Scott M. Miller

Selective dip-coating of chemically micropatterned surfaces

We characterize the selective deposition of liquid microstructures on chemically heterogeneous surfaces by means of dip coating processes. The maximum deposited film thickness depends critically on the speed of withdrawal as well as the pattern size, geometry, and angular orientation. For vertically oriented hydrophilic strips, we derive a hydrodynamic scaling relation for the deposited film thickness which agrees very well with interferometric measurements of dip-coated liquid lines. Due to the lateral confinement of the liquid, our scaling relation differs considerably from the classic Landau–Levich formula for chemically homogeneous surfaces. Dip coating is a simple method for creating large area arrays of liquid microstructures for applications involving chemical analysis and synthesis, biochemical assays, or wet printing of liquid polymer or ink patterns.

Morphology of liquid microstructures on chemically patterned surfaces

We study the equilibrium conformations of liquid microstructures on flat but chemically heterogeneous substrates using energy minimization computations. The surface patterns, which establish regions of different surface energy, induce deformations of the liquid–solid contact line. Depending on the geometry, these deformations either promote or impede capillary breakup and bulge formation. The contact angles of the liquid on the hydrophilic and hydrophobic regions, as well as the pattern geometry and volume of liquid deposited, strongly affect the equilibrium shapes. Moreover, due to the small scale of the liquid features, the presence of chemical or topological surface defects significantly influence the final liquid shapes. Preliminary experiments with arrays of parallel hydrophilic strips produce shapes resembling the simulated forms. These encouraging results provide a basis for the development of high resolution lithography by direct wet printing.

Direct printing of polymer microstructures on flat and spherical surfaces using a letterpress technique

We have developed a letterpress technique capable of printing polymer films with micrometer scale feature sizes onto flat or spherically shaped nonporous substrates. This printing technique deposits polymer only in desired regions thereby eliminating subsequent developing and subtraction steps. Flat or curved printing plates, which are fabricated from either rigid or deformable materials, are used to transfer thin molten polymer films onto flat target substrates. By deforming the printing plates into a spherical shape, it is also possible to print patterned films onto the concave side of a spherically deformed target substrate. These printed films serve as good resists for both wet chemical etching and reactive ion etching. Interferometric measurements of the polymer film thickness are used to probe physical mechanisms affecting printing instabilities, pattern fidelity, and edge resolution. Our experimental study indicates that this letterpress technique may prove suitable for high-throughput device fabrication involving large-area microelectronics.

Three-Dimensional Electronic Surfaces

There is an increasing interest in electronics functionality on surfaces which are not planar. This paper examines the critical technologies for fabricating electronic surfaces which have a three-dimensional shape. Two different approaches for achieving such a goal are examined. One can fabricate electronics using conventional technologies on a flat surface, and then after fabrication deform that surface into the desired shape (e.g. a spherical cap). In an alternative approach, one can directly fabricate onto substrates with an arbitrary shape. In this case one must address the issue of pattern formation and transfer on the curved surfaces. The scaling of letterpress printing to micron-scale features on flat and spherically curved surfaces is demonstrated.

Photoresist-free printing of amorphous silicon thin-film transistors

Conventional fabrication of amorphous silicon thin-film transistors (a-Si TFTs) requires patterning numerous photoresist layers, a subtractive process that is time consuming and expensive. This letter describes transistor fabrication by a photoresist-free approach in which polymer etch masks are letterpress printed from flexible polyimide stamps. Pattern registration is achieved through optical alignment since the printed masks are thin and optically transparent. This modified fabrication scheme produces transistor performance equivalent to conventionally fabricated a-Si TFTs. The ability to directly print etch masks onto nonhomogeneous substrates brings one step closer the realization of flexible, large-area, macroelectronic fabrication.

Offset Printing of Liquid Microstructures for High Resolution Lithography

We have investigated the direct printing of polymer solutions from a chemically patterned stamp onto a hydrophilic target substrate as a new high-throughput alternative to optical lithography. The patterns on the stamp, which are typically in the micron size range, define regions of alternating wettability. They are produced by patterning a hydrophobic self-assembled monolayer previously deposited onto a hydrophilic surface, typically a glass slide or silicon wafer with a natural oxide coating. Polar liquids or aqueous polymeric solutions are then deposited only onto the hydrophilic surface patterns by dip-coating the stamp in a liquid reservoir. The deposited film thickness depends critically on the speed of withdrawal and the feature size and shape. For vertically oriented hydrophilic stripes dipped in a reservoir containing a polar liquid, we have developed a theoretical model whose prediction for the maximum deposited film thickness agrees exceptionally well with experimental measurements. After deposition, the wetted stamp is pressed against a target substrate by means of a motion controlled press. In this way we have so far printed 5µm wide polyethylene oxide lines onto a silicon wafer.

Computational Modeling of Direct Print Microlithography

Using a combination of experiment and simulations, we have studied the equilibrium shapes of liquid microstructures on flat but chemically heterogeneous substrates. The surface patterns, which define regions of different surface energy, induce deformations of the liquid-solid contact line, which in turn can either promote or impede capillary break-up and bulge formation. We study numerically the influence of the adhesion energies on the hydrophilic and hydrophobic surface areas, the pattern geometry and the deposited fluid volume on the liquid surface profiles.