Takao Kitayama

Profile measurement of concave spherical mirror and a flat mirror using a high-speed nanoprofiler

Ultraprecise aspheric mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free-electron laser sources. In industry, the extreme ultraviolet (wavelength: 13.5 nm) lithography used for high-accuracy aspheric mirrors is a promising technology for fabricating semiconductor devices. In addition, ultraprecise mirrors with a radius of curvature of less than 10 mm are needed in many digital video instruments. We developed a new type of nanoprofiler that traces the normal vector of a mirrors surface. The principle of our measuring method is that the normal vector at each point on the surface is determined by making the incident light beam on the mirror surface and the reflected beam at that point coincide, using two sets of two pairs of goniometers and one linear stage. From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm. The characteristics of the measuring method are as follows: the profiler uses the straightness of laser light without using a reference surface. Surfaces of any shape can be measured, and there is no limit on the aperture size. We calibrated this nanoprofiler by considering the system error resulting from the assembly error and encoder scale error, and evaluated the performance at the nanometer scale. We suppressed the effect of random errors by maintaining the temperature in a constant-temperature room within ±0.01°C. We measured a concave spherical mirror with a radius of curvature of 400 mm and a flat mirror and compared the results with those obtained using a Fizeau interferometer. The profiles of the mirrors were consistent within the range of system errors.

Development of a nanoprofiler using the follow-up normal vector to the surface for next-generation ultraprecise mirrors

Ultraprecise aspherical mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free electron laser sources. In industry, the extreme ultraviolet (wavelength: 13.5 nm) lithography used for high-accuracy aspheric mirrors is a promising technology for fabricating semiconductor devices. In addition, ultraprecise mirrors with a radius of curvature of less than 10 mm are needed in many digital video instruments. We developed a new type of nanoprofiler that traces the normal vector of a mirror’s surface. The principle of our measuring method is that the normal vector at each point on the surface is determined by making the incident light beam on the mirror surface and the reflected beam at that point coincide, using two sets of two pairs of goniometers and one linear stage. From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm. The characteristics of the measuring method are as follows. The profiler uses the straightness of laser light without using a reference surface. Surfaces of any shape can be measured, and there is no limit on the aperture size. We calibrated this nanoprofiler by considering the system error resulting from the assembly error and encoder scale error, and evaluated the performance at the nanometer scale. We suppressed the effect of random errors by maintaining the temperature in a constant-temperature room within ±0.01°C. We measured a concave spherical mirror with a radius of curvature of 400 mm and a flat mirror, and compared the results with those obtained using a Fizeau interferometer. The profiles of the mirrors were consistent within the range of system errors.

Development of a High-Speed Nanoprofiler Using Normal Vector Tracing

A new high-speed nanoprofiler was developed in this study. This profiler measures normal vectors and their coordinates on the surface of a specimen. Each normal vector is determined by making the incident light path and the reflected light path coincident using five-axis simultaneously controlled stages. From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm. In this study, a concave spherical mirror with a 400 mm radius of curvature was measured. As a result, a peak of 30 nm PV was observed at the centre of the mirror. Measurement repeatability was 1 nm. In addition, cross-comparison with a Fizeau interferometer was implemented and the results were consistent within 10 nm. In particular, the high spatial frequency profile was highly consistent, and any differences were considered to be caused by systematic errors.

Development of a high-speed nanoprofiler using normal vector tracing method for high-accuracy mirrors

High-precision optical elements are used in various fields. Ultraprecise aspherical mirrors that offer nanofocusing and high coherence are used to concentrate high-brightness X-rays in developing third-generation synchrotron radiation facilities. In industry, extreme ultraviolet (wavelength: 13.5 nm) lithography, which is used to fabricate semiconductor devices, uses high-accuracy aspherical mirrors for its projection optical systems. The demand for rapid progress in nanomeasurement technologies is increasing because it is difficult to realize next-generation ultraprecise mirrors with the required precision by conventional processing. The measuring method itself requires superhigh precision. We developed an innovative nanoprofiler that can directly measure the figure of high-accuracy mirrors without using a reference surface. The principle of our measuring method is to determine the normal vectors by causing the optical paths of the incident and reflected light at the measurement point to coincide; it is based on the straightness of laser light and the accuracy of rotational goniometers. From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm. We measured concave spherical mirrors and compared the results with those using a Fizeau interferometer. The profiles of the mirrors were consistent within the range of error in their middle portions. In addition, we evaluated the performance of an airflow control unit by measuring a concave spherical mirror. This unit suppressed the influence of environmental change, and drastically improved the repeatability.

Absolute Calibration of the Rotary Encoder Considering the Influence on-Machine for Development of High-Speed Nanoprofiler

The development of a high-speed nanoprofiler is essential for developing the next generation of ultraprecision aspheric mirrors. The purpose of this study is to develop a new high-speed nanoprofiler that traces the normal vector of an aspheric mirror surface. The method of measurement adopted here is based upon the accuracy of a rotation goniometer. In order to attain a form measurement accuracy of PV1nm, it is necessary to improve the angle measurement accuracy. In this study, we equip a nanoprofiler with a rotary encoder that is calibrated in order to accomplish this objective, using a national standard machine. Consequently, this rotary encoder can be calibrated with an accuracy of ±0.12 μrad when considering the influence of installing the encoder on the nanoprofiler.

Measurement of aspheric mirror by nanoprofiler using normal vector tracing

Aspheric or free-form optics with high accuracy are necessary in many fields such as third-generation synchrotron radiation and extreme-ultraviolet lithography. Therefore the demand of measurement method for aspherical or free-form surface with nanometer accuracy increases. Purpose of our study is to develop a non-contact measurement technology for aspheric or free-form surfaces directly with high repeatability. To achieve this purpose we have developed threedimensional Nanoprofiler which detects normal vectors of sample surface. The measurement principle is based on the straightness of laser light and the accurate motion of rotational goniometers. This machine consists of four rotational stages, one translational stage and optical head which has the quadrant photodiode (QPD) and laser source. In this measurement method, we conform the incident light beam to reflect the beam by controlling five stages and determine the normal vectors and the coordinates of the surface from signal of goniometers, translational stage and QPD. We can obtain three-dimensional figure from the normal vectors and their coordinates by surface reconstruction algorithm. To evaluate performance of this machine we measure a concave aspheric mirror with diameter of 150 mm. As a result we achieve to measure large area of 150mm diameter. And we observe influence of systematic errors which the machine has. Then we simulated the influence and subtracted it from measurement result.

The measurement of an aspherical mirror by three-dimensional nanoprofiler

Aspherical optical elements with high accuracy are important in several fields such as third-generation synchrotron radiation and extreme-ultraviolet lithography. Then the demand of measurement method for aspherical or free-form surface with nanometer resolution is rising. Our purpose is to develop a non-contact profiler to measure free-form surfaces directly with repeatability of figure error of less than 1 nm PV. To achieve this purpose we have developed three-dimensional Nanoprofiler which traces normal vectors of sample surface. The measurement principle is based on the straightness of LASER light and the accuracy of a rotational goniometer. This machine consists of four rotational stages, one translational stage and optical head which has the quadrant photodiode (QPD) and LASER head at optically equal position. In this measurement method, we conform the incident light beam to reflect the beam by controlling five stages and determine the normal vectors and the coordinates of the surface from signal of goniometers, translational stage and QPD. We can obtain three-dimensional figure from the normal vectors and the coordinates by a reconstruction algorithm. To evaluate performance of this machine we measure a concave aspherical mirror ten times. From ten results we calculate measurement repeatability, and we evaluate measurement uncertainty to compare the result with that measured by an interferometer. In consequence, the repeatability of measurement was 2.90 nm (σ) and the difference between the two profiles was ±20 nm. We conclude that the two profiles was correspondent considering systematic errors of each machine.

A new optical head tracing reflected light for nanoprofiler

High accuracy optical elements are applied in various fields. For example, ultraprecise aspherical mirrors are necessary for developing third-generation synchrotron radiation and XFEL (X-ray Free Electron LASER) sources. In order to make such high accuracy optical elements, it is necessary to realize the measurement of aspherical mirrors with high accuracy. But there has been no measurement method which simultaneously achieves these demands yet. So, we develop the nanoprofiler that can directly measure the any surfaces figures with high accuracy. The nanoprofiler gets the normal vector and the coordinate of a measurement point with using LASER and the QPD (Quadrant Photo Diode) as a detector. And, from the normal vectors and their coordinates, the three-dimensional figure is calculated. In order to measure the figure, the nanoprofiler controls its five motion axis numerically to make the reflected light enter to the QPD’s center. The control is based on the samples design formula. We measured a concave spherical mirror with a radius of curvature of 400 mm by the deflection method which calculates the figure error from QPD’s output, and compared the results with those using a Fizeau interferometer. The profile was consistent within the range of system error. The deflection method can’t neglect the error caused from the QPD’s spatial irregularity of sensitivity. In order to improve it, we have contrived the zero method which moves the QPD by the piezoelectric motion stage and calculates the figure error from the displacement.

Development of a high-speed nanoprofiler using normal vector tracing

A new high-speed nanoprofiler was developed in this study. This profiler measures normal vectors and their coordinates on the surface of a specimen. Each normal vector and coordinate is determined by making the incident light path and the reflected light path coincident using 5-axis controlled stages. This is ensured by output signal of quadrant photo diode (QPD). From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm based on least-squares. In this study, a concave spherical mirror with a 400 mm radius of curvature was measured. As a result, a peak of 30 nm PV was observed at the center of the mirror. Measurement repeatability was 1 nm. In addition, cross-comparison with a Fizeau interferometer was implemented and the results were consistent within 10 nm. In particular, the high spatial frequency profile was highly consistent, and any differences were considered to be caused by systematic errors.

High-speed surface slope measuring profiler for aspheric shapes

A new high-speed slope measuring instrument is currently under development for small-aperture aspheric lenses and mirrors. In the present study, normal vectors at each point on the lens surface were determined using the reflected light beam that follows the same path as the incident beam. The capability of the developed instrument to achieve submicroradian surface slope metrology of a small-radius aspheric lens was verified. The paper also describes in detail the design principle, aspheric lens measuring method, initial alignment and calibration procedure, shape determination procedure developed from the measured slope metrology, and the high-speed slope measuring technique.