Shinji Nishihara

Process integration of single-wafer technology in a 300-mm fab, realizing drastic cycle time reduction with high yield and excellent reliability

In this paper, we discuss a new technology implemented with single-wafer processing for a 300-mm fab. Newly developed equipment and chemicals reduce the process time and provide cost savings. The combination of fully automated systems and single-wafer processing significantly reduces queuing time. The process has been re-integrated to eliminate long time processes and make it suitable for single-wafer technologies. As a result, a very aggressive cycle time (0.25 days/layer) with high yield, in double-polysilicon, sextuple-metal, 0.18-/spl mu/m logic process has been demonstrated. High-performance devices with excellent reliability are also obtained. A new methodology for detecting parametric errors effectively in the early stages of production is implemented for quick yield ramp up.