Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where T. Kovacs is active.

Publication


Featured researches published by T. Kovacs.


Applied Physics Letters | 1983

Suppression of low angle grain boundaries in seeded thick Si films recrystallized between SiO2 layers

Loren Pfeiffer; G. K. Celler; T. Kovacs; McD. Robinson

We observe a marked suppression in the formation of low angle grain boundaries (sub‐boundaries) during the graphite strip heater recrystallization of thick Si films over buried islands of SiO2. For 27‐μm‐thick Si films, areas exceeding 1×1 mm2 have been recrystallized on SiO2 which are completely free of grain boundaries and sub‐boundaries, but which contain dislocations in other configurations. Moreover, we find the density of these remaining dislocations to be much reduced near the upper and lower SiO2 interfaces.


Applied Physics Letters | 1985

Si‐on‐insulator films of high crystal perfection by zone melting under a SiO2 cap provided with vent openings

Loren Pfeiffer; T. Kovacs; K. W. West

We observe a marked improvement in the crystal perfection of zone melted thick Si‐on‐insulator films that were prepared for melt processing by etching an array of openings in the SiO2 capping layer. Chemical defect etching and Rutherford backscattering measurements reflect this improvement, which we believe is due to the creation of new venting paths that reduce the level of excess dissolved SiO2 in the molten Si before recrystallization.


MRS Proceedings | 1981

Laser Induced Diffusion of Radioactive As into Si

Loren Pfeiffer; T. Kovacs; G. K. Celler; L. E. Trimble; D. C. Jacobson

A high efficiency technique for incorporating As or other high volatility elements into Si and other semiconductors by laser pulse processing is described. By this method more than 80% of the As atoms painted onto a Si surface were made to relocate onto substitutional sites in the 73 Si crystal. Mossbauer analysis of laser diffused As atoms in a Ge crystal indicates that although the final As sites are >97% substitutional, the majority are associated with one or more defects not seen in conventionally diffused material.


Nuclear Instruments and Methods | 1980

Radiation overload warning system for Geiger-Müller detectors

Loren Pfeiffer; T. Kovacs; Allen P. Mills

Abstract We call attention to the characteristic that common Geiger-Muller detectors can give false safe readings when actually under dangerous radiation overload. We describe inexpensive circuitry which reliably warns the operator of this condition.


Archive | 1983

Growth of oriented single crystal semiconductor on insulator

T. Kovacs; Loren Pfeiffer


Physical Review Letters | 1984

Amplitude of the charge-density waves in 1T- and 2H-TaSe2

Loren Pfeiffer; T. Kovacs; F. J. Di Salvo


Physical Review C | 1979

Beta spectrum of In 115

Loren Pfeiffer; Allen P. Mills; Edwin A. Chandross; T. Kovacs


Archive | 1986

METHOD FOR PRODUCING SEMICONDUCTOR DEVICES COMPRISING A LATERAL CRYSTALLISATION OF SEMICONDUCTOR MATERIAL ON A BURIED INSULATOR

T. Kovacs; Loren Neil Pfeiffer


Physical Review C | 1979

Beta spectrum of /sup 115/In

Loren Pfeiffer; Allen P. Mills; Edwin A. Chandross; T. Kovacs


Archive | 1979

Geiger-Mueller radiation detector with means for detecting and indicating the existence of radiation overload

T. Kovacs; Allen P. Mills; Loren Pfeiffer

Collaboration


Dive into the T. Kovacs's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge