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Dive into the research topics where Redeker Fred C is active.

Publication


Featured researches published by Redeker Fred C.


Archive | 1998

WAFER SUPPORT HAVING PRESSURE ZONE WHERE TEMPERATURE FEEDBACK AND CONTACT AREA ARE SMALL

Lue Brian; Ishikawa Tetsuya; Redeker Fred C; Wong Manus; Li Shijian


Archive | 2002

HIGH THROUGH-PUT COPPER CMP METHOD AND DEVICE WITH REDUCED EROSION AND DISHING

Emami Ramin; Li Shijian; Redeker Fred C; White John M


Archive | 2001

THERMAL PREPARATORY STATE REGULATION FOR FIXED ABRASIVE PRODUCT

Birang Manoocher; Emami Ramin; Li Shijian; Redeker Fred C


Archive | 2001

BARRIER LAYER BUFF PROCESSING AFTER COPPER CMP

Li Shijian; Redeker Fred C; Emami Ramin; Sen-Hou Koo; John M. White


Archive | 1997

Induktiv gekoppelter HDP-CVD-Reaktor

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Lue Brian; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Smyth Kenneth; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent


Archive | 2008

PROCESS KIT, WAFER PROCESSING DEVICE, AND METHOD FOR HEATING PROCESS KIT

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Brian Ryu; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Kenneth Smith; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent


Archive | 2004

Substrate flat finder and rotation monitor for semiconductor substrate cleaning system

Brown Brian; Husain Anwar; Birang Manoocher; Redeker Fred C; Lerner Alexander


Archive | 2002

AUFDAMPFUNGSKAMMER UND VERFAHREN ZUR HERSTELLUNG EINES FILMS MIT EINER NIEDRIGEN DIELEKTRIZITÄTSKONSTANTE

Li Shijian; Wang Yaxin; Redeker Fred C; Ishikawa Tetsuya; Collins Alan W


Archive | 2001

ELIMINATION OF PAD GLAZING FOR CHEMICAL/MECHANICAL POLISHING OF ALUMINUS

Sun Lizhong; Li Shijian; Redeker Fred C


Archive | 2000

An improved deposition chamber and method for depositing low dielectric constant films

Li Shijian; Wang Yaxin; Redeker Fred C; Ishikawa Tetsuya; Collins Alan W

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