Shiokawa N

ESCA study on the mechanism of adherence of metal to silica glass

Indium oxide films formed on the surface of silica glass samples by selective oxidation have been shown to greatly improve the adherence of gold-indium alloy to the silica glass. In order to clarify the role that the oxide films play in the reaction, thin indium films have been evaporated onto silica glass and heated at temperatures of between 973 and 1473 K, both in air and in hydrogen gas. Electron spectroscopy for chemical analysis (ESCA) measurements have then been made to investigate the chemical environments around oxygen and indium atoms at the reacting interface between the oxide and glass. Measured 01s and In3d5/2 spectra reveal the formation of non-bridging oxygen atoms at the interface, in addition to the original bridging oxygen atoms in silica glass. Introduction of the non-bridging oxygen atoms and indium ions into the silica glass is concluded to be an essential factor in promoting good adherence between the gold alloy and silica glass.