Shao Jianda

Effect of microstructure of TiO2 thin films on optical band gap energy

TiO2 coatings are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for four hours, the spectra and XRD patterns of TiO2 thin film are obtained. XRD patterns reveal that only anatase phase can be observed in TiO2 coatings regardless of the different annealing temperatures, and with the increasing annealing temperature, the grain size gradually increases. The relationship between the energy gap and microstructure of anatase is determined and discussed. The quantum confinement effect is observed that with the increasing grain size of TiO2 thin film, the band gap energy shifts from 3.4 eV to 3.21 eV. Moreover, other possible influence of the TiO2 thin-film microstructure, such as surface roughness and thin film absorption, on band gap energy is also expected.

One-on-One and R-on-One Tests on KDP and DKDP Crystals with Different Orientations

By testing a substantial number of tripler and z-cut KDP and DKDP crystals, we have observed that at 355 nm, the laser induced damage threshold in the R-on-one test is higher than that in the one-on-one test. It is proved that laser conditioning is an efficient way to improve the damage resistance. The efficiency of laser conditioning becomes increasingly good with smaller ramping ffuence steps. We have also found that the damage resistance of the z-cut crystal is higher than the tripler cut, and the pinpoint number is definitely less in the z-cut crystal. The reason for these observations is discussed.

Characteristics of 355 nm Laser Damage in KDP and DKDP Crystals

We present the characteristics of bulk damage induced by the third harmonic of Nd:YAG laser irradiation in KDP and DKDP crystals. Bulk damage occurs as a few or a series of pinpoints consisting of a core and the deforming zone. The results of a 1-on-1 test reveal that the pinpoint size increases with inevreasing fluence, and the pinpoint density increases exponentially with increasing fluence. The results of an s-on-1 test indicate that the pinpoint density increases gradually with laser pulse number, but the size does not grow. These results are consistent with a model in which nanoabsorbers are assumed to exist in the crystal and the initiation of damage is determined by heating them to the critical temperature.

Comparison of TiO2 and ZrO2 films deposited by electron-beam evaporation and by sol-gel process

TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density and roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.

Effects of annealing on microstructure and optical properties of TiO2 sculptured thin films

The evolution of microstructure and optical properties of TiO2 sculptured thin films under thermal annealing is reported. XRD, field emission SEM, UV-Vis-NIR spectra are employed to characterize the microstructural and optical properties. It is found that the optimum annealing temperature for linear birefringence is 500 degrees C. The maximum of transmission difference for linear birefringence is up to 18%, which is more than twice of that in as-deposited thin films. In addition, the sample annealed at 500 degrees C has a minimum of column angle about 12 degrees C. The competitive process between the microstructural and optical properties is discussed in detail. Post-annealing is a useful method to improve the linear birefringence in sculptured thin films for practical applications.

Wideband Antireflection Film Fabricated by Glancing Angle Deposition

Graded-index ZrO2 films has been fabricated on K9 glass by glancing angle deposition. Because the index mismatch at the interface has been reduced, the film results in wideband high-transmission antireflection. From 400nm to 1200nm, the film reflection is lower than 0.8% and the lowest value is 0.2% at 432nm.

Dynamic Scaling in Growth of ZrO2 Thin Films Prepared by Electronic Beam Evaporation

The growth front evolution of ZrO2 thin films deposited by electronic beam evaporation has been studied with atomic force microscopy. The dynamic scaling characteristics are observed during the deposition process. After numerical correlation analysis, the roughness exponent α = 0.80±0.005 and the growth exponent β = 0.141 are all obtained. Based on these results, we suggest that the growth of ZrO2 thin films can be described by the combination of the Edwards-Wilkinson equation, the Mullins diffusion equation and the shadowing effect.

A Thermal Approach to Model Laser Damage in KDP and DKDP Crystals

A thermal model is considered in order to better understand the mechanism of laser induced damage in KDP and DKDP crystals. We demonstrate that the expressions of pinpoint density and damage probability, predicted by the thermal model, are consistent with the experimental data. We also discuss the effect of particle interaction on the thermal model.

Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films

Ta2O5 films are prepared on Si, BK7, fused silica, antireflection (AR) and high reflector (HR) substrates by electron beam evaporation method, respectively. Both the optical property and laser induced damage thresholds (LIDTs) at 1064 nm of Ta2O5 films on different substrates are investigated before and after annealing at 673 K for 12h. It is shown that annealing increases the refractive index and decreases the extinction index, and improves the O/Ta ratio of the Ta2O5 films from 2.42 to 2.50. Moreover, the results show that the LIDTs of the Ta2O5 films are mainly correlated with three parameters: substrate property, substoichiometry defect in the films and impurity defect at the interface between the substrate and the films. Details of the laser induced damage models in different cases are discussed.

Negative dispersion mirrors in Ta2O5/: SiO2 for femtosecond Ti : Sapphire lasers by using gires-tournois interferometers

We design and experimentally demonstrate some negative dispersion mirrors with optimized Gires-Tournois interferometers. The mirror structure is composed of 38 alternating Ta2O5 and SiO2 layers and could be regarded as two sections: high-reflectivity section consisting of a series of quarter-wavelength optical thickness stacks and negative-dispersion section consisting of only 13 layers. The designed mirrors exhibit the expected performance. These mirrors were fabricated by using ion beam sputtering. By adopting such mirrors, dispersion of a mode-locked femtosecond Ti:sapphire laser has been compensated for mostly. With two series of the mirrors, 32 fs and 15 fs pulses have been obtained respectively.