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Dive into the research topics where T. Sekiguchi is active.

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Featured researches published by T. Sekiguchi.


Journal of Applied Physics | 1965

Instantaneous Direct‐Display System of Plasma Parameters by Means of Triple Probe

Sin‐Li Chen; T. Sekiguchi

A new electrostatic probe method utilizing the triple probe is proposed in which no voltage or frequency sweep (or switching) is required. This feature enables us to determine the instantaneous values of the electron temperature (Te), as well as the electron density (ne), within a short time which is of the order of the intrinsic response time of the probe itself (⪝1μsec). Moreover, the system allows the direct display of the Te values as well as the semidirect display of the ne values on appropriate display units, thus permitting us to eliminate almost all procedures usually required for data processing. In view of the features mentioned, this system may be a useful diagnostic tool not only for stationary plasmas but also for rapidly varying time‐dependent plasmas of various types.This paper presents theoretical considerations for the instantaneous direct‐display system using a symmetrical triple probe. Discussions are also presented for the estimation of errors caused by the variation of ion saturation ...


Journal of Applied Physics | 2004

Electron-beam-induced current study of grain boundaries in multicrystalline silicon

Jinxin Chen; T. Sekiguchi; Deren Yang; Fuxing Yin; Kota Kido; Sadahiro Tsurekawa

The effects of grain boundary (GB) character and impurity contamination on the recombination activity of grain boundaries (GBs) in multicrystalline silicon (mc-Si) were systematically studied through an electron-beam-induced current (EBIC) technique. First, clean GBs of various characters were checked at 300 and 100K. The EBIC contrasts of these GBs were in the same range of 0%–2% at 300K and 2%–4% at 100K, suggesting that the recombination activity of clean GBs is weak and the GB character has no significant effect on it. Second, the effect of impurities was studied by comparing the EBIC contrasts of the same type of the GBs in mc-Si with different Fe contamination levels. The recombination activity of GBs became stronger as the contamination level rose. The variation in the recombination activity related to the GB character was also observed in these specimens. The random or high-Σ GBs showed a stronger EBIC contrast than the low-Σ GBs. Moreover, we found that the EBIC contrast was not uniform along one...


Nature Nanotechnology | 2014

Storing quantum information for 30 seconds in a nanoelectronic device

Juha Muhonen; Juan P. Dehollain; Arne Laucht; F. E. Hudson; Rachpon Kalra; T. Sekiguchi; Kohei M. Itoh; D.N. Jamieson; J. C. McCallum; Andrew S. Dzurak; Andrea Morello

The spin of an electron or a nucleus in a semiconductor naturally implements the unit of quantum information--the qubit. In addition, because semiconductors are currently used in the electronics industry, developing qubits in semiconductors would be a promising route to realize scalable quantum information devices. The solid-state environment, however, may provide deleterious interactions between the qubit and the nuclear spins of surrounding atoms, or charge and spin fluctuations arising from defects in oxides and interfaces. For materials such as silicon, enrichment of the spin-zero (28)Si isotope drastically reduces spin-bath decoherence. Experiments on bulk spin ensembles in (28)Si crystals have indeed demonstrated extraordinary coherence times. However, it remained unclear whether these would persist at the single-spin level, in gated nanostructures near amorphous interfaces. Here, we present the coherent operation of individual (31)P electron and nuclear spin qubits in a top-gated nanostructure, fabricated on an isotopically engineered (28)Si substrate. The (31)P nuclear spin sets the new benchmark coherence time (>30 s with Carr-Purcell-Meiboom-Gill (CPMG) sequence) of any single qubit in the solid state and reaches >99.99% control fidelity. The electron spin CPMG coherence time exceeds 0.5 s, and detailed noise spectroscopy indicates that--contrary to widespread belief--it is not limited by the proximity to an interface. Instead, decoherence is probably dominated by thermal and magnetic noise external to the device, and is thus amenable to further improvement.


Journal of Applied Physics | 2003

Postgrowth annealing of defects in ZnO studied by positron annihilation, x-ray diffraction, Rutherford backscattering, cathodoluminescence, and Hall measurements

Z. Q. Chen; Shunya Yamamoto; Masaki Maekawa; Atsuo Kawasuso; Xiaoli Yuan; T. Sekiguchi

Defects in hydrothermal grown ZnO single crystals are studied as a function of annealing temperature using positron annihilation, x-ray diffraction, Rutherford backscattering, Hall, and cathodoluminescence measurements. Positron lifetime measurements reveal the existence of Zn vacancy related defects in the as-grown state. The positron lifetime decreases upon annealing above 600 °C, which implies the disappearance of Zn vacancy related defects, and then remains constant up to 900 °C. The Rutherford backscattering and x-ray rocking curve measurements show the improvement of crystal quality due to annealing above 600 °C. Although the crystal quality monitored by x-ray diffraction measurements is further improved after annealing at above 1000 °C, the positron lifetime starts to increase. This is due to either the formation of Zn vacancy related defects, or the change of the Zn vacancy charge state occupancy as a result of the Fermi level movement. The electron concentration increases continuously with increa...


Physical Review Letters | 2009

Simultaneous Subsecond Hyperpolarization of the Nuclear and Electron Spins of Phosphorus in Silicon by Optical Pumping of Exciton Transitions

A. Yang; M. Steger; T. Sekiguchi; M. L. W. Thewalt; Thaddeus D. Ladd; Kohei M. Itoh; H. Riemann; N. V. Abrosimov; P. Becker; Hans-Joachim Pohl

A. Yang, M. Steger, T. Sekiguchi, M. L. W. Thewalt, ∗ T. D. Ladd, K. M. Itoh, H. Riemann, N. V. Abrosimov, P. Becker, and H.-J. Pohl Department of Physics, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6 E. L. Ginzton Laboratory, Stanford University, Stanford CA 94305, USA Keio University, Yokohama 223-8522, Japan Institute for Crystal Growth (IKZ), 12489 Berlin, Germany PTB Braunschweig, 38116 Braunschweig, Germany VITCON Projectconsult GmbH, 07745 Jena, Germany (Dated: Accepted for publication in Physical Review Letters on June 03, 2009)


Physical Review Letters | 2010

Hyperfine structure and nuclear hyperpolarization observed in the bound exciton luminescence of Bi donors in natural Si.

T. Sekiguchi; M. Steger; Kamyar Saeedi; M. L. W. Thewalt; H. Riemann; N. V. Abrosimov; N. Nötzel

As the deepest group-V donor in Si, Bi has by far the largest hyperfine interaction and also a large I = 9/2 nuclear spin. At zero field this splits the donor ground state into states having total spin 5 and 4, which are fully resolved in the photoluminescence spectrum of Bi donor bound excitons. Under a magnetic field, the 60 expected allowed transitions cannot be individually resolved, but the effects of the nuclear spin distribution, -9/2 < or = I(z) < or = 9/2, are clearly observed. A strong hyperpolarization of the nuclear spin towards I(z) = -9/2 is observed to result from the nonresonant optical excitation. This is very similar to the recently reported optical hyperpolarization of P donors observed by EPR at higher magnetic fields. We introduce a new model to explain this effect, and predict that it may be very fast.


Journal of Applied Physics | 2011

Photoluminescence of deep defects involving transition metals in Si: New insights from highly enriched 28Si

M. Steger; A. Yang; T. Sekiguchi; K. Saeedi; M. L. W. Thewalt; M.O. Henry; K. Johnston; H. Riemann; N. V. Abrosimov; M. F. Churbanov; A. V. Gusev; A. K. Kaliteevskii; O. N. Godisov; Peter B. Becker; Hans-Joachim Pohl

Deep luminescence centers in Si associated with transition metals have been studied for decades, both as markers for these deleterious contaminants, as well as for the possibility of efficient Si-based light emission. They are among the most ubiquitous luminescence centers observed in Si, and have served as testbeds for elucidating the physics of isoelectronic bound excitons, and for testing ab-initio calculations of defect properties. The greatly improved spectral resolution resulting from the elimination of inhomogeneous isotope broadening in the recently available highly enriched 28Si enabled the extension of the established technique of isotope shifts to the measurement of isotopic fingerprints, which reveal not only the presence of a given element in a luminescence center, but also the number of atoms of that element. This has resulted in many surprises regarding the actual constituents of what were thought to be well-understood deep luminescence centers. Here we summarize the available information f...


Japanese Journal of Applied Physics | 2000

Epitaxial Growth of Single-Crystal Ultrathin Films of Bismuth on Si(111).

Tadaaki Nagao; Takumi Doi; T. Sekiguchi; Shuji Hasegawa

We have studied the epitaxial growth of bismuth overlayers on Si(111) surfaces by in situ reflection high-energy electron diffraction (RHEED) and scanning tunneling microscopy (STM). Lateral growth of texture two-dimensional (2D) nanocrystals takes place after the formation of an initial disordered wetting layer on the 7×7 DAS structure. After the coalescence of the texture 2D nanocrystals, alignment in their azimuthal orientation takes place. At slightly more than 15 monolayers, the growth front of the overlayer exhibits a perfectly long-range ordered Bi(0001)-1×1 surface. The films prepared on Si(111)-α-√3×√3-Bi or on Si(111)-β-√3×√3-Bi do not show as good quality as those on Si(111)-7×7. Thus, the initial disordered wetting layer formed on the 7×7 surface successfully accommodates the large 18% lattice mismatch between the Si(111) and Bi(0001) planes and allows the 2D nanocrystal to grow laterally.


Journal of Physics: Condensed Matter | 2004

The characterization of high quality multicrystalline silicon by the electron beam induced current method

Jinxin Chen; T. Sekiguchi; S Nara; Deren Yang

Multicrystalline silicon (mc-Si) manufactured by a multi-stage solidification control casting method has been characterized by the electron beam induced current (EBIC) method. The average diffusion length of the ingot was over 250 µm, whic hw as much longer than that of conventional mc-Si. The EBIC study revealed that the electrical activities of grain boundaries (GBs) varied with the ingot position due to the impurity contamination level. The main impurity detected was iron. The concentration of iron in the central position was much lower than that at the bottom and top positions. GBs in the central position showed no significant EBIC contrast at 300 K, suggesting low contamination level. GBs in the top and bottom positions, however, showed strong EBIC contrast at 300 K, suggesting high contamination level. At 100 K, a denuded zone with bright contrast developed around GBs in the top and bottom positions. The existence of the denuded zone suggested that impurities were gettered at th eG Bs .I tw as considered that the variation of the diffusion length in the ingot wa sr elated to the variation of recombination activities of GBs in the different positions, which mainly depended on the impurity contamination.


Applied Physics Letters | 2004

V defects of ZnO thin films grown on Si as an ultraviolet optical path

Young-Zo Yoo; T. Sekiguchi; Toyohiro Chikyow; Masashi Kawasaki; T. Onuma; S. F. Chichibu; J. H. Song; Hideomi Koinuma

V defects were observed in the ZnO films epitaxially grown on the ZnS-buffered Si. Although the defects were located on the surface, strong near-bandedge emission confined to the {1011} facets of V defects was observed at room temperature. The near-bandedge emission spreads out over the whole film centering at V defects at 30 K. The detailed optical characterization shows that activation of excitonic absorption is responsible for this unique optical behavior.

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M. Steger

Simon Fraser University

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A. Yang

Simon Fraser University

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Xiaoli Yuan

National Institute for Materials Science

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Hans-Joachim Pohl

Russian Academy of Sciences

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Toyohiro Chikyow

National Institute for Materials Science

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L. S. Vlasenko

Russian Academy of Sciences

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Parhat Ahmet

National Institute for Materials Science

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