Takeo Yoshimi
Hitachi
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Publication
Featured researches published by Takeo Yoshimi.
Journal of The Electrochemical Society | 1984
Akira Takamatsu; Miyoko Shibata; Hideo Sakai; Takeo Yoshimi
Phosphosilicate glass film deposited by a plasma‐activated reaction system (P‐PSG) was studied. Fundamental characteristics of the P‐PSG were investigated by systematically varying deposition parameters. In this plasma deposition method, the P‐PSG having a high deposition rate (130 nm/min) and a high doped phosphorus concentration [about 10 weight percent (w/o) P] was deposited using the reaction gases , , and . The P‐PSG deposited by this method showed properties such as a strong film crack resistance during heat‐treatments, a conformai step coverage, and a controllable compressive stress, compared with those of conventional PSG film deposited under atmospheric pressure (AP‐PSG).
Archive | 1981
Kiichiro Mukai; Seiki Harada; Shinichi Muramatsu; Atsushi Hiraiwa; Shigeru Takahashi; Katsuhisa Usami; Seiichi Iwata; Satoru Ito; Takeo Yoshimi
Archive | 1985
Hideo Sakai; Tetsuya Mizutani; Takeo Yoshimi
Journal of The Electrochemical Society | 1980
Takeo Yoshimi; Hideo Sakai; Keizo Tanaka
Journal of The Electrochemical Society | 1977
Hideo Sakai; Takeo Yoshimi; Katsuro Sugawara
Archive | 1977
Hideo Sakai; Takeo Yoshimi
Archive | 1976
Hideo Sakai; Takeo Yoshimi
Archive | 1978
Hideo Sakai; Takeo Yoshimi
Archive | 1982
Tokio Kato; Hideo Sakai; Takeo Yoshimi
Archive | 1980
Hideo Sakai; Miyoko Shibata; Akira Takamatsu; Takeo Yoshimi
