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Featured researches published by Takayoshi Arai.


Archive | 1989

Microwave plasma treating apparatus

Soichiro Kawakami; Masahiro Kanai; Takayoshi Arai; Tsutomu Murakami


Archive | 1989

HR-CVD process for the formation of a functional deposited film on a substrate with application of a voltage in the range of -5 to -100 V

Takayoshi Arai; Masahiro Kanai


Archive | 1989

Process for the formation of a functional deposited film containing group IV atoms or silicon atoms and group IV atoms by microwave plasma chemical vapor deposition process

Takayoshi Arai; Masahiro Kanai; Soichiro Kawakami; Tsutomu Murakami


Archive | 1989

Process for the formation of a functional deposited film containing groups II and VI atoms by microwave plasma chemical vapor deposition process

Masahiro Kanai; Tsutomu Murakami; Takayoshi Arai; Soichiro Kawakami


Archive | 1988

Light receiving member for use in electrophotography having an amorphous silicon layer

Shigeru Shirai; Keishi Saito; Takayoshi Arai; Minoru Kato; Yasushi Fujioka


Archive | 1988

Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method

Keishi Saitoh; Junichiro Hashizume; Shigehira Iida; Tetsuya Takei; Takayoshi Arai


Archive | 1990

Microwave plasma CVD apparatus having substrate shielding member

Junichiro Hashizume; Tetsuya Takei; Shigehira Iida; Keishi Saitoh; Takayoshi Arai


Archive | 1988

Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method

Takayoshi Arai; Shigehira Iida; Junichiro Hashizume; Tetsuya Takei; Keishi Saitoh


Archive | 1991

Process for forming film in a three-chambered apparatus having two chamber faces coated with films of at least 106 Ω cm resistance

Takayoshi Arai


Archive | 1987

Light receiving member for electrophotography

Shigeru Shirai; Keishi Saitoh; Takayoshi Arai; Minoru Kato; Yasushi Fujioka

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