Rudy L. York
Texas Instruments
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Wiley Encyclopedia of Electrical and Electronics Engineering | 1999
Stephanie Watts Butler; Rudy L. York; Marylyn Hoy Bennett; Tom Winter
The sections in this article are 1 Control in Breadth 2 Generic Model of the Elements of a Controller 3 Control in Depth 4 Change Management 5 Statistical Process Control 6 Run-to-Run Model-Based Process Control 7 Equipment Signal Monitoring, Real-Time Fault Detection and Classification 8 Sensors 9 In Situ Particle Monitors 10 In-Line Defect Monitoring and Contamination Control 11 Wafer Position Tracking 12 Data Mining and Data Warehousing 13 Parametric and Yield Outlier Control 14 Wafer Level Reliability Control 15 Multivariate SPC, Especially for Equipment Signal Monitoring 16 Acknowledgments
Archive | 1991
Jerome L. Elkind; Patricia B. Smith; Larry D. Hutchins; Joseph D. Luttmer; Rudy L. York; Julie S. England
Archive | 1988
Cecil J. Davis; Rhett B. Jucha; Joseph D. Luttmer; Rudy L. York; Lee M. Loewenstein; Robert T. Matthews; Randall C. Hildenbrand
Archive | 1988
Rudy L. York; Joseph D. Luttmer; Patricia B. Smith; Cecil J. Davis
Archive | 1992
Cecil J. Davis; Rhett B. Jucha; Joseph D. Luttmer; Rudy L. York; Lee M. Loewenstein; Robert T. Matthews; Randall C. Hildenbrand
Archive | 1992
Rudy L. York; Joseph D. Luttmer; Chang F. Wan; Thomas W. Orent; Larry D. Hutchins; Art Simmons
Archive | 1993
Larry D. Hutchins; Rudy L. York
Archive | 1988
Joseph D. Luttmer; Cecil J. Davis; Patricia B. Smith; Rudy L. York
Archive | 1988
Joseph D. Luttmer; Rudy L. York; Patricia B. Smith; Cecil J. Davis
Archive | 1987
Joseph D. Luttmer; Cecil J. Davis; Patricia B. Smith; Rudy L. York; Lee M. Loewenstein; Rhett B. Jucha