Robert J. Steger

Low contamination plasma chamber components and methods for making the same

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

Critical dimension variation compensation across a wafer by means of local wafer temperature control

Corrosion resistant component of semiconductor processing equipment and method of manufacturing thereof

Substrate support having dynamic temperature control

Electrostatic chuck having radial temperature control capability

Faraday shield disposed within an inductively coupled plasma etching apparatus

Method and apparatus for controlling spatial temperature distribution

Method and apparatus for the compensation of edge ring wear in a plasma processing chamber

Switched uniformity control