Raffaele Resta
École Polytechnique Fédérale de Lausanne
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Raffaele Resta.
Physical Review B | 1997
M. Posternak; A. Baldereschi; Henry Krakauer; Raffaele Resta
We calculate ab initio the electronic states and the Born dynamical charge
Journal of Vacuum Science and Technology | 1991
J. T. McKinley; Y. Hwu; B. E. C. Koltenbah; G. Margaritondo; Stefano Baroni; Raffaele Resta
{\mathrm{Z}}^{\mathrm{*}}
Archive | 1989
Stefano Baroni; Raffaele Resta; A. Baldereschi; Maria Peressi
of the alkaline-earth oxides in the local-density approximation. We investigate the trend of increasing
Physical Concepts and Materials for Novel Optoelectronic Device Applications II | 1993
Maria Peressi; Luciano Colombo; A. Baldereschi; Raffaele Resta; Stefano Baroni
{\mathrm{Z}}^{\mathrm{*}}
Archive | 1989
Stefano Baroni; Raffaele Resta; A. Baldereschi
values through the series, using band-by-band decompositions and computational experiments performed on fake materials with artificially modified covalence. The deviations of
Physical Review B | 1994
Dal Corso A; Posternak M; Raffaele Resta; Baldereschi A
{\mathrm{Z}}^{\mathrm{*}}
Physical Review Letters | 1993
Raffaele Resta; M. Posternak; A. Baldereschi
from the nominal value 2 are due to the increasing interaction between O 2p orbitals and unoccupied cation d states. We also explain the variations, along the series, of the individual contributions to
Physical Review Letters | 1994
R. Nicolini; L. Vanzetti; Guido Mula; Gvido Bratina; L. Sorba; A. Franciosi; Maria Peressi; Stefano Baroni; Raffaele Resta; A. Baldereschi; J. E. Angelo; W. W. Gerberich
{\mathrm{Z}}^{\mathrm{*}}
Physical Review B | 1994
M. Posternak; Raffaele Resta; A. Baldereschi
arising from the occupied band manifolds.
Physical Review B | 1993
Dal Corso A; Stefano Baroni; Raffaele Resta; de Gironcoli S
We have created 0.35–0.45 eV band offsets at Ge homojunctions using Ga–As dipole intralayers, with the Ge valence band edge on the As side of the junction at lower energy. This is, to our knowledge, the first time that intralayer control of band discontinuities is extended to homojunctions, thereby expanding the potential domain of band gap engineering. Because these offsets occur over just a few atomic spacings, they rival heterojunction band edge discontinuities in breadth. The offsets were measured with synchrotron‐radiation photoemission spectroscopy. Similar band offset magnitudes occur for both ‘‘Ga‐first’’ and ‘‘As‐first’’ growth sequences, consistent with a truly dipolar effect. Both cleaved Ge(111) and thick ≊50 A Ge films deposited on cleaved Ge(111) were used as substrates, obtaining consistent results. The sign and magnitude of the effect is in agreement with a ‘‘theoretical alchemy’’ model. Experimental evidence of microdiffusion is discussed.