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Dive into the research topics where Sungwook Chung is active.

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Featured researches published by Sungwook Chung.


Applied Physics Letters | 2000

Silicon nanowire devices

Sungwook Chung; Jae-Young Yu; James R. Heath

Transport measurements were carried out on 15–35 nm diameter silicon nanowires grown using SiH4 chemical vapor deposition via Au or Zn particle-nucleated vapor-liquid-solid growth at 440°C. Both Al and Ti/Au contacts to the wires were investigated. The wires, as produced, were essentially intrinsic, although Au nucleated wires exhibited a slightly higher conductance. Thermal treatment of the fabricated devices resulted in better electrical contacts, as well as diffusion of dopant atoms into the nanowires, and increased the nanowire conductance by as much as 10^4. Three terminal devices indicate that the doping of the wires is p type.


Nanotechnology | 2002

A MEMS nanoplotter with high-density parallel dip-pen nanolithography probe arrays

Ming Zhang; David Bullen; Sungwook Chung; Seunghun Hong; Kee S. Ryu; Zhifang Fan; Chad A. Mirkin; Chang Liu

We report on the development of a nanoplotter that consists of an array of microfabricated probes for parallel dip-pen nanolithography. Two types of device have been developed by using microelectromechanical systems micromachining technology. The first consists of 32 silicon nitride cantilevers separated by 100 µm, while the second consists of eight boron-doped silicon tips separated by 310 µm. The former offers writing and imaging capabilities, but is challenged with respect to tip sharpness. The latter offers smaller linewidths and increased imaging capabilities at the expense of probe density. Parallel generation of nanoscopic monolayer patterns with a minimum linewidth of 60 nm has been demonstrated using an eight-pen microfabricated probe array.


Applied Physics Letters | 2004

Parallel dip-pen nanolithography with arrays of individually addressable cantilevers

David Bullen; Sungwook Chung; Xuefeng Wang; Jun Zou; Chad A. Mirkin; Chang Liu

In dip-pen nanolithography (DPN), nanoscale chemical patterns are created by directly transferring chemical molecules from the tip of an atomic force microscope probe to a surface. We report the development of a thermally actuated probe array for DPN applications. The array consists of ten thermal bimorph actuated probes, each 300 μm long, with a lateral spacing of 100 μm. The probes are actuated by passing dc current through a heater embedded in the probe base. The array is demonstrated by using it to simultaneously write ten different octadecanethiol patterns on a gold surface.


Proceedings of the National Academy of Sciences of the United States of America | 2010

Self-catalyzed growth of S layers via an amorphous-to-crystalline transition limited by folding kinetics

Sungwook Chung; Seong-Ho Shin; Carolyn R. Bertozzi; James J. De Yoreo

The importance of nonclassical, multistage crystallization pathways is increasingly evident from theoretical studies on colloidal systems and experimental investigations of proteins and biomineral phases. Although theoretical predictions suggest that proteins follow these pathways as a result of fluctuations that create unstable dense-liquid states, microscopic studies indicate these states are long-lived. Using in situ atomic force microscopy to follow 2D assembly of S-layer proteins on supported lipid bilayers, we have obtained a molecular-scale picture of multistage protein crystallization that reveals the importance of conformational transformations in directing the pathway of assembly. We find that monomers with an extended conformation first form a mobile adsorbed phase, from which they condense into amorphous clusters. These clusters undergo a phase transition through S-layer folding into crystalline clusters composed of compact tetramers. Growth then proceeds by formation of new tetramers exclusively at cluster edges, implying tetramer formation is autocatalytic. Analysis of the growth kinetics leads to a quantitative model in which tetramer creation is rate limiting. However, the estimated barrier is much smaller than expected for folding of isolated S-layer proteins, suggesting an energetic rationale for this multistage pathway.


IEEE\/ASME Journal of Microelectromechanical Systems | 2004

Design, fabrication, and characterization of thermally actuated probe arrays for dip pen nanolithography

David Bullen; Xuefeng Wang; Jun Zou; Sungwook Chung; Chad A. Mirkin; Chang Liu

In Dip Pen Nanolithography (DPN), arbitrary nanoscale chemical patterns can be created by the diffusion of chemicals from the tip of an atomic force microscope (AFM) probe to a surface. This paper describes the design, optimization, fabrication, and testing of an actuated multi-probe DPN array. The probe array consists of 10 thermal bimorph active probes made of silicon nitride and gold. The probes are 300 /spl mu/m long and the tips are spaced 100 /spl mu/m apart. An actuation current of 10 mA produces a tip deflection of 8 /spl mu/m, which is enough to remove individual tips from the surface independent of the adjacent probes. An analytical probe model is presented and used to optimize the design against several possible failure modes. The array is demonstrated by using it to simultaneously write 10 unique octadecanethiol patterns on a gold surface. Pattern linewidth as small as 80 nm has been created at a maximum write speed of 20 /spl mu/m/sec. By writing multiple, distinctly different patterns in parallel, this device provides a significant improvement in throughput and flexibility over conventional AFM probes in the DPN process.


Applied Physics Letters | 1997

Parallel fabrication and single-electron charging of devices based on ordered, two-dimensional phases of organically functionalized metal nanocrystals

Gil Markovich; Daniel V. Leff; Sungwook Chung; Hermes Soyez; Bruce Dunn; James R. Heath

A parallel technique for fabricating single-electron, solid-state capacitance devices from ordered, two-dimensional closest-packed phases of organically functionalized metal nanocrystals is presented. The nanocrystal phases were prepared as Langmuir monolayers and subsequently transferred onto Al-electrode patterned glass substrates for device construction. Alternating current impedance measurements were carried out to probe the single-electron charging characteristics of the devices under both ambient and 77 K conditions. Evidence of a Coulomb blockade and step structure reminiscent of a Coulomb staircase is presented.


Proceedings of the National Academy of Sciences of the United States of America | 2012

Direct observation of kinetic traps associated with structural transformations leading to multiple pathways of S-layer assembly

Seong-Ho Shin; Sungwook Chung; Babak Sanii; Luis R. Comolli; Carolyn R. Bertozzi; James J. De Yoreo

The concept of a folding funnel with kinetic traps describes folding of individual proteins. Using in situ Atomic Force Microscopy to investigate S-layer assembly on mica, we show this concept is equally valid during self-assembly of proteins into extended matrices. We find the S-layer-on-mica system possesses a kinetic trap associated with conformational differences between a long-lived transient state and the final stable state. Both ordered tetrameric states emerge from clusters of the monomer phase, however, they then track along two different pathways. One leads directly to the final low-energy state and the other to the kinetic trap. Over time, the trapped state transforms into the stable state. By analyzing the time and temperature dependencies of formation and transformation we find that the energy barriers to formation of the two states differ by only 0.7 kT, but once the high-energy state forms, the barrier to transformation to the low-energy state is 25 kT. Thus the transient state exhibits the characteristics of a kinetic trap in a folding funnel.


Applied Physics Letters | 2006

Transport study of a single bismuth nanowire fabricated by the silver and silicon nanowire shadow masks

Daechul Choi; Alexander A. Balandin; Martin S. Leung; Gary W. Stupian; N. Presser; Sungwook Chung; James R. Heath; Alex Khitun; Kang L. Wang

The authors have carried out measurements of the electrical conductivity of single bismuth nanowires fabricated by the low energy electron beam lithography using the silver/silicon nanowire shadow masks. The examined nanowires had cross-sectional dimensions of 40×30 and 40×50nm2. The chosen nanowire sizes had been slightly below the critical diameter D (∼50nm) at which a semimetal to semiconductor phase transition was predicted to occur. The results reveal a semiconductorlike temperature dependence of the electrical conductivity of a bismuth nanowire, which is strikingly different from that of the bulk bismuth.


Applied Physics Letters | 2011

Temperature-dependence of ink transport during thermal dip-pen nanolithography

Sungwook Chung; Jonathan R. Felts; Debin Wang; William P. King; James J. De Yoreo

We investigate the control of tip temperature on feature size during dip-pen nanolithography (DPN) of mercaptohexadecanoic acid (MHA) on Au. Heated atomic force microscopy (AFM) probes operated between 25 °C and 50 °C wrote nanostructures of MHA for various dwell times and tip speeds. The feature size exhibited an exponential dependence on tip temperature with an apparent activation barrier of 165 kJ/mol. Analysis of the ink transfer process shows that, while ∼1/3 of the barrier is from ink dissolution into the meniscus, the rest reflects the barrier to adsorption onto the growing feature, a process that has been ignored in previous DPN models.


Journal of Vacuum Science and Technology | 1999

Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask

S. H. Choi; Kang L. Wang; Martin S. Leung; Gary W. Stupian; N. Presser; Sungwook Chung; Gil Markovich; Seong-Ku Kim; James R. Heath

In this article, we present a new method for fabricating precisely defined nanometer scale photoresist wire patterns. The Langmuir technique was utilized to form high aspect ratio lamellae, or wire patterns, of Ag nanocrystals at the air/water interface, and these patterns were transferred onto resist-coated substrates as a Langmuir–Schaeffer film and as a shadowmask. The wire patterns were transferred to the photoresist material by spatially selective electron beam exposure on the Ag nanocrystal wire shadowmask. Monte Carlo simulation was done to estimate the electron stopping power for the Ag nanocrystal shadowmask at low voltage.

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James J. De Yoreo

Pacific Northwest National Laboratory

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James R. Heath

University of California

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Chang Liu

Northwestern University

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Seong-Ho Shin

Lawrence Berkeley National Laboratory

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Anju Chatterji

Scripps Research Institute

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Chin Li Cheung

University of Nebraska–Lincoln

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John E. Johnson

Scripps Research Institute

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