Radko Gerard Bankras | Researchain

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Archive | 2005

Deposition of titanium nitride film within batch reactor

Radko Gerard Bankras; Blank Marinus J. De; Albert Hasper; Gert-Jan Snijders; Lieve Vandezande; ハスペルアルベルト; スネイダースゲルト−ジャン; ジェイ．デブランクマリナス; ゲラードバンクラスラドコ; バンデザンデリーベ

Archive | 2006

Chemical vapor deposition of TiN films in a batch reactor

Albert Hasper; Gert-Jan Snijders; Lieve Vandezande; Marinus J. De Blank; Radko Gerard Bankras

Archive | 2012

SEMICONDUCTOR PROCESSING APPARATUS INCLUDING A PLURALITY OF REACTORS, AND METHOD FOR PROVIDING THE SAME WITH PROCESS GAS

Theodorus Gerardus Maria Oosterlaken; Radko Gerard Bankras

Archive | 2015

Reactive curing process for semiconductor substrates

Bert Jongbloed; Dieter Pierreux; Cornelius A. van der Jeugd; Herbert Terhorst; Lucian Jdira; Radko Gerard Bankras; Theodorus Gerardus Maria Oosterlaken

Archive | 2016

METHOD FOR FORMING OXIDE LAYER BY OXIDIZING SEMICONDUCTOR SUBSTRATE WITH HYDROGEN PEROXIDE

Fu Tang; Michael Givens; Qi Xie; Jan Maes; Bert Jongbloed; Radko Gerard Bankras; Theodorus Gerardus Maria Oosterlaken; Dieter Pierreux; Werner Knaepen; Harald Profijt; Jeugd Cornelius A. Van Der

Archive | 2015

METHOD AND SYSTEM FOR DELIVERING HYDROGEN PEROXIDE TO A SEMICONDUCTOR PROCESSING CHAMBER

Bert Jongbloed; Dieter Pierreux; Cornelius A. van der Jeugd; Lucian Jdira; Radko Gerard Bankras; Theodorus Gerardus Maria Oosterlaken

International Journal of Intelligent and Cooperative Information Systems | 2010

Deposition of TiN films in a batch reactor

Albert Hasper; Gert-Jan Snijders; Lieve Vandezande; Marinus J. De Blank; Radko Gerard Bankras

Proceedings of the National Academy of Sciences of the United States of America | 2009

Novel Batch Titanium Nitride CVD Process for Advanced Metal Electrodes

Peter Zagwijn; Wilma Verweij; Dieter Pierreux; Ahmad Noureddine; Radko Gerard Bankras; Ed Oosterlaken; Gert-Jan Snijders; Marcel A. van den Hout; Paul F. Fischer; Ronald Joseph Wilhelm; Michael Knapp

Archive | 2005