Maydan Dan | Researchain

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Featured researches published by Maydan Dan.

Archive | 1991

Method and device for removing excess material from a physical vapor deposition chamber.

Somekh Sasson; Maydan Dan

Archive | 1999

ENHANCED MAGNETIC FIELD PLASMA-ETCHING REACTOR

Cheng David; Maydan Dan; Somekh Sasson; Stalder Kenneth R; Andrews Dana L; Chang Mei; White John M; Wong Jerry Y K; Zeitlin Vladimir J; Wang David Nin-Kou

Archive | 1986

APPARATUS AND METHOD FOR MAGNETRON ENHANCED PLASMA AUXILIARYTYPE CHEMICAL VAPOR DEPOSITION

Foster Robert; Wang David Nin-Kou; Somekh Sasson; Maydan Dan

Archive | 1981

Reaktives zerstaeubungsaetzen von silicium

Maydan Dan; Wang David Nin-Kou

Archive | 1997

Induktiv gekoppelter HDP-CVD-Reaktor

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Lue Brian; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Smyth Kenneth; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent

Archive | 1995

METHOD FOR MAKING FILM ADHERE FROM REACTIVE GAS PLASMA ON BASE WITH SMALL-SIZED AND HIGH DENSITY STEP SHAPE

Foster Robert; Wang David Nin-Kou; Somekh Sasson; Maydan Dan

Archive | 1987

Bromine-Ätzverfahren für Silizium

Wong Jerry Yuen Kui; Chang Mei; Maydan Dan; Wang David Nin-Kou; Mak Alfred W S

Archive | 2010

CLEANING TECHNOLOGY OF DEPOSITION CHAMBER USING REMOTE EXCITATION SOURCE

Shang Quanyuan; Cam S Law; Maydan Dan

Archive | 2008

PROCESS KIT, WAFER PROCESSING DEVICE, AND METHOD FOR HEATING PROCESS KIT

Redeker Fred C; Farhad Moghadam; Hanawa Hiroji; Ishikawa Tetsuya; Maydan Dan; Li Shijian; Brian Ryu; Steger Robert; Wang Yaxim; Wong Manus; Sinha Ashok; Nowak Fred Romuald; Niazi Kaveh; Kenneth Smith; Staryuik Pavel; Krishhanaraj Padmanabham; Murugesh Laxman; Rossman Kent

Archive | 2007