Seung-Keun Lee
Samsung
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Publication
Featured researches published by Seung-Keun Lee.
IEEE Journal of Solid-state Circuits | 1998
Chun-Sup Kim; Jin-Yub Lee; Jae-Duk Lee; Bumman Kim; C.S. Park; S.B. Lee; Seung-Keun Lee; C.W. Park; J.G. Roh; H.S. Nam; D.Y. Kim; D.Y. Lee; Tae-Sung Jung; Hyun-Jun Yoon; S.I. Cho
A 64-Mbit bidirectional data strobed, double-data-rate SDRAM achieves a peak bandwidth of 2.56 GByte/s on a 64-bit-channel, 256-MByte memory system at V/sub cc/=3.3 V and T=25/spl deg/C. The circuit features are: (1) a bidirectional data strobing scheme to eliminate the clock-related skews of I/O data in a multimodule system, (2) a low-power delay-locked loop having a wide range of locking frequency (40-160 MHz) with fast access time and minimal variations, and (3) a twisted data bussing architecture with minimized loading difference between I/O data paths and small chip-size overhead associated with the 2-bit prefetch operation.
IEEE Journal of Solid-state Circuits | 1997
Tae-Sung Jung; Do-Chan Choi; Sung-Hee Cho; Myong-Jae Kim; Seung-Keun Lee; Byung-Soon Choi; Jin-Sun Yum; San-Hong Kim; Dong-Gi Lee; Jong-Chang Son; Myung-Sik Yong; Heung-Kwun Oh; Sung-Bu Jun; Woung-Moo Lee; Ejaz Haq; Kang-Deog Suh; Syed Ali; Hyung-Kyu Lim
A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-/spl mu/m triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm/sup 2/, and the effective cell size including the overhead of string select transistors is 2.0 /spl mu/m/sup 2/.
international solid-state circuits conference | 1997
Tae-Sung Jung; Do-Chan Choi; Sung-Hee Cho; Myong-Jae Kim; Seung-Keun Lee; Byung-Soon Choi; Jin-Sun Yum; San-Hong Kim; Dong-Gi Lee; Jong-Chang Son; Myung-Sik Yong; Heung-Kwun Oh; Sung-Bu Jun; Woung-Moo Lee; Ejaz Haq; Kang-Deog Suh; Hyung-Kyu Lim
A 3.3V 16Mb nonvolatile memory has read and write operations fully DRAM-compatible except a longer RAS precharge time after write. Most systems with high-performance processors use a shadow nonvolatile memory uploaded to a fast DRAM to obtain zero wait-state performance. The introduced nonvolatile virtual DRAM (NVDRAM) eliminates the need for this redundancy, achieving high performance while reducing power consumption. Fast random access time (tRAC) with a NAND flash memory cell is achieved by using a folded bit-line architecture, and DRAM comparable column address access time (tkA) is achieved by sensing and latching 4k cells simultaneously.
Archive | 2004
Seung-Keun Lee; Dong-Ho Park
Archive | 2001
Seung-Keun Lee; Young-Ho Lim
Archive | 1992
Seung-Keun Lee
Archive | 1998
Kihwan Choi; Seung-Keun Lee; Kang-Deog Suh
Archive | 2001
Hwi-Tack Chung; Seung-Keun Lee; Young-Ho Lim
Archive | 1998
Seung-Keun Lee
Archive | 1997
San-Hong Kim; Seung-Keun Lee