Regina Soufli

The soft x-ray instrument for materials studies at the linac coherent light source x-ray free-electron laser.

The soft x-ray materials science instrument is the second operational beamline at the linac coherent light source x-ray free electron laser. The instrument operates with a photon energy range of 480-2000 eV and features a grating monochromator as well as bendable refocusing mirrors. A broad range of experimental stations may be installed to study diverse scientific topics such as: ultrafast chemistry, surface science, highly correlated electron systems, matter under extreme conditions, and laboratory astrophysics. Preliminary commissioning results are presented including the first soft x-ray single-shot energy spectrum from a free electron laser.

Linac Coherent Light Source soft x-ray materials science instrument optical design and monochromator commissioning

We present the x-ray optical design of the soft x-ray materials science instrument at the Linac Coherent Light Source, consisting of a varied line-spaced grating monochromator and Kirkpatrick-Baez refocusing optics. Results from the commissioning of the monochromator are shown. A resolving power of 3000 was achieved, which is within a factor of two of the design goal.

Temporal cross-correlation of x-ray free electron and optical lasers using soft x-ray pulse induced transient reflectivity.

The recent development of x-ray free electron lasers providing coherent, femtosecond-long pulses of high brilliance and variable energy opens new areas of scientific research in a variety of disciplines such as physics, chemistry, and biology. Pump-probe experimental techniques which observe the temporal evolution of systems after optical or x-ray pulse excitation are one of the main experimental schemes currently in use for ultrafast studies. The key challenge in these experiments is to reliably achieve temporal and spatial overlap of the x-ray and optical pulses. Here we present measurements of the x-ray pulse induced transient change of optical reflectivity from a variety of materials covering the soft x-ray photon energy range from 500eV to 2000eV and outline the use of this technique to establish and characterize temporal synchronization of the optical-laser and FEL x-ray pulses.

Optical constants of magnetron sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

This work discusses the experimental determination of the optical constants (refractive index) of DC-magnetron-sputtered boron carbide films in the 30-770 eV photon energy range. Transmittance measurements of three boron carbide films with thicknesses of 54.2, 79.0, and 112.5 nm were performed for this purpose. These are believed to be the first published experimental data for the refractive index of boron carbide films in the photon energy range above 160 eV and for the near-edge x-ray absorption fine structure regions around the boron K (188 eV), carbon K (284.2 eV), and oxygen K (543.1 eV) absorption edges. The density, composition, surface chemistry, and morphology of the films were also investigated using Rutherford backscattering, x-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy, and extreme ultraviolet reflectance measurements.

Predicting the coherent X-ray wavefront focal properties at the Linac Coherent Light Source (LCLS) X-ray free electron laser

The first X-ray free electron laser (XFEL) at keV energies will be the Linac Coherent Light Source (LCLS), located at the SLAC National Accelerator Laboratory. Scheduled to begin operation in 2009, this first-of-a-kind X-ray source will produce ultra-short X-ray pulses of unprecedented brightness in the 0.8 to 8 keV first harmonic photon energy regime. Much effort has been invested in predicting and modeling the XFEL photon source properties at the undulator exit; however, as most LCLS experiments are ultimately dependent on the beam focal spot properties it is equally as important to understand the XFEL beam at the endstations where the experiments are performed. Here, we use newly available precision surface metrology data from actual LCLS mirrors combined with a scalar diffraction model to predict the LCLS beam properties in the experiment chambers.

System integration and performance of the EUV engineering test stand

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k1 of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

Pulse-dilation enhanced gated optical imager with 5 ps resolution (invited)

A 5 ps gated framing camera was demonstrated using the pulse-dilation of a drifting electron signal. The pulse-dilation is achieved by accelerating a photoelectron derived information pulse with a time varying potential [R. D. Prosser, J. Phys. E 9, 57 (1976)]. The temporal dependence of the accelerating potential causes a birth time dependent axial velocity dispersion that spreads the pulse as it transits a drift region. The expanded pulse is then imaged with a conventional gated microchannel plate based framing camera and the effective gating time of the combined instrument is reduced over that of the framing camera alone. In the drift region, electron image defocusing in the transverse or image plane is prevented with a large axial magnetic field. Details of the unique issues associated with rf excited photocathodes were investigated numerically and a prototype instrument based on this principle was recently constructed. Temporal resolution of the instrument was measured with a frequency tripled femtosecond laser operating at 266 nm. The system demonstrated 20× temporal magnification and the results are presented here. X-ray image formation strategies and photometric calculations for inertial confinement fusion implosion experiments are also examined.

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Static microfield printing capabilities have recently been integrated into the extreme ultraviolet interferometer operating at the Advanced Light Source synchrotron radiation facility at Lawrence Berkeley National Laboratory. The static printing capabilities include a fully programmable scanning illumination system enabling the synthesis of arbitrary illumination coherence (pupil fill). This new exposure station has been used to lithographically characterize the static imaging performance of the Engineering Test Stand Set-2 optic. Excellent performance has been demonstrated down to the 70 nm equal line/space level with focus latitude exceeding 1 μm and dose latitude of approximately 10%. Moreover, equal line/space printing down to a resolution of 50 nm has been demonstrated using resolution-enhancing pupil fills.

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography

Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 microm x 600 microm field of view at the wafer plane, operating in the extreme ultraviolet (EUV) region at an illumination wavelength around 13.4 nm. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates. A velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms demonstrating sub-diffraction-limited performance, as defined by the classical diffraction limit of Rayleigh (0.25 waves peak to valley) or Marechal (0.07 waves rms). This work is an experimental demonstration of sub-diffraction- limited multilayer coatings for high-NA EUV imaging systems, which resulted in the highest resolution microfield EUV images to date.

Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory

We present experimental results on the development and testing of the extreme ultraviolet (EUV) reflective multilayer coatings that will be used in the Atmospheric Imaging Assembly (AIA) instrument. The AIA, comprising four normal incidence telescopes, is one of three instruments aboard the Solar Dynamics Observatory mission, part of NASAs Living with a Star program, currently scheduled for launch in 2008. Seven different multilayer coatings will be used, covering the wavelength region from 93.9 to 335.4 Å.