Shaoqing Xiao

Shape-Uniform, High-Quality Monolayered MoS2 Crystals for Gate-Tunable Photoluminescence

Two-dimensional molybdenum disulfide (MoS2) has recently drawn major attention due to its promising applications in electronics and optoelectronics. Chemical vapor deposition (CVD) is a scalable method to produce large-area MoS2 monolayers, yet it is challenging to achieve shape-uniform, high-quality monolayered MoS2 grains as random, diverse crystallographic orientations and various shapes are produced in the same CVD process. Here, we report the growth of high-quality MoS2 monolayers with uniform triangular shapes dominating (up to 89%) over other shapes on both SiO2/Si and sapphire substrates. The new confined-space CVD process prevents contamination and helps regulate the Mo/S ratio during the deposition. The as-grown triangular MoS2 monolayers exhibit grain sizes up to 150 μm and possess better crystalline properties and lighter n-type doping concentration than those of the monolayers grown by common CVD methods. The corresponding field effect transistor devices show high electron mobilities of 50-60 cm2 V-1 s-1 and positive threshold voltages of 21-35 V. This mild n-type behavior makes it possible to regulate the formation of excitons by back-gate voltage due to the interaction of excitons with free charge carriers in the MoS2 channel. As a result, gate-tunable photoluminescence (PL) effect, which is rarely achievable for MoS2 samples prepared by common CVD or mechanical exfoliation, is demonstrated. This study provides a simple versatile approach to fabricating monolayered crystals of MoS2 and other high-quality transition metal dichalcogenides and could lead to new optoelectronic devices based on gate-tunable PL effect.

Controllable one-step growth of bilayer MoS 2 -WS 2 /WS 2 heterostructures by chemical vapor deposition

Heterostructures of two-dimensional (2D) transition metal dichalcogenides (TMDs) offer attractive prospects for practical applications by combining unique physical properties that are distinct from those of traditional structures. In this paper, we demonstrate a three-stage chemical vapor deposition method for the growth of bilayer MoS2-WS2/WS2 heterostructures with the bottom layers being the lateral MoS2-center/WS2-edge monolayer heterostructures and the top layers being the WS2 monolayers. The alternative growth of lateral and vertical heterostructures can be realized by adjusting both the temperature and the carrier gas flow direction. The combined effect of both reverse gas flow and higher growing temperature can promote the epitaxial growth of second layer on the activated nucleation centers of the first monolayer heterostructures. By using customized temperature profiles, single heterostructures including monolayer lateral MoS2-WS2 heterostructures and bilayer lateral WS2(2L)-MoS2(2L) heterostructures could also be obtained. Atomic force microscopy, photoluminescence and Raman mapping studies clearly reveal that these different heterostructure samples are highly uniform. These results thus provide a promising and efficient method for the synthesis of complex heterostructures based on different TMDs materials, which would greatly expand the heterostructure family and broaden their applications.

Simulation optimizing of n-type HIT solar cells with AFORS-HET

This paper presents a study of heterojunction with intrinsic thin layer (HIT) solar cells based on n-type silicon substrates by a simulation software AFORS-HET. We have studied the influence of thickness, band gap of intrinsic layer and defect densities of every interface. Details in mechanisms are elaborated as well. The results show that the optimized efficiency reaches more than 23% which may give proper suggestions to practical preparation for HIT solar cells industry.