Ryuichiro Tamochi

Round-robin measurements of 100- and 60-nm scales among a deep-ultraviolet laser diffractometer, a scanning electron microscope and various atomic force microscopes

An intercomparison of nanometric lateral scales, which are special one-dimensional (1D) grating standards with sub-hundred-nanometre pitches, among a deep-ultraviolet (DUV) laser diffractometer, a critical dimension scanning electron microscope (CD-SEM) and different types of atomic force microscope (AFM) was performed. The reference value and its expanded uncertainty were provided by the National Metrology Institute of Japan (NMIJ) using an atomic force microscope with differential laser interferometers (DLI-AFM). The consistency of the measurement results obtained using the DUV laser diffractometer, CD-SEM and some AFMs was satisfactory; however, that in the measurement results obtained using other AFMs was unsatisfactory. An improvement in AFM calibration technology using nanometrological standards is required for both AFM manufacturers and AFM users, including metrology institutes.

ArF photo resist pattern sample preparation method using FIB without protective coating

This paper presents a novel method of FIB (FIB: focused ion beam) sample preparation to accurately evaluate critical dimensions and profiles of ArF photo resist patterns without the use of a protective coating on the photo resist. In order to accomplish this, the FIB micro-sampling method that is one of effective FIB milling and fabrication method was employed. First a Si cap is picked up from a silicon wafer and fixed to ArF photo resist patterns to protect against ion beam irradiation. Then, a micro-sample, a piece of Si-capped ArF photo resist, was extracted from the bulk ArF photo resist. In this procedure, this silicon cap always protects ArF photo resist patterns against ion beam irradiation. For the next step, the micro-sample is fixed to a needle stub of the FIB-STEM (STEM: scanning transmission electron microscopy) compatible rotation holder. This sample on the needle stub was rotated 180 degrees and milled from the side of Si substrate. Lastly, the sample is milled to the thickness of 2μm. In this process, the ion beam is irradiating from the silicon substrate side to minimize the ion beam irradiation damages on the ArF photo resist patterns. EDX (EDX: Energy dispersive X-ray spectroscopy) analysis proved that no gallium ions were detected on the surface of the ArF photo resist patterns. The feasibility of high accelerating voltage observation of STEM to observe line edge roughness of a thick sample like 2μm without shrinkage has been demonstrated.