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Dive into the research topics where Shiro Nakanishi is active.

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Featured researches published by Shiro Nakanishi.


Journal of The Society for Information Display | 2001

Optimization of low-temperature poly-Si TFT-LCDs and a large-scale production line for large glass substrates

Kiyoshi Yoneda; Hidenori Ogata; Shinji Yuda; Kohji Suzuki; Toshifumi Yamaji; Shiro Nakanishi; Tsutomu Yamada; Yoshihiro Morimoto

An update of the progress of inherently low-temperature poly-Si (LTPS) technologies, such as ELA, ion doping, and activation in conjunction with chemical vapor deposition (CVD) and pho. tolithography will be given. We will also discuss whether LTPS LCDs will be applied to a large-scale production line using a large motherglass substrate. It was found that a more-powerful excimer laser as well as photolithography with higher-resolution and a more-precise overlaid arrangement woulc enable a large-scale production line handling motherglass of 4th generation size to be constructed ir the very near future with reasonable investment and productivity costs.


Archive | 1995

Display units having two insolating films and a planarizing film and process for producing the same

Toshifumi Yamaji; Kou Masahara; Nobuhiko Oda; Koji Suzuki; Shiro Nakanishi; Hisashi Abe; Kiyoshi Yoneda; Yoshihiro Morimoto


Archive | 1998

Method of manufacturing a thin film transistor

Mitsutaka Ohori; Shiro Nakanishi


Archive | 2001

Display device and production of display device

Hisashi Abe; Kou Masahara; Yoshihiro Morimoto; Shiro Nakanishi; Nobuhiko Oda; Koji Suzuki; Toshifumi Yamaji; Kiyoshi Yoneda; 史朗 中西; 信彦 小田; 敏文 山路; 鎬 昌原; 佳宏 森本; 清 米田; 浩司 鈴木; 寿 阿部


Archive | 2000

Thin-film transistor and method of producing the same

Shiro Nakanishi; Tsutomu Yamada


Archive | 1998

Thin film transistor having a stopper layer

Nobuhiko Oda; Shiro Nakanishi; Shinji Yuda; Tsutomu Yamada


Archive | 1999

Thin-film transistor and manufacturing method for improved contact hole

Shiro Nakanishi; Nobuhiko Oda


Archive | 1998

Thin-film transistor and method of manufacturing thin-film transistor with tapered gate of 20 degrees or less

Shiro Nakanishi; Kiyoshi Yoneda


Archive | 2002

Method for manufacturing polycrystalline semiconductor layers and thin-film transistors and laser annealing apparatus

Takashi Hagino; Kazuhiro Imao; Ken Wakita; Toshio Monzen; Hidenori Ogata; Shiro Nakanishi; Yoshihiro Morimoto


Archive | 2004

Bottom gate-type thin-film transistor and method for manufacturing the same

Nobuhiko Oda; Toshifumi Yamaji; Shiro Nakanishi; Yoshihiro Morimoto; Kiyoshi Yoneda

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