influence of as-deposited coatings on the growth of selected microbes (Staphylococcus aureus, Escherichia coli, Candida albicans) was examined. It was found that the structural properties of TiO2 had an effect on biological activity of these films.

Prototype System for Plasma Film Surface Modification

The paper presents a prototype system for modifying surface of a film that can be used in various industries. System allows for two-sided modification of the surface of the film under reduced pressure with a low temperature plasma use. During the surface treatment process, it is possible to dispense chemicals into vacuum chamber in gaseous form, which can create a thin coating on the surface of the film. The system enables the film modification process parameterization while monitoring its key parameters.