Seon-Il Kim

Advanced four‐mask a‐Si TFT array fabrication process using improved materials

In order to achieve higher-performance and lower-cost a-Si TFT array manufacturing, an advanced four-mask fabrication process using low-resistant metals, a new pixel electrode material, and improved unit processes was developed. Slit (or gray-tone) photolithography, in combination with a continuous all-in-one dry-etching process, solved the chronic problems of the current four-mask process. Additionally, a new combination of materials and a new wet etchant for the gate-line patterning made it possible to achieve stabilized wet-etching results and reduced the number of process steps. Our advanced a-Si TFT-array fabrication process is applicable to both notebook and monitor displays, and will further improve the market position of TFT-LCDs by improved performance and manufacturing process simplification.

CW Terahertz imaging of paraffin-embedded epithelia cell of rat

CW Terahertz imaging system is being constructed to investigate the response of cell to the terahertz wave. This system consists of a 0.2 THz radiation source and some off-axis-parabolic mirrors (OAPs) with 2 dimensional (2D) translation stage. Detection is achieved with a pyroelectric sensor operated at room temperature. Biological terahertz imaging of a ratpsilas paraffin-embedded epithelial cell with tumor is presented.