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Ralf Hilgers

Carl Zeiss AG

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Publication

Featured researches published by Ralf Hilgers.

Archive | 2000

Optical imaging device, particularly an objective, with at least one optical element

Michael Trunz; Ralf Hilgers; Erich Merz; Michael Mühlbeyer

Archive | 2000

Assembly comprising an optical element and a mount

Michael Trunz; Ralf Hilgers; Bernhard Gellrich

Archive | 2000

Assembly comprising an optical element and an optical mount

Bernhard Gellrich; Ralf Hilgers; Michael Trunz

Archive | 2001

Optical arrangement and projection exposure system for microlithography with passive thermal compensation

Christian Wagner; Michael Trunz; Ralf Hilgers

Archive | 1999

Optical device and a microlithography projection exposure system with passive thermal compensation

Ralf Hilgers; Michael Trunz; Christian Wagner

Archive | 1999

Optical device, especially objective, with at least one optical element

Ralf Hilgers; Erich Merz; Michael Mühlbeyer; Michael Trunz

Archive | 1999

Optical imaging device, especially lens, with at least one optical element

Ralf Hilgers; Erich Merz; Michael Mühlbeyer; Michael Trunz

Archive | 1999

Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element Optical imaging device, in particular objective, having at least one optical element

Michael Trunz; Michael Muehlbeyer; Ralf Hilgers; Erich Merz

Archive | 1999

Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation Projection exposure system for microlithography with passive thermal compensation

Christian Wagner; Michael Trunz; Ralf Hilgers

Archive | 1999

Optical imaging device, in particular objective, having at least one optical element

Michael Trunz; Michael Muehlbeyer; Ralf Hilgers; Erich Merz

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Collaboration

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Michael Trunz

Carl Zeiss AG

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Erich Merz

Carl Zeiss AG

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Bernhard Gellrich

Carl Zeiss AG

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Christian Wagner

Carl Zeiss AG

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Michael Mühlbeyer

Carl Zeiss AG

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Michael Muehlbeyer

Carl Zeiss AG

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