Sanjun Niu

Selective assembly of nanoparticles on block copolymer by surface modification

We have developed a method to selectively deposit nanoparticles on the ordered nanoscale elements of PS–PI–PS (polystyrene–polyisoprene–polystyrene) block copolymer film. The process utilizes reactive ion plasma to selectively modify the PS surface with amine groups to electrostatically attract negatively charged Au nanoparticles. In spite of the strong interparticle Coulombic repulsion, the deposition on PS domains is significantly high. It is observed that the deposition at the edges of the domain is particularly high, forming a percolating nanoparticle necklace. The latter may lead to interesting avenues to fabricate electronic devices.

SPONTANEOUS PLANARIZATION OF NANOSCALE PHASE SEPARATED THIN FILM

Structure of complex fluid at mesoscales is influenced by interfacial effects. We describe the dynamic response in such films to sudden change in interfacial tension. In a self-assembled block copolymer film, the monolayer of 15 nm diam cylindrical discrete phases close to the surface commence to sink at an average rate of 0.16 nm/day in response to the interfacial tension change. Surprisingly, this spontaneous planarization occurs, even though the cylinders are covalently stitched to the matrix. A simple model explains the observed behavior. The observation may lead to approaches to tailor the structure of mesoscale thin films of complex fluids for long-range order that are desirable for nanoscale device fabrication.