Soner Özen

Optical and Surface Characteristics of Mg-Doped GaAs Nanocrystalline Thin Film Deposited by Thermionic Vacuum Arc Technique

Magnesium (Mg) is the most promising p-type dopant for gallium arsenide (GaAs) semiconductor technology. Mg-doped GaAs nanocrystalline thin film has been deposited at room temperature by the thermionic vacuum arc technique, a rapid deposition method for production of doped GaAs material. The microstructure and surface and optical properties of the deposited sample were investigated by x-ray diffraction analysis, scanning electron microscopy, energy-dispersive x-ray spectroscopy, atomic force microscopy, ultraviolet–visible spectrophotometry, and interferometry. The crystalline direction of the deposited sample was determined to be (220) plane and (331) plane at 44.53° and 72.30°, respectively. The Mg-doped GaAs nanocrystalline sample showed high transmittance.

The influence of voltage applied between the electrodes on optical and morphological properties of the InGaN thin films grown by thermionic vacuum arc

The aim of this research is to investigate the optical and morphological properties of the InGaN thin films deposited onto amorphous glass substrates in two separate experiments with two different voltages applied between the electrodes, i.e. 500 and 600 V by means of the thermionic vacuum arc technique. This technique is original for thin film deposition and it enables thin film production in a very short period of time. The optical and morphological properties of the films were investigated by using field emission scanning electron microscope, atomic force microscope, spectroscopic ellipsometer, reflectometer, spectrophotometer, and optical tensiometer. Optical properties were also supported by empirical relations. The deposition rates were calculated as 3 and 3.3 nm/sec for 500 and 600 V, respectively. The increase in the voltage also increased the refractive index, grain size, root mean square roughness and surface free energy. According to the results of the wetting experiments, InGaN samples were low-wettable, also known as hydrophobic.

Optical, morphological properties and surface energy of the transparent Li4Ti5O12 (LTO) thin film as anode material for secondary type batteries

LTO thin film was deposited for the first time on a glass microscope slide (MS) by RF magnetron sputtering technology. This method has been suitable for preparation of high-quality thin films. The surface properties of the produced film were determined by atomic force microscope (AFM). The surface of the produced film appeared smooth and homogeneous. LTO coated on MS had compact structure and low roughness. A UV–vis spectrophotometer was used to determine intensity of light passing through the samples. Thus, according to the results obtained the produced film was highly transparent. The refractive index of the LTO thin film was presented in a low MSE value by spectroscopic ellipsometry (SE) and it was about 1.5. The optical band gap (E g) was determined by the Tauc method. The produced LTO thin film exhibited a wide band gap semiconductor property with a band gap energy of about 2.95 eV. Finally, the surface free energy of the LTO thin film was calculated from the contact angle measurements using the Lewis acid-base, OWRK/Fowkes, Wu and Zisman methods.

Optical and surface properties of optically transparent Li3 PO4 solid electrolyte layer for transparent solid batteries.

In this study, optical and surface properties of the optically transparent Li3 PO4 solid electrolyte layer for transparent solid battery have been investigated for the first time. To determine the optical properties, transmittance, absorbance, reflection, refractive index spectra, and optical band gap were determined by UV-Vis spectrophotometer and optical interferometer. The surface property of the transparent Li3 PO4 solid electrolyte was analyzed using atomic force microscopy. One another important parameter is contact angle (CA) surface free energy (SFE). CA and SFE were determined by optical tensiometer. These values probably are a most important parameter for polymer and hybrid battery performance. For the best performance, value of CA should be low. As a result, solid electrolyte layer is a highly transparent and it has a high wettability. SCANNING 38:317-321, 2016.

Morphological and optical comparison of the Si doped GaN thin film deposited onto the transparent substrates

The aim of this paper is to expand the body of knowledge about the silicon doped gallium nitride thin films deposited on different substrates. The physical properties of the Si doped GaN thin films deposited on the glass and polyethylene terephthalate substrates by thermionic vacuum arc which is plasma production technique were investigated. Thermionic vacuum arc method is a method of producing pure material plasma. The Si doped GaN thin films were analyzed using the following methods and the devices: atomic force microscopy, x-ray diffraction device, spectroscopic ellipsometer and energy dispersive x-ray spectroscopy detector. The produced Si doped GaN thin films are in the (113) orientation. The thicknesses and refractive index were determined by using Cauchy dispersion model. Surface morphologies of produced thin films are homogenous and low roughness. Our analysis showed that the thermionic vacuum arc method present important advantages for optical and industrial applications.

A new method for titania thin film production: Thermionic vacuum arc method

In this research, transparent titania (TiO2) thin films were deposited on a glass microscope slide and on a flexible polyethylene terephthalate (PET) substrate under a high vacuum condition by means of the thermionic vacuum arc (TVA) method in a very short period of time (60 s). Optical properties and surface properties of the coated TiO2 surfaces are related to the structural changes of the coated layers due to ion energies and substrate effect. But obtained results are closely linked to literature values. Our analysis showed that the TVA method is an alternative method for low-temperature coatings and the produced films present important advantages for optical and industrial applications.

Optical and surface properties of the in doped GaAs layer deposition using thermionic vacuum arc method.

A broadband optical transparent InGaAs semiconductor layer production of micron thicknesses was produced in only 75 s by thermionic vacuum arc (TVA) method at the first time. The optical and surface properties of the produced layers have been investigated. InGaAs structure is using in electronics and optoelectronics devices. The main advantage of TVA method is its fast deposition rate, without any loss in the quality of the films. Doping is a very simple and fast according to common production methods. InGaAs is an alloy of indium arsenide (InAs) and gallium arsenide (GaAs). InAs with (220) crystallographic direction and GaAs with (024)/(022) crystallographic directions were detected using by XRD analysis. GaAs and InAs are in the cubic and zinc blende crystal system, respectively. According to the transmittance spectra, sample has a broadband transparency in the range of 1000-3300 nm. According to results, defined TVA method for In doping to GaAs is proper fast and friendly method. SCANNING 38:297-302, 2016.

Solid state battery manufacturing with thermionic vacuum ARC and RF sputtering

Very thin rechargeable batteries of 200 nm thicknesses have been produced at Plasma science and technologies laboratory at Physics Department of Art and Science Faculty of Eskisehir Osmangazi University. Solid-state batteries were manufactured with thermionic vacuum arc and RF sputtering methods. These methods are based on plasma deposition systems. According to obtained results, these batteries can be able to endure more than ten thousand times and these batteries have seen no loss of charging capacity.

Optical, surface and magnetic properties of the Ti-doped GaN nanosheets on glass and PET substrates by thermionic vacuum arc (TVA) method

ABSTRACT Room-temperature ferromagnetism of GaN and doped GaN materials has been reported in nanostructured form. Especially, nanoparticles show ferromagnetic properties at room temperature. In this paper, Ti-doped effects on GaN were deposited on glass and Polyethylene terephthalate (PET) substrates by thermionic vacuum arc and their room temperature magnetic properties are presented for the first time. The structure of the Ti-doped GaN was crystallized in a novel form, nano honeycomb formation. Optical and surface properties of the nano honeycombs and honeycomb nanosheets were determined. GaN and TiN phases were detected in X-ray diffraction patterns. Field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM) device were used for imaging of the crystal structure. According to FESEM images, hexagonal crystal formations were detected for all samples. Crystal formations are very good oriented on PET substrates materials according to glass samples. The band gap value of the sample is changed by crystallization dimension. It was found that increasing crystallizations and decreasing crystal dimensions were increased the band gap of the Ti-doped GaN approximately 50 meV. Fourier transform infrared spectra and a vibrating sample magnetometer results were presented. These results confirm the Ti doped GaN honeycomb nanosheets and nano honeycombs show the room temperature ferromagnetic properties.

Optical, Surface and Microstructural Properties of Li4Ti5O12 Thin Films Coated by RF Magnetron Sputtering

ABSTRACT Li4Ti5O12 thin films were deposited on glass substrates by the RF magnetron sputtering method in an argon gas atmosphere at different powers. Some properties of the coated Li4Ti5O12 films were examined using some techniques. Structural characteristics of the produced Li4Ti5O12 films were investigated by X-ray diffraction. The Li4Ti5O12 phases were identified as (311) and (222). The surface morphology of the produced Li4Ti5O12 films was investigated using an atomic force microscope. The transmittance and the absorbance were measured using a UV–vis spectrophotometer. The transmittance values were around 88% and 90%. The absorbance values were approximately 0.053 and 0.048. The film thickness values were 140 and 50 nm. The transparency values of the produced films were high. The optical band gap values of the produced LTO films were calculated as ∼3.8 eV. The refractive index and the reflectance spectra values of samples were determined using interferometer measurements. The refractive index values were 1.51 and 1.44 at 550 nm, respectively.