Tadamichi Asai
Hitachi
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Featured researches published by Tadamichi Asai.
IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part A | 1994
Toshio Ogawa; Michio Ootani; Tadamichi Asai; Mitsuru Hasegawa; Osamu Ito
Adhesion strength and solderability of a copper thick film on alumina substrate were studied. Films were prepared with three kinds of inorganic binders, i.e., glass frits, mixture of glass frits and metal oxides, and metal oxides. The effects of inorganic binders on the adhesion and solderability were examined by analyzing physical and chemical behavior of the inorganic binders in the copper thick film during firing. The films with an addition of glass frit or mixtures of glass frit and metal oxide did not provide good adhesion and solderability simultaneously. However, the copper thick film containing 10 wt.% bismuth oxide had excellent characteristics, i.e. high adhesion strength, good solderability, and low sheet resistivity. >
IEEE Transactions on Components, Hybrids, and Manufacturing Technology | 1989
Toshio Ogawa; Tadamichi Asai; O. Itoh; Mitsuru Hasegawa; Akira Ikegami; K. Atoh; T. Kobayashi
Key technologies for processing of a thick-film copper conductor applicable to photolithographic techniques are described. A flexo printer was used to obtain a film of less than 2- mu m thickness on a substrate. Using photolithographic techniques, fine-line circuits with 40- mu m-wide copper conductor lines were realized using copper pastes doped with chalcogens. Dense thin films and good adhesion to the substrate were achieved by doping chalcogens from 0.01 to 0.05 wt.%. Characteristics of these conductor films satisfied the standard requirements for hybrid ICs. >
IEEE Transactions on Components, Hybrids, and Manufacturing Technology | 1988
Toshio Ogawa; Mituru Fujii; Tadamichi Asai; Akira Ikegami; T. Kobayashi
An assessment of a copper-conductor and resistor system and its performance in a high-frequency hybrid application is presented. Resistance of the copper compatible resistor, containing RuO/sub 2/, increases after refiring over 600 degrees C and drastically increases as the firing temperature is raised. Scanning-electron-microscope and energy-dispersive microprobe analyses revealed the existence of a RuO/sub 2/-poor area in the resistor adjacent to the copper terminals. The resistivity in this area is higher than that in areas removed from the terminals, and it increased with the refiring temperature. These facts indicate that the resistance change is caused by the diffusion of Ru to the copper conductor. Various approaches were taken to minimize this phenomenon. The most effective was insertion of a conductor pad between the copper conductor and resistor. Resistors with this type of Ag-Pd conductor pad meet the various requirements for practical application of hybrid ICs. Based on these results, a prototype, high-frequency hybrid IC (voltage-controlled oscillator, VCO) was fabricated. >
Thin Solid Films | 1991
Osamu Ito; Tadamichi Asai; Toshio Ogawa; Mitsuro Hasegawa; Akira Ikegami; Yoshishige Endoh; Takeshi Araya; Kazuhiro Atoh; Takao Kobayashi
Abstract In order to obtain guidelines develop a thick film resistor (TFR) fireable in an N2 atmosphere and covering a wide practical range of sheet resistivities, i.e. 10–106 ω □ , the microstructures of TFRs were observed, the sintering behaviour of the conduction particles and glass was analysed and the particle size effect on the formation of the conduction path was simulated. Through these investigations, conductive material properties which influence the characteristics of the TFR have been found. (1) As conduction particles fireable in N2, LaB6 particles have suitable properties such as poor sinterability and good wettability with glass. (2) Particle size also has a large effect on the characteristics of the TFR, and it is necessary to use LaB6 ultrafine particles (UFPs) as conduction particles to cover a wide range of sheet resistivities. Using UFPs with specific surface areas of 8.9 and 83.0 m2 g−1, we found the possibility of developing TFRs fireable in N2 with resistivities of 10–106 ω □ in the LaB6-glass system.
Archive | 1982
Yukio Takeda; Satoru Ogihara; Mitsuru Ura; Kousuke Nakamura; Tadamichi Asai; Tokio Ohkoshi; Yasuo Matsushita; Kunihiro Maeda
Archive | 1985
Yukio Takeda; Satoru Ogihara; Mitsuru Ura; Kousuke Nakamura; Tadamichi Asai; Tokio Ohkoshi; Yasuo Matsushita; Kunihiro Maeda
Archive | 1987
Toshio Ogawa; Mituru Fujii; Tadamichi Asai; Akira Ikegami; Hiroshi Ohtsu; Kazuhiko Ato
Archive | 1991
Osamu Ito; Tadamichi Asai; Toshio Ogawa; Noritaka Kamimura; Yoshishige Endou; Takao Kobayashi; Hiromi Isomae; Masaki Kamiakutsu; Michio Otani; Katsuo Ebisawa
Archive | 1980
Tadamichi Asai; Kousuke Nakamura
Archive | 1989
Mituru Fujii; Tadamichi Asai; Toshio Ogawa; Osamu Ito; Akira Ikegami; Mitsuru Hasegawa; Takao Kobayashi; Teizo Tamura