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Featured researches published by Senji Wada.


Meeting Abstracts | 2008

Development of ALD Precursors for Semiconductor Devices

Senji Wada; Tetsuji Abe; Atsushi Sakurai; Takashi Higashino; Ryuusaku Fujimoto; Masako Shimizu

Scaling down of semiconductor device size has required a several kind of new elements. Recently, Hfbased metal gate has been used instead of the traditional poly silicon. There always are the potential demands for new precursors and we have supply a variety of precursors. For example, Adelmann et al used our rare earth precursors to the gate insulator. Recently, we have announced HMBO or ZMBO (3). Those precursors are designed for providing pure hafnium or zirconium oxide (HfO2 or ZrO2).


216th ECS Meeting | 2009

Recent Development of ALD Precursors for Semiconductor Devices

Senji Wada; Atsushi Sakurai; Naoki Yamada; Tsuyoshi Watanabe; Hiroyuki Uchiuzo


Archive | 2008

Metal compound, chemical vapor deposition material containing the same, and method for producing metal-containing thin film

Naoki Yamada; Atsuya Yoshinaka; Senji Wada


Archive | 2014

ALKOXIDE COMPOUND AND RAW MATERIAL FOR FORMING THIN FILM

Senji Wada; Akio Saito; Tomoharu Yoshino


Archive | 2007

METAL ALKOXIDE COMPOUND, MATERIAL FOR FORMING THIN FILM,AND METHOD FOR PRODUCING THIN FILM

Senji Wada; Tetsuji Abe; Atsushi Sakurai; Takashi Higashino; Ryusaku Fujimoto; Masako Shimizu


Archive | 2001

Raw material of chemical vapor deposition and method for manufacturing thin film using the same

Kazuhisa Onozawa; Senji Wada; Atsuya Yoshinaka; 仙二 和田; 和久 小野沢; 篤也 芳仲


Archive | 2008

METAL COMPOUND, MATERIAL FOR CHEMICAL VAPOR PHASE GROWTH, AND PROCESS FOR FORMING METAL-CONTAINING THIN FILM

Naoki Yamada; Atsuya Yoshinaka; Senji Wada


Archive | 2003

Composition, raw material for chemical vapor deposition comprising the composition, and method of producing thin film using the same

Katsuhide Seki; Senji Wada; Atsuya Yoshinaka; 仙二 和田; 篤也 芳仲; 克英 関


Archive | 2014

β-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the same

Youn-Joung Cho; Senji Wada; Jung-Sik Choi; Jin-Seo Lee; Atsushi Sakurai; Kyoo-chul Cho; Atsuya Yoshinaka; Haruyoshi Sato; Junji Ueyama; Tomoharu Yoshino; Masako Shimizu


Archive | 2012

Metal alkoxides compound, material for forming film and film manufacturing method

Tetsuji Abe; Senji Wada; Atsushi Sakurai; Takashi Higashino; Ryusaku Fujimoto; Masako Shimizu

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