Shuzo Sudo

Layer structure evaluation of multilayer x‐ray mirror by combination of focused ion beam etching and transmission electron microscopy

Cross‐sectional transmission electron microscopy (TEM) specimens were fabricated by a focused ion beam etching for the purpose of investigating the layer structure of multilayer coated x‐ray mirror. Uniform samples 0.1 μm wide, 4 μm tall, and 10 μm long were prepared. The structure of a Ni–C multilayer film was observed over a large area. Good agreement between the multilayer periods obtained by TEM and diffraction analysis was found.

Thermal Stability of Ni–C Multilayer Mirror for X-Rays

The measurement of X-ray reflectivity has been performed with the lapse of annealing time for heat treatment up to 400°C in order to investigate the thermal stability of a nickel-carbon multilayer mirror for X-rays. The microstructural change of a multilayer film has been examined by means of X-ray diffraction, Auger electron spectroscopy and electron microscopy. The results show that the crystallization of nickel and the formation of nickel carbide occur for annealing above 300°C. As a consequence of microstructural changes, the surface and interfaces become rough, layer structure is destroyed, and the X-ray reflectivity shows a definite decrease.

High-Sensitivity Image-Sensor-Incorporated Image Intensifier Tube with Charge-Coupled Device for X-Ray Diffraction

The construction and performance of the two-dimensional X-ray detector are described for X-ray diffraction. The detector consists of an input fluorescent screen, an image intensifier tube and a charge-coupled device (CCD) image sensor, which is coupled using fiber-optics. The background noise of the detector is about 10-3 of the saturation peak, and the linearity range is about two orders of magnitude for the incident X-ray photons. The observation of the diffraction images with a low X-ray dose is demonstrated using this detector.

Correlation between X-Ray Reflectivity and Rutherford Backscattering Spectroscopy for Density Measurement of Thin Films

The film density of nickel was examined by means of X-ray reflectivity measurement and Rutherford backscattering spectroscopy (RBS). The Ni thin film was deposited by electron beam evaporation in a high-vacuum system and was annealed to change its density. The density of the as-deposited film was 7.8±0.1 g/cm3. A good correlation between the X-ray reflectivity measurement and RBS was demonstrated.

Applications for optical communication using micro-mechanisms

ln Wavelength Division Multiplexing (WDM) technology, higher speed transmission and more channel numbers expand the transmission capacity. For its application, optical communication devices are required to be smaller and to have higher performance. We have developed the ultrasonic micro-motor and the micro thermoelectric device for Watch use. We are trying to apply these micro-mechanical devices to optical communication devices, which are variable optical attenuator, laser diode dependent on temperature, and so on. These micro-mechanical devices are expected to be new sources for the application in the optical communication field.

Characteristics of Platinum-Palladium Alloy Film for X-Ray Mirrors

Pt-Pd alloy films have been produced for X-ray mirrors by sputter deposition. The characteristics of the alloy films have been investigated with the aid of X-ray reflectivity measurement, the transmission electron microscope, X-ray diffraction and the atomic force microscope. The grain growth of the platinum film can be controlled by the addition of a small amount of palladium. As a consequence, there is a considerable decrease in surface roughness. Thus, a Pt-Pd film which is smoother and has higher reflectivity is obtained.