Shunichi Ishihara

Formation of deposited film

Process for forming deposited film

Process for forming deposition film

Method for forming deposition film using Si compound and active species from carbon and halogen compound

Process for the formation of an amorphous silicon deposited film with intermittent irradiation of inert gas plasma

Polycrystalline silicon semiconductor having an amorphous silicon buffer layer

Process for the preparation of photoelectromotive force member

Method for growing silicon film, method for manufacturing solar cell, semiconductor substrate, and solar cell

Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least Zn,Se and H in an amount of 1 to 4 atomic %

Apparatus for continuously preparing a light receiving element for use in photoelectromotive force member or image-reading photosensor