S Sanguan Anantathanasarn

Lasing of wavelength-tunable (1.55μm region) InAs∕InGaAsP∕InP (100) quantum dots grown by metal organic vapor-phase epitaxy

The authors report lasing of InAs∕InGaAsP∕InP (100) quantum dots (QDs) wavelength tuned into the 1.55μm telecom region. Wavelength control of the InAs QDs in an InGaAsP∕InP waveguide is based on the suppression of As∕P exchange through ultrathin GaAs interlayers. The narrow ridge-waveguide QD lasers operate in continuous wave mode at room temperature on the QD ground state transition. The low threshold current density of 580A∕cm2 and low transparency current density of 6A∕cm2 per QD layer, measured in pulsed mode, are accompanied by low loss and high gain with an 80-nm-wide gain spectrum.

Wavelength-tunable (1.55‐μm region) InAs quantum dots in InGaAsP∕InP (100) grown by metal-organic vapor-phase epitaxy

Growth of wavelength-tunable InAs quantum dots (QDs) embedded in a lattice-matched InGaAsP matrix on InP (100) substrates by metal-organic vapor-phase epitaxy is demonstrated. As∕P exchange plays an important role in determining QD size and emission wavelength. The As∕P exchange reaction is suppressed by decreasing the QD growth temperature and the V∕III flow ratio, reducing the QD size and emission wavelength. The As∕P exchange reaction and QD emission wavelength are then reproducibly controlled by the thickness of an ultrathin [zero to two monolayers (MLs)] GaAs interlayer underneath the QDs. An extended interruption after GaAs interlayer growth is essential to obtain well-defined InAs QDs. Submonolayer GaAs coverages result in a shape transition from QD to quantum dash at low V∕III flow ratio with a slightly shorter emission wavelength. Only the combination of reduced growth temperature and V∕III flow ratio with the insertion of GaAs interlayers above ML thicknesses allows wavelength tuning of QDs at r...

Observation of Q-switching and mode-locking in two-section InAs/InP (100) quantum dot lasers around 1.55 µm

First observation of passive mode-locking in two-section quantum-dot lasers operating at wavelengths around 1.55 mum is reported. Pulse generation at 4.6 GHz from a 9 mm long device is verified by background-free autocorrelation, RF-spectra and real-time oscilloscope traces. The output pulses are stretched in time and heavily up-chirped with a value of 20 ps/nm, contrary to what is normally observed in passively mode-locked semiconductor lasers. The complete output spectrum is shown to be coherent over 10 nm. From a 7 mm long device Q-switching is observed over a large operating regime. The lasers have been realized using a fabrication technology that is compatible with further photonic integration. This makes the laser a promising candidate for e.g. a mode-comb generator in a complex photonic chip.

Self Assembled InAs/InP Quantum Dots for Telecom Applications in the 1.55 µm Wavelength Range: Wavelength Tuning, Stacking, Polarization Control, and Lasing

Wavelength-tunable InAs quantum dots (QDs) embedded in lattice-matched InGaAsP on InP(100) substrates are grown by metalorganic vapor-phase epitaxy (MOVPE). As/P exchange, which causes a QD size and an emission wavelength that are very large, is suppressed by decreasing the QD growth temperature and V–III flow ratio. As/P exchange, QD size and emission wavelength are then reproducibly controlled by the thickness of ultrathin [0–2 monolayers (ML)] GaAs interlayers underneath the QDs. Submonolayer GaAs coverages result in a shape transition from QDs to quantum dashes for a low V–III flow ratio. It is the combination of reduced growth temperature and V–III flow ratio with the insertion of GaAs interlayers of greater than 1 ML thickness which allows the tuning of the emission wavelength of QDs at room temperature in the 1.55 µm wavelength range. Temperature-dependent photoluminescence (PL) measurements reveal the excellent optical properties of the QDs. Widely stacked QD layers are reproduced with identical PL emission to increase the active volume while closely stacked QD layers reveal a systematic PL redshift and linewidth reduction due to vertical electronic coupling, which is proven by the fact that the linear polarization of the cleaved-side PL changes from in-plane to isotropic. Ridge-waveguide laser diodes with stacked QD layers for their active regions exhibit threshold currents at room temperature in continuous-wave mode that are among the lowest threshold currents achieved for InAs/InP QD lasers operating in the 1.55 µm wavelength range.

Al2O3 insulated-gate structure for AlGaN/GaN heterostructure field effect transistors having thin AlGaN barrier layers

An Al2O3 insulated-gate (IG) structure was utilized for controlling the surface potential and suppressing the gate leakage in Al0.2Ga0.8N/GaN heterostructure field effect transistors (HFETs) having thin AlGaN barrier layers (less than 10 nm). In comparison with the Schottky-gate devices, the Al2O3 IG device showed successful gate control of drain current up to VGS = +4 V without leakage problems. The threshold voltage in the Al2O3 IG HFET was about -0.3 V, resulting in the quasi-normally-off mode operation.

Stacking and polarization control of wavelength-tunable (1.55 μm region) InAs / InGaAsP / InP (100) quantum dots

Stacking and polarization control of wavelength-tunable InAs quantum dots (QDs) embedded in lattice-matched InGaAsP on InP (100) grown by metalorganic vapor-phase epitaxy is demonstrated. Wavelength control over the 1.55μm region at room temperature is achieved by inserting ultrathin GaAs interlayers underneath the QDs and adjusting the amount of InAs. For widely stacked QDs with a 40nm separation layer, the linear dependence of the emission wavelength on the GaAs interlayer thickness coincides with that of single QD layers revealing the reproduction of identical QD layers. For closely stacked QDs with 4nm separation layer, the emission wavelength as a function of the GaAs interlayer thickness is systematically redshifted and the linewidth is reduced indicating vertical electronic coupling which is proven by the linear polarization of the cleaved-side luminescence changing from in-plane to isotropic.

Surface passivation of GaAs by ultra-thin cubic GaN layer

Attempts were made to passivate the GaAs (001) surface by a pseudomorphic ultra-thin cubic GaN layer formed by a nitrogen radical (N-radical) or nitrogen plasma irradiation technique. Reflection high-energy electron diffraction (RHEED) pattern observations and detailed X-ray photoelectron spectroscopy (XPS) analysis have shown that ultra-thin cubic GaN layer on GaAs (001) surface with desirable surface stoichiometry can be realized with the optimization of surface nitridation process parameters. The passivation effects, characterized by ultra-high vacuum photoluminescence (UHV PL) analysis, revealed strong enhancement in band-edge PL intensity of GaAs after passivation as large as a factor of 10 when compared with the as-grown clean molecular beam epitaxy (MBE) GaAs surface.

Optical characteristics of single InAs∕InGaAsP∕InP(100) quantum dots emitting at 1.55μm

The authors have studied the emission properties of individual InAs quantum dots (QDs) grown in an InGaAsP matrix on InP(100) by metal-organic vapor-phase epitaxy. Low-temperature microphotoluminescence spectroscopy shows emission from single QDs around 1550nm with a characteristic exciton-biexciton behavior and a biexciton antibinding energy of more than 2meV relative to the exciton. Temperature-dependent measurements reveal negligible optical phonon induced broadening of the exciton line below 50K, and emission from the exciton state clearly persists above 70K. These results are encouraging for the development of a controllable photon source for fiber-based quantum information and cryptography systems.

1.55-

In this letter, we report on the fabrication and characterization of InAs-InP (100) quantum-dot (QD) Fabry-Perot and ring lasers, lasing in the 1.55-mum wavelength range and employing narrow deeply etched ridge waveguides (1.65 mum width). The performance of the lasers appears not affected by sidewall recombination effects of the deeply etched waveguide structure. Narrow deeply etched ridge waveguides can be mono-mode and allow for a small bending radius to realize compact integrated devices. As a demonstration, we present results on a compact ring laser with a free spectral range close to 40 GHz. Due to the low absorption of the QDs, unpumped output waveguides can be used

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Passive mode-locking in two-section InAs/InP quantum dot laser diodes operating at wavelengths around 1.55 mum is reported. For a 4.6-GHz laser, a large operating regime of stable mode-locking, with RF-peak heights of over 40 dB, is found for injection currents of 750 mA up to 1.0 A and for values of the absorber bias voltage of 0 V down to -3 V. Optical output spectra are broad, with a bandwidth of 6-7 nm. However, power exchange between different spectral components of the laser output leads to a relatively large phase jitter, resulting in a total timing jitter of around 35 ps. In a 4-mm-long, 10.5-GHz laser, it is shown that the operating regime of stable mode-locking is limited by the appearance of quantum dot excited state lasing, since higher injection current densities are necessary for these shorter lasers. The output pulses are stretched in time and heavily up-chirped with a value of 16-20 ps/nm. This mode of operation can be compared to Fourier domain mode-locking. The lasers have been realized using a fabrication technology that is compatible with further photonic integration. This makes such lasers promising candidates for, e.g., a coherent multiwavelength source in a complex photonic chip.