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T.Homma

NEC

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Publication

Featured researches published by T.Homma.

Proceedings of 13th VLSI Multilevel Interconnection Conference | 1996

Integrated Interconnect Module Development

J.T.Pan J.T.Pan; D.Ma D.Ma; T.Sahin T.Sahin; R.Tolles R.Tolles; S.Broydo S.Broydo; H.Miyamoto H.Miyamoto; Koji Kishimoto; Mieko Suzuki; T.Homma T.Homma; M.Kikuchi M.Kikuchi; Tetsuya Homma

Journal of The Electrochemical Society | 2002

A Photoresist Removal Process with Plasma Treatment Using Gas Containing Hydrogen after Aluminum Etching

Makoto Saito; I.Touno I.Touno; Kayoko Omiya; T.Homma T.Homma; Takao Nagatomo; Tetsuya Homma

Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF) | 2001

Fabrication of Bi2SiO5 Thin Films for MFIS Structures

Munehiro Yamaguchi; K.Hiraki K.Hiraki; T.Homma T.Homma; Takao Nagatomo; Y.Masuda Y.Masuda; Tetsuya Homma

Journal of The Eectrochemical Society | 2000

Optical Properties of Fluorinated Silicon Oxide and Organic Spin-on-Glass Films fou Thin-Film Optical Waveguides.

T.Homma T.Homma; Masaya Sakamoto; Yuji Ariyama; S.Kanegae S.Kanegae; Hiroyasu Kondo; Masahiro Itoh; Munehiro Yamaguchi; Hideo Takahashi; Tetsuya Homma

Default journal | 1998

Optical Properties of SiOF Films by Liquid-Phase-Deposition (LPD) for Optical Waveguide

T.Homma T.Homma; Tetsuya Homma

Jornal of The Electrochemical Society | 1997

A Structural study for Efficient Electroluminescence Cells using Perylene Doped Organic Materials.

H.Kojima H.Kojima; A.Ozawa A.Ozawa; Toshiaki Takahashi; Masafumi Nagaoka; T.Homma T.Homma; Takao Nagatomo; Tetsuya Homma

Default journal | 1997

Trends of Interlayer Dielectric Film Technologies in Ultra-Large-Scale Integrated Circuits (ULSIs)

T.Homma T.Homma; Tetsuya Homma

Proceedings of 11th VLSI Multilevel Interconnection Conference | 1994

An Interlayer Dielectric Films Formation Technology Using TEOS/O3 APCVD SiO2 Films on Dual Frequency TEOS/O2 PECVD SiO2 Films

Akira Kubo; K.Hirose K.Hirose; T.Homma T.Homma; Yukinobu Murao; Tetsuya Homma

Proceedings of 10th VLSI Multilevel Interconnection Conference | 1993

A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma T.Homma; Yukinobu Murao; Tetsuya Homma

Journal of The Electochemical Society | 1993

Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

T.Homma T.Homma; Ryuichi Yamaguchi; Yukinobu Murao; Tetsuya Homma

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Collaboration

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Yukinobu Murao

NEC

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Takao Nagatomo

Shibaura Institute of Technology

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Youichiro Numasawa

NEC

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Munehiro Yamaguchi

Showa University

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Akira Kubo

NEC

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Hideo Takahashi

Shibaura Institute of Technology

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Hiroyasu Kondo

Shibaura Institute of Technology

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K.Eguchi K.Eguchi

NEC

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K.Hamano K.Hamano

NEC

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Kayoko Omiya

Toshiba

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