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Latest external collaboration on country level. Dive into details by clicking on the dots.

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Dive into the research topics where Qingyuan Han is active.

Publication


Featured researches published by Qingyuan Han.


Archive | 2001

Plasma ashing process

Carlo Waldfried; Orlando Escorcia; Qingyuan Han; Thomas Buckley; Palanikumaran Sakthivel


Archive | 2001

Ultraviolet curing process for porous low-K materials

Ralph Albano; Cory Bargeron; Ivan Berry; Jeff Bremmer; Orlando Escorcia; Qingyuan Han; Ari Margolis; Carlo Waldfried


Archive | 2003

Low temperature UV pretreating of porous low-k materials

Carlo Waldfried; Qingyuan Han; Orlando Escorcia; Ivan Berry; Jeff Bremmer; Phil Dembowski


Archive | 2003

Fluorine-free plasma curing process for porous low-k materials

Carlo Waldfried; Qingyuan Han; Orlando Escorcia; Ralph Albano; Ivan Berry; Atsushi Shiota


Archive | 2001

Plasma processing for porous silica thin film

Ivan L. Berry; Kyuha Chung; Qingyuan Han; Youfan Liu; Eric S. Moyer; Michael John Spaulding; Carlo Waldfried; Todd Bridgewater; Wei Chen


Archive | 2000

Plasma stripping method for removing photoresist and residues after etching

Ivan Louis Berry; Mahmoud Dahimene; Qingyuan Han; Sakthivel Palanikumaran; Ricky Ruffin; ルイス ベリー ザ サード イバン; ハン クイギュアン; サクシーベル パラニクマラン; ダヒメネ マームド; ラッフィン リッキー


MRS Proceedings | 2000

Study of Dry Photoresist Stripping Processes for Hydrogen Silsesquioxane Thin Films

Huey-Chiang Liou; Jerry Duel; Victor Finch; Qingyuan Han; Palani Sakthivel; Ricky Gaithersburg Ruffin


Archive | 2004

Procede de polymerisation plasma sans fluor de materiaux poreux a faible k

Carlo Waldfried; Qingyuan Han; Orlando Escorcia; Ralph Albano; Ivan Berry; Atsushi Shiota


Archive | 2004

Härtungsverfahren mit fluorfreiem plasma für poröse materialien mit niedriger dielektrizitätskonstante (low-k)

Ralph Albano; Ivan Berry; Orlando Escorcia; Qingyuan Han; Atsushi Shiota; Carlo Waldfried


Archive | 2004

Ultraviolett-aushärtprozesse für fortschrittliche materialien mit niedrigem k

Carlo Waldfried; Qingyuan Han; Orlando Escorcia; Iii Ivan L. Berry

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Wei Chen

Axcelis Technologies

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