Siriguleng Zhang

Surface morphology of AlN buffer layer and its effect on GaN growth by metalorganic chemical vapor deposition

The in situ optical reflectivity measurements are employed to monitor the GaN epilayer growth process above low-temperature AlN buffer layer on c-plane sapphire substrate by metalorganic chemical vapor deposition. It is found that the lateral growth of GaN islands and their coalescence is promoted in the initial growth stage if the AlN buffer layer is treated with a long annealing time and has an optimal thickness: As confirmed by atomic force microscopy observations, the quality of GaN epilayers is closely dependent on the surface morphology of AlN buffer layer, especially the grain size and nuclei density after the annealing treatment.

Carriers capturing of V-defect and its effect on leakage current and electroluminescence in InGaN-based light-emitting diodes

The effect of quantum well (QW) number on performances of InGaN/GaN multiple-quantum-well light-emitting diodes has been investigated. It is observed that V-defects, originated from various InGaN well layers intercepted by threading dislocations (TDs), increase in density and averaged size with more periods of QWs, resulting in larger reverse-bias leakage current and lower emission efficiency of light-emitting diodes. Conductive atomic force microscopy measurements demonstrate that V-defects may preferentially capture carriers, subsequently enhance local current and nonradiative recombinations at associated TD lines, which suggest that TD lines with V-defects at vertex have larger influence on emission efficiency than those without V-defects.

Effects of edge dislocations and intentional Si doping on the electron mobility of n-type GaN films

The effects of dislocations and Si doping on the electrical properties of n-type GaN grown by metal organic chemical vapor deposition (MOCVD) are investigated. It is found that both electron mobility and carrier concentration are strongly influenced by edge dislocations. A moderate Si doping during the GaN growth improves the electron mobility, but the best doping effect depends on the dislocation density of the sample. High quality about 4-μm-thick MOCVD-grown GaN film with a room temperature electron mobility as high as 1005cm2∕Vs is obtained by optimizing growth conditions.

Role of edge dislocation and Si impurity in linking the blue luminescence and yellow luminescence in n-type GaN films

A close relationship is found between the blue and yellow luminescence bands in n-type GaN films, which are grown without intentional acceptor doping. The intensity ratio of blue luminescence to yellow luminescence (IBL/IYL) decreases with the increase in edge dislocation densities as demonstrated by the (102) full width at half maximum of x-ray diffraction. In addition, the IBL/IYL ratio decreases with the increase in Si doping. It is suggested that the edge dislocation and Si impurity play important roles in linking the blue and yellow luminescence.

Localized surface optical phonon mode in the InGaN/GaN multiple-quantum- wells nanopillars: Raman spectrum and imaging

An interesting phonon mode at around 685–705 cm−1 was clearly observed in the Raman spectra of InGaN/GaN multiple-quantum-wells nanopillars with different diameters at room temperature. The Raman peak position of this mode is found to show a distinct dependence on the nanopillar size, which is in well agreement with theoretical calculation of the surface optical (SO) phonon modes of nanopillars. Moreover, this kind of SO phonon was evidenced to be located on the pillar surface by using scanning confocal micro-Raman microscopy.

A hybrid silicon single mode laser with a slotted feedback structure

In this paper, a III-V/Silicon hybrid single mode laser operating at a long wavelength for photonic integration circuit is presented. The InGaAlAs gain structure is bonded onto a patterned silicon-on insulator wafer directly. The novel mode selected mechanism based on a slotted silicon waveguide is applied, which only need standard photolithography in the whole technological process. The side mode suppression ratio of larger than 20dB is obtained from experiments.

High efficient GaN-based laser diodes with tunnel junction

High-efficient GaN-based laser diodes (LDs) with tunnel junction are designed by replacing conventional p-type AlGaN cladding layers and p-type GaN contact with lower-resistant n-type AlGaN cladding layers and n-type GaN contact. In addition, the characteristics of the LDs with tunnel junction are numerically investigated by using the commercial software lastip. It is found that the performance of these LDs is greatly improved. As a comparison, the absorption loss and non-radiative recombination are greatly reduced. The threshold current and series resistance are decreased by 12% and 59%, respectively, and the slope efficiency is raised up by 22.3%. At an injection current of 120 mA, the output power and wall-plug-efficiency are increased by 34% and 79%, respectively.

Investigation on the structural origin of n-type conductivity in InN films

This work presents a study of the correlation between the electrical properties and the structural defects in nominally undoped InN films. It is found that the density of edge-type threading dislocations (TDs) considerably affects the electron concentration and mobility in InN films. The Hall-effect measured electron concentration increases, while the Hall mobility decreases with the increase in the edge-type TD density. With the combination of secondary ion mass spectrometry and positron annihilation analysis, we suggest that donor-type point defects at the edge-type TD lines may serve as dominant donors in InN films and affect the carrier mobility.

The influence of growth temperature and input V/III ratio on the initial nucleation and material properties of InN on GaN by MOCVD

The effects of growth temperature and V/III ratio on the InN initial nucleation of islands on the GaN (0 0 0 1) surface were investigated. It is found that InN nuclei density increases with decreasing growth temperature between 375 and 525 degrees C. At lower growth temperatures, InN thin films take the form of small and closely packed islands with diameters of less than 100 nm, whereas at elevated temperatures the InN islands can grow larger and well separated, approaching an equilibrium hexagonal shape due to enhanced surface diffusion of adatoms. At a given growth temperature of 500 degrees C, a controllable density and size of separated InN islands can be achieved by adjusting the V/III ratio. The larger islands lead to fewer defects when they are coalesced. Comparatively, the electrical properties of the films grown under higher V/III ratio are improved.

Microstructure optimization of the composite phase ceramic phosphor for white LEDs with excellent luminous efficacy.

The two-phase MgAl2O4-Ce:YAG ceramic phosphor was fabricated by the solid-state reaction in vacuum, and it presented a better luminous efficacy than the single-phase transparent ceramic phosphor when directly combined with the blue light-emitting diodes. The addition of MgAl2O4 implemented the control of the grain sizes and the variation of microstructure, and the microstructure optimization further improved the luminous efficacy of the composite phase ceramic phosphor. A maximum luminous efficacy attaining 99 lm/W at the correlated color temperature 5000 K was obtained. The composite phase ceramic phosphor is expected to be a promising candidate for use in the high-power light source.