Simonas Kičas

Femtosecond laser damage resistance of oxide and mixture oxide optical coatings

We report on the laser damage resistance of ion beam-sputtered oxide materials (Al2O3, Nb2O5, HfO2, SiO2, Ta2O5, ZrO2) and mixtures of Al2O3-SiO2, Nb2O5-SiO2, HfO2-SiO2, Ta2O5-SiO2, and ZrO2-SiO2, irradiated by single 500 fs pulses at 1030 nm. Laser-induced damage threshold (LIDT), refractive index, and bandgaps of the single-layer coatings are measured. For pure oxide materials a linear evolution of the LIDT with bandgap is observed. The results are in accordance with our simulations based on photo-ionization and avalanche-ionization. In the case of mixtures, however, deviations from the previous behaviors are evidenced. The evolution of the LIDT as a function of the refractive index is analyzed, and an empirical description of the relation between refractive index and LIDT is proposed.

Characterization of zirconia– and niobia–silica mixture coatings produced by ion-beam sputtering

ZrO2-SiO2 and Nb2O5-SiO2 mixture coatings as well as those of pure zirconia (ZrO2), niobia (Nb2O5), and silica (SiO2) deposited by ion-beam sputtering were investigated. Refractive-index dispersions, bandgaps, and volumetric fractions of materials in mixed coatings were analyzed from spectrophotometric data. Optical scattering, surface roughness, nanostructure, and optical resistance were also studied. Zirconia-silica mixtures experience the transition from crystalline to amorphous phase by increasing the content of SiO2. This also results in reduced surface roughness. All niobia and silica coatings and their mixtures were amorphous. The obtained laser-induced damage thresholds in the subpicosecond range also correlates with respect to the silica content in both zirconia- and niobia-silica mixtures.

Flat Focusing Mirror

The control of spatial propagation properties of narrow light beams such as divergence, focusing or imaging are main objectives in optics and photonics. In this letter, we propose and demonstrate experimentally a flat focusing mirror, based on an especially designed dielectric structure without any optical axis. More generally, it also enables imaging any light pattern in reflection. The flat focusing mirror with a transversal invariance can largely increase the applicability of structured photonic materials for light beam propagation control in small-dimension photonic circuits.

Post deposition annealing of IBS mixture coatings for compensation of film induced stress

In this work, the influence of using ion beam sputtered mixtures instead of pure materials and the impact of applied post deposition annealing to residual stress is investigated. Single layer pure films and mixtures of Nb2O5 / SiO2 as well as multilayer coatings are examined by the means of residual stress. High residual compressive stress was measured for all as-deposited samples. Pure and mixed monolayer samples were annealed at various temperatures and residual stress was determined after each annealing routine. Residual changes in optical constants, layer thickness and surface roughness upon annealing are examined to explain stress behavior. Obtained data was used to make optimization of high reflectivity structures with completely eliminated residual stress. The proposed method can be used to coat very thin substrates where flatness requirements are essential.

Effect of conventional fused silica preparation and deposition techniques on surface roughness, scattering, and laser damage resistance

Despite the growing improvement in optical polishing and deposition technologies optical resistance of the laser components used for high-power UV applications remains insufficient in many cases. In this study influence of different fused silica substrate preparation, post treatment processing and deposition techniques are examined in terms of surface roughness, optical scattering and laser damage performance. The conventional techniques of polishing, etching, and finally surface cleaning of substrates have been investigated. Further, a part of samples were also coated with SiO2 monolayer by Ion Beam Sputtering (IBS) technique. Surface quality was characterized prior to and after the treatment and deposition processes by the means of total integrated scattering (TIS) and atomic force microscopy (AFM). The experimental results of surface roughness measurements exhibited a good correlation between AFM and TIS methods. Further optical resistance was characterized with 10 ns duration pulses for 355 nm wavelength laser radiation performing 1-on-1 sample exposure test with high resolution micro-focusing approach. A dominating damage precursor ensembles produced during manufacturing processes were identified and directly compared. Finally, the conclusions about the quality influencing factors of investigated processes were drawn.

Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings

The laser damage resistance of an optical element in high power laser systems depends significantly on the surface quality of the optical substrate. In this experiment, commercially polished fused silica substrates were etched in argon plasma generated by a RF source and their surface roughness, flatness and optical properties were investigated. This method can be applied in a vacuum chamber prior to deposition of the multilayer coatings without breaking the vacuum. It was shown that by etching the resistance to 355 nm, laser radiation could be improved more than 8 times. However, it strongly related with primary substrate quality. The etching depth from 100 nm suggests the optimum performance of surface quality in terms of surface low roughness, high flatness, and high laser damage threshold. These results are of significant importance for the manufacture of high quality laser optics on fused silica substrates. As an example of an application of our technology, anti-reflective and polarizing optical interference coatings were deposited on etched substrates and the increase of their resistance to laser radiation was measured.

Investigation of subsurface damage impact on resistance of laser radiation of fused silica substrates

In this work we report an experimental investigation of subsurface damage (SSD) in conventionally polished fused silica (FS) substrates which are widely used in laser applications and directly influence performances of optical elements. Two procedures were developed: 1 - acid etching and 2 - superpolishing. Additionally, surface roughness and total integrated scattering (TIS) measurements were performed to find correlation between the main surface properties and laser induced damage threshold (LIDT) as circumstantial evidence of elimination of SSD. Different durations of acid etching have been used to study LIDT of FS substrates. These experiments revealed that the optimal etching time is ~1 min. for a given acid concentration. Laser induced damage threshold of etched and SiO2 layer coated FS samples increased ~3 times, while of the ones that were not coated - 4 times. It has been revealed that for nonetched surface a single nano- to micro-scale absorbing defect ensemble most likely associated with polishing particles within Beilby layer was dominant, while damage morphology in ~1 min etched FS sample had no point defects observed. More than 5 times lower roughness value (RMS) was obtained by superpolishing procedure using colloidal silica abrasive particles. LIDT of such superpolished fussed silica substrates was also strongly increased and compared with conventional CeO2 abrasive polishing.

Flat focusing in reflection from a chirped dielectric mirror with a defect layer

Abstract. Recently, the principle of flat focusing based on one-dimensionally chirped dielectric mirrors has been proposed and experimentally demonstrated. The flat chirped mirror causes anomalous diffraction of the beam during reflection, opposite to the normal diffraction in free space propagation. The anomalous diffraction compensates the normal diffraction of the beam resulting in focusing after reflection. For a better focusing performance and for a larger near-field focal distance, a stronger anomalous diffraction is required. We show that the anomalous diffraction can be enhanced by introducing a defect layer in the chirped mirror, as the structure becomes similar to a Gires–Tournois interferometer. The focal distance can be substantially increased due to the defect layer. In our specific structure, the focal distance shows an increase from 19 to 39  μm, numerically.

Characterization and application of HfO2 - SiO2 mixtures produced by ion-beam sputtering technology

In the past years the usage of mixed oxides coatings lead to an important improvement of laser damage threshold and quality of optical elements. In this study influence of post treatment procedure - ex-situ annealing - is examined in terms of quality, optical constants and laser induced damage threshold (LIDT) of mixed HfO2 and SiO2 coatings. Monolayer thin films containing different fractions of HfO2 are deposited with ion beam sputtering technology (IBS.) All samples are post annealed at different temperatures and optimal regimes are defined. Refractive index and absorption coefficient dispersion is evaluated from transmission spectra measurements. Surface roughness of all samples is characterized before and after deposition and annealing, using atomic force microscopy (AFM). Microstructural changes are identified from changes in surface topography. Further, optical resistance was characterized by 5.7 ns duration pulses for 355 nm wavelength laser radiation, performing 1-on-1 sample exposure tests with high resolution micro-focusing approach for monolayer samples and S-on-1 tests for multilayer reflectors. Morphology of damaged sites was analyzed through optical microscopy. Finally, conclusions about annealing effect for mixed HfO2 and SiO2 monolayer and multilayer coatings are made.

An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations

We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO2, HfO2, Ta2O5, Al2O3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO2, HfO2/SiO2, Ta2O5/SiO2, Al2O3/SiO2 and Sc2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3 material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.