Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Rafael Egger is active.

Publication


Featured researches published by Rafael Egger.


Optical Microlithography XVII | 2004

Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications

Tilmann Heil; Paul Gräupner; Reiner Garreis; Rafael Egger; Markus Brotsack; Jo Finders; Steve Hansen

The specific properties of the illumination system are of increasing importance for the realization of low-k1 applications in modern lithography. In this paper, we present numerical investigations of optical imaging performance using real illuminator pupils in contrast to conventional simulations based on an idealized tophat pupil assumption. We study the impact of non-idealized radial and azimuthal intensity distributions as well as the consequence of local in-homogeneities in the pupil. Furthermore, we discuss the effect of scanning, and details of the numerical implementation. We quantify the imaging impact of the different illumination pupils by computing the through pitch, and through focus behavior of several low-k1 applications. We demonstrate that the tophat assumption often does not provide sufficiently accurate results. In particular, for annular and multi-pole settings, the real radial, and azimuthal intensity distribution have to be taken in to account. Accordingly, we introduce a simple heuristic model describing the real illumination pupil. Using this smooth pupil model, we demonstrate a significantly improved imaging performance prediction accuracy. Local pupil inhomogeneities have a minor impact. For coherent, and conventional settings, finally, we find that a modified tophat assumption gives already sufficiently accurate results, and can be applied for predictive simulations.


Archive | 2005

Optical illumination system for creating a line beam

Holger Muenz; Alois Herkommer; Rafael Egger


Archive | 2006

Illumination system for a microlithgraphic exposure apparatus

Alexander Sohmer; Aurelian Dodoc; Heiko Feldmann; Wilhelm Ulrich; Gerhard Fürter; Rafael Egger; Artur Högele; Michael Raum


Archive | 2004

Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus

Wolfgang Singer; Markus Deguenther; Birgit Kuerz; Rafael Egger; Johannes Wangler; Manfred Maul


Archive | 2007

Apparatus for laser annealing of large substrates and method for laser annealing of large substrates

Rafael Egger; Piotr Marczuk; Wolfgang Seifert; Thorsten Tritschler; Markus Zenzinger; Willi Anderl; Jörg Walther


Archive | 2007

Homogenizer with reduced interference

Rafael Egger; Holger Münz


Archive | 2005

Illumination System of a Microlithographic Exposure Apparatus

Wolfgang Singer; Johannes Wangler; Rafael Egger; Wilhelm Ulrich


Archive | 2014

Optisches Beleuchtungssystem zum Erzeugen eines Linienstrahls

Rafael Egger; Alois Herkommer; Holger Muenz


Archive | 2006

BEAM SEPARATING OPTICAL ELEMENT

Maire Michel Le; Thorsten Tritschler; Vitaly Shklover; Holger Münz; Rafael Egger; Gerhard Derst


Archive | 2005

Systeme d'eclairage optique pour formation de faisceaux lineaires

Holger Muenz; Alois Herkommer; Rafael Egger

Collaboration


Dive into the Rafael Egger's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge