Ralf Hilgers

Optical imaging device, particularly an objective, with at least one optical element

Assembly comprising an optical element and a mount

Assembly comprising an optical element and an optical mount

Optical arrangement and projection exposure system for microlithography with passive thermal compensation

Optical device and a microlithography projection exposure system with passive thermal compensation

Optical device, especially objective, with at least one optical element

Optical imaging device, especially lens, with at least one optical element

Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element Optical imaging device, in particular objective, having at least one optical element

Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation Projection exposure system for microlithography with passive thermal compensation

Optical imaging device, in particular objective, having at least one optical element