Takanori Yagita

SAion - SEN's unique solution for 450mm ion implant

The SAion-450 is a leading-edge ion implanter developed for the upcoming 450mm wafer generation. The SAion-450 has extremely wide process coverage and productivity throughout both the medium current (MC) and high current (HC) process ranges. Although the area of a 450mm wafer is 2.25 times larger than that of a 300mm wafer, the SAion-450 can process typical MC recipes with higher productivity than the current 300mm MC implanter, the MC3-II/GP. Additionally, low energy (LE) productivity can be significantly enhanced with the addition of the LE beam line option. This can be easily installed (or removed) in a production fab. The SAion product line also includes a 300mm model. The SAion-300 is equipped with the same beamline as the SAion-450 in order to deliver the same process characteristics in 300mm fabs as in 450mm wafer lines. Thus, the SAion series can serve as a bridge tool to assure smooth wafer size transition from 300mm to 450mm.

A Beam Quality Control Method in SAion Ion Implanter

The SAion is a leading-edge ion implanter developed for the upcoming generation. The SAion has extremely wide process coverage and high productivity throughout both the medium current (MC) and high current (HC) process ranges. In this paper, beam quality control method introduced for the SAion will be discussed. In order to carry out beam quality control, methods both to measure beam quality very precisely and to control beam quality very precisely must be satisfied simultaneously. These two technical elements have been developed and adopted in the SAion. A movable beam profiler has a beamangle measurement function in very high accuracy. A beam angle is measured very precisely at the wafer position. Based on the measurement, beam divergence control with extremely wide beam current coverage also can be carried out.